Evaluation of sample temperature and applied power on degradation of stearic acid in inductively coupled radio frequency plasma
Autor(a) principal: | |
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Data de Publicação: | 2014 |
Outros Autores: | , , , , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Materials research (São Carlos. Online) |
Texto Completo: | http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392014000500018 |
Resumo: | Plasma cleaning is a promising technology in surface treatments, despite technological interest its use is limited because its mechanisms still are not entirely understood. This work aims to evaluate how the applied power of an inductively coupled RF discharge at 13,56 MHz, with Ar and Ar+10%O2 atmospheres, affects its capabilities to etch an organic molecule. Mass variation rate was used as direct characterization of degradation process and attenuated total reflection-Fourier transform infrared spectroscopy (ATR-FTIR) was performed to search for residual molecular modifications. Additionally, optical emission spectroscopy (OES) measurements were performed to monitor the offer of active species in the gaseous volume. In experimental conditions was possible attain mass reduction from sample, with higher mass loss rate when applied power is increased. Material characterization shows the possibility of attain a high etch rate, while no structural modifications were detected, if the temperature is controlled. |
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Evaluation of sample temperature and applied power on degradation of stearic acid in inductively coupled radio frequency plasmaplasma cleaningetchingstearic acidPlasma cleaning is a promising technology in surface treatments, despite technological interest its use is limited because its mechanisms still are not entirely understood. This work aims to evaluate how the applied power of an inductively coupled RF discharge at 13,56 MHz, with Ar and Ar+10%O2 atmospheres, affects its capabilities to etch an organic molecule. Mass variation rate was used as direct characterization of degradation process and attenuated total reflection-Fourier transform infrared spectroscopy (ATR-FTIR) was performed to search for residual molecular modifications. Additionally, optical emission spectroscopy (OES) measurements were performed to monitor the offer of active species in the gaseous volume. In experimental conditions was possible attain mass reduction from sample, with higher mass loss rate when applied power is increased. Material characterization shows the possibility of attain a high etch rate, while no structural modifications were detected, if the temperature is controlled.ABM, ABC, ABPol2014-10-01info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersiontext/htmlhttp://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392014000500018Materials Research v.17 n.5 2014reponame:Materials research (São Carlos. Online)instname:Universidade Federal de São Carlos (UFSCAR)instacron:ABM ABC ABPOL10.1590/1516-1439.270714info:eu-repo/semantics/openAccessFarias,Carlos EduardoBianchi,José CarlosOliveira,Paulo Roberto deBorges,Paulo CésarBernardelli,Euclides AlexandreBelmonte,ThierryMafra,Márcioeng2014-12-15T00:00:00Zoai:scielo:S1516-14392014000500018Revistahttp://www.scielo.br/mrPUBhttps://old.scielo.br/oai/scielo-oai.phpdedz@power.ufscar.br1980-53731516-1439opendoar:2014-12-15T00:00Materials research (São Carlos. Online) - Universidade Federal de São Carlos (UFSCAR)false |
dc.title.none.fl_str_mv |
Evaluation of sample temperature and applied power on degradation of stearic acid in inductively coupled radio frequency plasma |
title |
Evaluation of sample temperature and applied power on degradation of stearic acid in inductively coupled radio frequency plasma |
spellingShingle |
Evaluation of sample temperature and applied power on degradation of stearic acid in inductively coupled radio frequency plasma Farias,Carlos Eduardo plasma cleaning etching stearic acid |
title_short |
Evaluation of sample temperature and applied power on degradation of stearic acid in inductively coupled radio frequency plasma |
title_full |
Evaluation of sample temperature and applied power on degradation of stearic acid in inductively coupled radio frequency plasma |
title_fullStr |
Evaluation of sample temperature and applied power on degradation of stearic acid in inductively coupled radio frequency plasma |
title_full_unstemmed |
Evaluation of sample temperature and applied power on degradation of stearic acid in inductively coupled radio frequency plasma |
title_sort |
Evaluation of sample temperature and applied power on degradation of stearic acid in inductively coupled radio frequency plasma |
author |
Farias,Carlos Eduardo |
author_facet |
Farias,Carlos Eduardo Bianchi,José Carlos Oliveira,Paulo Roberto de Borges,Paulo César Bernardelli,Euclides Alexandre Belmonte,Thierry Mafra,Márcio |
author_role |
author |
author2 |
Bianchi,José Carlos Oliveira,Paulo Roberto de Borges,Paulo César Bernardelli,Euclides Alexandre Belmonte,Thierry Mafra,Márcio |
author2_role |
author author author author author author |
dc.contributor.author.fl_str_mv |
Farias,Carlos Eduardo Bianchi,José Carlos Oliveira,Paulo Roberto de Borges,Paulo César Bernardelli,Euclides Alexandre Belmonte,Thierry Mafra,Márcio |
dc.subject.por.fl_str_mv |
plasma cleaning etching stearic acid |
topic |
plasma cleaning etching stearic acid |
description |
Plasma cleaning is a promising technology in surface treatments, despite technological interest its use is limited because its mechanisms still are not entirely understood. This work aims to evaluate how the applied power of an inductively coupled RF discharge at 13,56 MHz, with Ar and Ar+10%O2 atmospheres, affects its capabilities to etch an organic molecule. Mass variation rate was used as direct characterization of degradation process and attenuated total reflection-Fourier transform infrared spectroscopy (ATR-FTIR) was performed to search for residual molecular modifications. Additionally, optical emission spectroscopy (OES) measurements were performed to monitor the offer of active species in the gaseous volume. In experimental conditions was possible attain mass reduction from sample, with higher mass loss rate when applied power is increased. Material characterization shows the possibility of attain a high etch rate, while no structural modifications were detected, if the temperature is controlled. |
publishDate |
2014 |
dc.date.none.fl_str_mv |
2014-10-01 |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392014000500018 |
url |
http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392014000500018 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
10.1590/1516-1439.270714 |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
text/html |
dc.publisher.none.fl_str_mv |
ABM, ABC, ABPol |
publisher.none.fl_str_mv |
ABM, ABC, ABPol |
dc.source.none.fl_str_mv |
Materials Research v.17 n.5 2014 reponame:Materials research (São Carlos. Online) instname:Universidade Federal de São Carlos (UFSCAR) instacron:ABM ABC ABPOL |
instname_str |
Universidade Federal de São Carlos (UFSCAR) |
instacron_str |
ABM ABC ABPOL |
institution |
ABM ABC ABPOL |
reponame_str |
Materials research (São Carlos. Online) |
collection |
Materials research (São Carlos. Online) |
repository.name.fl_str_mv |
Materials research (São Carlos. Online) - Universidade Federal de São Carlos (UFSCAR) |
repository.mail.fl_str_mv |
dedz@power.ufscar.br |
_version_ |
1754212665099550720 |