Growth evolution of ZnO thin films deposited by RF magnetron sputtering
Autor(a) principal: | |
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Data de Publicação: | 2012 |
Outros Autores: | , , , , , |
Tipo de documento: | Artigo de conferência |
Idioma: | eng |
Título da fonte: | Repositório Institucional da UNESP |
Texto Completo: | http://dx.doi.org/10.1088/1742-6596/370/1/012020 http://hdl.handle.net/11449/8415 |
Resumo: | We study the surface morphology evolution of ZnO thin films grown on glass substrates as a function of thickness by RF magnetron sputtering technique. The surface topography of the samples is measured by atomic force microscopy (AFM). All AFM images of the films are analyzed using scaling concepts. The results show that the surface morphology is initially formed by a small grains structure. The grains increase in size and height with growth time resulting in the formation of a mounds-like structure. The growth exponent, beta, and the exponent defining the evolution of the characteristic wavelength of the surface, p, amounted to beta = 0.76 +/- 0.08 and p = 0.3 +/- 0.05. From these exponents, the surface morphology is determined by the nonlocal shadowing effects, that is the dominant mechanism, due to the incident deposition particles during film growth. |
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Repositório Institucional da UNESP |
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Growth evolution of ZnO thin films deposited by RF magnetron sputteringWe study the surface morphology evolution of ZnO thin films grown on glass substrates as a function of thickness by RF magnetron sputtering technique. The surface topography of the samples is measured by atomic force microscopy (AFM). All AFM images of the films are analyzed using scaling concepts. The results show that the surface morphology is initially formed by a small grains structure. The grains increase in size and height with growth time resulting in the formation of a mounds-like structure. The growth exponent, beta, and the exponent defining the evolution of the characteristic wavelength of the surface, p, amounted to beta = 0.76 +/- 0.08 and p = 0.3 +/- 0.05. From these exponents, the surface morphology is determined by the nonlocal shadowing effects, that is the dominant mechanism, due to the incident deposition particles during film growth.São Paulo State Univ UNESP, Lab Technol Plasmas, Sorocaba, BrazilSão Paulo State Univ UNESP, Lab Technol Plasmas, Sorocaba, BrazilIop Publishing LtdUniversidade Estadual Paulista (Unesp)Rosa, A. M. [UNESP]Silva, E. P. da [UNESP]Amorim, E. [UNESP]Chaves, M. [UNESP]Catto, A. C.Lisboa Filho, Paulo Noronha [UNESP]Bortoleto, J. R. R. [UNESP]2014-05-20T13:26:12Z2014-05-20T13:26:12Z2012-01-01info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/conferenceObject7application/pdfhttp://dx.doi.org/10.1088/1742-6596/370/1/01202014th Latin American Workshop on Plasma Physics (lawpp 2011). Bristol: Iop Publishing Ltd, v. 370, p. 7, 2012.1742-6588http://hdl.handle.net/11449/841510.1088/1742-6596/370/1/012020WOS:000307752700020WOS000307752700020.pdf135386241453200545992676701507190000-0002-7734-40694599267670150719Web of Sciencereponame:Repositório Institucional da UNESPinstname:Universidade Estadual Paulista (UNESP)instacron:UNESPeng14th Latin American Workshop on Plasma Physics (lawpp 2011)0,241info:eu-repo/semantics/openAccess2023-11-22T06:17:16Zoai:repositorio.unesp.br:11449/8415Repositório InstitucionalPUBhttp://repositorio.unesp.br/oai/requestopendoar:29462024-08-05T18:26:47.470187Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)false |
dc.title.none.fl_str_mv |
Growth evolution of ZnO thin films deposited by RF magnetron sputtering |
title |
Growth evolution of ZnO thin films deposited by RF magnetron sputtering |
spellingShingle |
Growth evolution of ZnO thin films deposited by RF magnetron sputtering Rosa, A. M. [UNESP] |
title_short |
Growth evolution of ZnO thin films deposited by RF magnetron sputtering |
title_full |
Growth evolution of ZnO thin films deposited by RF magnetron sputtering |
title_fullStr |
Growth evolution of ZnO thin films deposited by RF magnetron sputtering |
title_full_unstemmed |
Growth evolution of ZnO thin films deposited by RF magnetron sputtering |
title_sort |
Growth evolution of ZnO thin films deposited by RF magnetron sputtering |
author |
Rosa, A. M. [UNESP] |
author_facet |
Rosa, A. M. [UNESP] Silva, E. P. da [UNESP] Amorim, E. [UNESP] Chaves, M. [UNESP] Catto, A. C. Lisboa Filho, Paulo Noronha [UNESP] Bortoleto, J. R. R. [UNESP] |
author_role |
author |
author2 |
Silva, E. P. da [UNESP] Amorim, E. [UNESP] Chaves, M. [UNESP] Catto, A. C. Lisboa Filho, Paulo Noronha [UNESP] Bortoleto, J. R. R. [UNESP] |
author2_role |
author author author author author author |
dc.contributor.none.fl_str_mv |
Universidade Estadual Paulista (Unesp) |
dc.contributor.author.fl_str_mv |
Rosa, A. M. [UNESP] Silva, E. P. da [UNESP] Amorim, E. [UNESP] Chaves, M. [UNESP] Catto, A. C. Lisboa Filho, Paulo Noronha [UNESP] Bortoleto, J. R. R. [UNESP] |
description |
We study the surface morphology evolution of ZnO thin films grown on glass substrates as a function of thickness by RF magnetron sputtering technique. The surface topography of the samples is measured by atomic force microscopy (AFM). All AFM images of the films are analyzed using scaling concepts. The results show that the surface morphology is initially formed by a small grains structure. The grains increase in size and height with growth time resulting in the formation of a mounds-like structure. The growth exponent, beta, and the exponent defining the evolution of the characteristic wavelength of the surface, p, amounted to beta = 0.76 +/- 0.08 and p = 0.3 +/- 0.05. From these exponents, the surface morphology is determined by the nonlocal shadowing effects, that is the dominant mechanism, due to the incident deposition particles during film growth. |
publishDate |
2012 |
dc.date.none.fl_str_mv |
2012-01-01 2014-05-20T13:26:12Z 2014-05-20T13:26:12Z |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/conferenceObject |
format |
conferenceObject |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://dx.doi.org/10.1088/1742-6596/370/1/012020 14th Latin American Workshop on Plasma Physics (lawpp 2011). Bristol: Iop Publishing Ltd, v. 370, p. 7, 2012. 1742-6588 http://hdl.handle.net/11449/8415 10.1088/1742-6596/370/1/012020 WOS:000307752700020 WOS000307752700020.pdf 1353862414532005 4599267670150719 0000-0002-7734-4069 4599267670150719 |
url |
http://dx.doi.org/10.1088/1742-6596/370/1/012020 http://hdl.handle.net/11449/8415 |
identifier_str_mv |
14th Latin American Workshop on Plasma Physics (lawpp 2011). Bristol: Iop Publishing Ltd, v. 370, p. 7, 2012. 1742-6588 10.1088/1742-6596/370/1/012020 WOS:000307752700020 WOS000307752700020.pdf 1353862414532005 4599267670150719 0000-0002-7734-4069 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
14th Latin American Workshop on Plasma Physics (lawpp 2011) 0,241 |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
7 application/pdf |
dc.publisher.none.fl_str_mv |
Iop Publishing Ltd |
publisher.none.fl_str_mv |
Iop Publishing Ltd |
dc.source.none.fl_str_mv |
Web of Science reponame:Repositório Institucional da UNESP instname:Universidade Estadual Paulista (UNESP) instacron:UNESP |
instname_str |
Universidade Estadual Paulista (UNESP) |
instacron_str |
UNESP |
institution |
UNESP |
reponame_str |
Repositório Institucional da UNESP |
collection |
Repositório Institucional da UNESP |
repository.name.fl_str_mv |
Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP) |
repository.mail.fl_str_mv |
|
_version_ |
1808128933105762304 |