Structural analysis of Ti1−xSixNy nanocomposite films prepared by reactive magnetron sputtering

• Autor(a) principal: Vaz, Filipe
• Data de Publicação: 1999
• Outros Autores: Rebouta, L., Almeida, B. G., Goudeau, P., Pacaud, J., Rivière, J. P., Bessa e Sousa, J.
• Tipo de documento: Artigo
• Idioma: eng
• Título da fonte: Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
• Texto Completo: https://hdl.handle.net/1822/85690
• topic: grain size; hard coatings; texture; titanium and silicon nitride; Ciências Naturais::Ciências Físicas; Science & Technology

Nanocomposite thin films consisting of both nanosized solid solutions or nanosized polycrystalline materials embedded in various amorphous matrix materials thus provide a grate potential for future mechanical devices. In this paper we report on the preparation of films resulting from additions of Si to TiN matrix by r.f. reactive magnetron sputtering. Structural properties such as growing characteristics (type of matrix, texture and grain size) will be analysed in some detail. Conventional transmission electron microscopy (TEM) and High-resolution transmission electron microscopy (HRTEM), together with both symmetric and asymmetric mode X-ray diffraction (XRD) experiments were used for this characterisation. The atomic composition of the samples was obtained by Rutherford Backscattering Spectrometry (RBS). The analysis will be carried out as a function of the Si content in the Ti1-xSixNy matrix and several relations will be made regarding important parameters such as texture evolution, grain sizes, but most specially by the type of matrix developed. Regarding the results, all samples develop a double fcc phase with lattice parameters of 4.30 Å and 4.17 Å, corresponding to cubic TiN and most likely to a cubic lattice of SiNx, respectively. Although no significant changes in texture were observed till Si compositions up to 10.6 at. %, the arrangement in atoms planes seem to vary. Results show that an asymmetric arrangement is developed in samples of small Si additions. This arrangement becomes more isotropic with the increase of Si contents, which we attribute to the increase in the SiNx content. In fact this increase leads also to the development of a small amorphous tissue of Si3N4 for large Si additions.