High Si multilayered TiSiN/TiN(Ag) films with superior oxidation resistance
Autor(a) principal: | |
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Data de Publicação: | 2021 |
Outros Autores: | , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
Texto Completo: | http://hdl.handle.net/10316/100789 https://doi.org/10.1016/j.jmrt.2021.04.040 |
Resumo: | In this work, the effect of Ag content on the morphology, structure, mechanical properties, thermal stability, and oxidation resistance of multilayered TiSiN/TiN(Ag) films, with Si concentration in the range of 6.3e7.0 at.%, is investigated. The coatings are deposited by DC reactive magnetron sputtering, with increasing Ag content from 0 to 13.9 at.%. All coatings exhibit a face-centered cubic structure (f.c.c NaCl type) and the Ag diffraction peaks progressively increase with increasing Ag content. The hardness and the reduced elastic modulus of the as-deposited films decrease with increasing Ag; these mechanical properties are higher after annealing at 800 C in protective atmosphere due to the improvement of the crystallinity of the films. The multilayered architecture of the coatings promotes a good barrier against Ag diffusion towards the surface in protective atmosphere. Ag addition does not influence the onset point of oxidation of the films, but it degrades the oxidation resistance due to the Ag diffusion during the oxidation process, which promotes extra paths for ions diffusion. |
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Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
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7160 |
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High Si multilayered TiSiN/TiN(Ag) films with superior oxidation resistanceOxidation resistanceStructureThermal stabilityTiSiN/TiN(Ag) filmsIn this work, the effect of Ag content on the morphology, structure, mechanical properties, thermal stability, and oxidation resistance of multilayered TiSiN/TiN(Ag) films, with Si concentration in the range of 6.3e7.0 at.%, is investigated. The coatings are deposited by DC reactive magnetron sputtering, with increasing Ag content from 0 to 13.9 at.%. All coatings exhibit a face-centered cubic structure (f.c.c NaCl type) and the Ag diffraction peaks progressively increase with increasing Ag content. The hardness and the reduced elastic modulus of the as-deposited films decrease with increasing Ag; these mechanical properties are higher after annealing at 800 C in protective atmosphere due to the improvement of the crystallinity of the films. The multilayered architecture of the coatings promotes a good barrier against Ag diffusion towards the surface in protective atmosphere. Ag addition does not influence the onset point of oxidation of the films, but it degrades the oxidation resistance due to the Ag diffusion during the oxidation process, which promotes extra paths for ions diffusion.2021info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articlehttp://hdl.handle.net/10316/100789http://hdl.handle.net/10316/100789https://doi.org/10.1016/j.jmrt.2021.04.040eng22387854Al-Rjoub, A.Cavaleiro, A.Rajput, S. S.Fernandes, F.info:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2022-07-11T20:31:44Zoai:estudogeral.uc.pt:10316/100789Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireopendoar:71602024-03-19T21:18:06.176524Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse |
dc.title.none.fl_str_mv |
High Si multilayered TiSiN/TiN(Ag) films with superior oxidation resistance |
title |
High Si multilayered TiSiN/TiN(Ag) films with superior oxidation resistance |
spellingShingle |
High Si multilayered TiSiN/TiN(Ag) films with superior oxidation resistance Al-Rjoub, A. Oxidation resistance Structure Thermal stability TiSiN/TiN(Ag) films |
title_short |
High Si multilayered TiSiN/TiN(Ag) films with superior oxidation resistance |
title_full |
High Si multilayered TiSiN/TiN(Ag) films with superior oxidation resistance |
title_fullStr |
High Si multilayered TiSiN/TiN(Ag) films with superior oxidation resistance |
title_full_unstemmed |
High Si multilayered TiSiN/TiN(Ag) films with superior oxidation resistance |
title_sort |
High Si multilayered TiSiN/TiN(Ag) films with superior oxidation resistance |
author |
Al-Rjoub, A. |
author_facet |
Al-Rjoub, A. Cavaleiro, A. Rajput, S. S. Fernandes, F. |
author_role |
author |
author2 |
Cavaleiro, A. Rajput, S. S. Fernandes, F. |
author2_role |
author author author |
dc.contributor.author.fl_str_mv |
Al-Rjoub, A. Cavaleiro, A. Rajput, S. S. Fernandes, F. |
dc.subject.por.fl_str_mv |
Oxidation resistance Structure Thermal stability TiSiN/TiN(Ag) films |
topic |
Oxidation resistance Structure Thermal stability TiSiN/TiN(Ag) films |
description |
In this work, the effect of Ag content on the morphology, structure, mechanical properties, thermal stability, and oxidation resistance of multilayered TiSiN/TiN(Ag) films, with Si concentration in the range of 6.3e7.0 at.%, is investigated. The coatings are deposited by DC reactive magnetron sputtering, with increasing Ag content from 0 to 13.9 at.%. All coatings exhibit a face-centered cubic structure (f.c.c NaCl type) and the Ag diffraction peaks progressively increase with increasing Ag content. The hardness and the reduced elastic modulus of the as-deposited films decrease with increasing Ag; these mechanical properties are higher after annealing at 800 C in protective atmosphere due to the improvement of the crystallinity of the films. The multilayered architecture of the coatings promotes a good barrier against Ag diffusion towards the surface in protective atmosphere. Ag addition does not influence the onset point of oxidation of the films, but it degrades the oxidation resistance due to the Ag diffusion during the oxidation process, which promotes extra paths for ions diffusion. |
publishDate |
2021 |
dc.date.none.fl_str_mv |
2021 |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://hdl.handle.net/10316/100789 http://hdl.handle.net/10316/100789 https://doi.org/10.1016/j.jmrt.2021.04.040 |
url |
http://hdl.handle.net/10316/100789 https://doi.org/10.1016/j.jmrt.2021.04.040 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
22387854 |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.source.none.fl_str_mv |
reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação instacron:RCAAP |
instname_str |
Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
instacron_str |
RCAAP |
institution |
RCAAP |
reponame_str |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
collection |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
repository.name.fl_str_mv |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
repository.mail.fl_str_mv |
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1799134076265824256 |