Nanocrystalline structure and hardness of thin films

Detalhes bibliográficos
Autor(a) principal: Cavaleiro, A.
Data de Publicação: 2002
Outros Autores: Louro, C.
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
Texto Completo: http://hdl.handle.net/10316/4290
https://doi.org/10.1016/S0042-207X(01)00337-2
Resumo: W---Si---N films were deposited by reactive sputtering in a N2+Ar atmosphere from a W target incrusted with different number of Si pieces. The coatings present different crystallographic structures from the crystalline [alpha]-W and W2N to amorphous phase. Crystalline films have very low grain sizes from 15 down to 3 nm.
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spelling Nanocrystalline structure and hardness of thin filmsW-Si-N coatingsHardnessNanostructureSputteringW---Si---N films were deposited by reactive sputtering in a N2+Ar atmosphere from a W target incrusted with different number of Si pieces. The coatings present different crystallographic structures from the crystalline [alpha]-W and W2N to amorphous phase. Crystalline films have very low grain sizes from 15 down to 3 nm.http://www.sciencedirect.com/science/article/B6TW4-44PCFMC-6/1/9eb4f2ae932f9fa1dde3d75b37b5bb8e2002info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleaplication/PDFhttp://hdl.handle.net/10316/4290http://hdl.handle.net/10316/4290https://doi.org/10.1016/S0042-207X(01)00337-2engVacuum. 64:3-4 (2002) 211-218Cavaleiro, A.Louro, C.info:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2022-07-27T13:27:58Zoai:estudogeral.uc.pt:10316/4290Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireopendoar:71602024-03-19T20:58:29.302756Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse
dc.title.none.fl_str_mv Nanocrystalline structure and hardness of thin films
title Nanocrystalline structure and hardness of thin films
spellingShingle Nanocrystalline structure and hardness of thin films
Cavaleiro, A.
W-Si-N coatings
Hardness
Nanostructure
Sputtering
title_short Nanocrystalline structure and hardness of thin films
title_full Nanocrystalline structure and hardness of thin films
title_fullStr Nanocrystalline structure and hardness of thin films
title_full_unstemmed Nanocrystalline structure and hardness of thin films
title_sort Nanocrystalline structure and hardness of thin films
author Cavaleiro, A.
author_facet Cavaleiro, A.
Louro, C.
author_role author
author2 Louro, C.
author2_role author
dc.contributor.author.fl_str_mv Cavaleiro, A.
Louro, C.
dc.subject.por.fl_str_mv W-Si-N coatings
Hardness
Nanostructure
Sputtering
topic W-Si-N coatings
Hardness
Nanostructure
Sputtering
description W---Si---N films were deposited by reactive sputtering in a N2+Ar atmosphere from a W target incrusted with different number of Si pieces. The coatings present different crystallographic structures from the crystalline [alpha]-W and W2N to amorphous phase. Crystalline films have very low grain sizes from 15 down to 3 nm.
publishDate 2002
dc.date.none.fl_str_mv 2002
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://hdl.handle.net/10316/4290
http://hdl.handle.net/10316/4290
https://doi.org/10.1016/S0042-207X(01)00337-2
url http://hdl.handle.net/10316/4290
https://doi.org/10.1016/S0042-207X(01)00337-2
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv Vacuum. 64:3-4 (2002) 211-218
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eu_rights_str_mv openAccess
dc.format.none.fl_str_mv aplication/PDF
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