Nanocrystalline structure and hardness of thin films
Autor(a) principal: | |
---|---|
Data de Publicação: | 2002 |
Outros Autores: | |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
Texto Completo: | http://hdl.handle.net/10316/4290 https://doi.org/10.1016/S0042-207X(01)00337-2 |
Resumo: | W---Si---N films were deposited by reactive sputtering in a N2+Ar atmosphere from a W target incrusted with different number of Si pieces. The coatings present different crystallographic structures from the crystalline [alpha]-W and W2N to amorphous phase. Crystalline films have very low grain sizes from 15 down to 3 nm. |
id |
RCAP_97bf6c425e73b3fab69c183b5d4611bb |
---|---|
oai_identifier_str |
oai:estudogeral.uc.pt:10316/4290 |
network_acronym_str |
RCAP |
network_name_str |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
repository_id_str |
7160 |
spelling |
Nanocrystalline structure and hardness of thin filmsW-Si-N coatingsHardnessNanostructureSputteringW---Si---N films were deposited by reactive sputtering in a N2+Ar atmosphere from a W target incrusted with different number of Si pieces. The coatings present different crystallographic structures from the crystalline [alpha]-W and W2N to amorphous phase. Crystalline films have very low grain sizes from 15 down to 3 nm.http://www.sciencedirect.com/science/article/B6TW4-44PCFMC-6/1/9eb4f2ae932f9fa1dde3d75b37b5bb8e2002info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleaplication/PDFhttp://hdl.handle.net/10316/4290http://hdl.handle.net/10316/4290https://doi.org/10.1016/S0042-207X(01)00337-2engVacuum. 64:3-4 (2002) 211-218Cavaleiro, A.Louro, C.info:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2022-07-27T13:27:58Zoai:estudogeral.uc.pt:10316/4290Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireopendoar:71602024-03-19T20:58:29.302756Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse |
dc.title.none.fl_str_mv |
Nanocrystalline structure and hardness of thin films |
title |
Nanocrystalline structure and hardness of thin films |
spellingShingle |
Nanocrystalline structure and hardness of thin films Cavaleiro, A. W-Si-N coatings Hardness Nanostructure Sputtering |
title_short |
Nanocrystalline structure and hardness of thin films |
title_full |
Nanocrystalline structure and hardness of thin films |
title_fullStr |
Nanocrystalline structure and hardness of thin films |
title_full_unstemmed |
Nanocrystalline structure and hardness of thin films |
title_sort |
Nanocrystalline structure and hardness of thin films |
author |
Cavaleiro, A. |
author_facet |
Cavaleiro, A. Louro, C. |
author_role |
author |
author2 |
Louro, C. |
author2_role |
author |
dc.contributor.author.fl_str_mv |
Cavaleiro, A. Louro, C. |
dc.subject.por.fl_str_mv |
W-Si-N coatings Hardness Nanostructure Sputtering |
topic |
W-Si-N coatings Hardness Nanostructure Sputtering |
description |
W---Si---N films were deposited by reactive sputtering in a N2+Ar atmosphere from a W target incrusted with different number of Si pieces. The coatings present different crystallographic structures from the crystalline [alpha]-W and W2N to amorphous phase. Crystalline films have very low grain sizes from 15 down to 3 nm. |
publishDate |
2002 |
dc.date.none.fl_str_mv |
2002 |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://hdl.handle.net/10316/4290 http://hdl.handle.net/10316/4290 https://doi.org/10.1016/S0042-207X(01)00337-2 |
url |
http://hdl.handle.net/10316/4290 https://doi.org/10.1016/S0042-207X(01)00337-2 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
Vacuum. 64:3-4 (2002) 211-218 |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
aplication/PDF |
dc.source.none.fl_str_mv |
reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação instacron:RCAAP |
instname_str |
Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
instacron_str |
RCAAP |
institution |
RCAAP |
reponame_str |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
collection |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
repository.name.fl_str_mv |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
repository.mail.fl_str_mv |
|
_version_ |
1799133875907067904 |