Analysis and measurement of the non-linear refractive index of SiOxNy using pedestal waveguides

Detalhes bibliográficos
Autor(a) principal: Sierra, Julian H.
Data de Publicação: 2019
Outros Autores: Carvalho, Daniel O. [UNESP], Samad, Ricardo E., Rangel, Ricardo C., Alayo, Marco, IEEE
Tipo de documento: Artigo de conferência
Idioma: eng
Título da fonte: Repositório Institucional da UNESP
Texto Completo: http://hdl.handle.net/11449/195391
Resumo: In this work, the non-linear refractive index (n(2)) of silicon oxynitride (SiOxNy) is determined, obtaining a value for this material of n(2) = 2.11x10(-19) m(2)/W. The results demonstrate that this material has interesting properties for the development of non-linear optical devices. The paper presents in detail the waveguide fabrication process using the pedestal technique, which allows using different materials since it does not require etching to define the sidewalls of the waveguides. We show the results of the measurement of the n(2) employing the non-linear optical phenomena of Self-Phase Modulation (SPM).
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spelling Analysis and measurement of the non-linear refractive index of SiOxNy using pedestal waveguidesoptical devicesnon-linear photonicssilicon oxynitrideself-phase modulationnon-linear refractive indexintegrated photonicsmicroelectronicsIn this work, the non-linear refractive index (n(2)) of silicon oxynitride (SiOxNy) is determined, obtaining a value for this material of n(2) = 2.11x10(-19) m(2)/W. The results demonstrate that this material has interesting properties for the development of non-linear optical devices. The paper presents in detail the waveguide fabrication process using the pedestal technique, which allows using different materials since it does not require etching to define the sidewalls of the waveguides. We show the results of the measurement of the n(2) employing the non-linear optical phenomena of Self-Phase Modulation (SPM).Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES)Univ Sao Paulo, Polytech Sch, Sao Paulo, BrazilSao Paulo State Univ UNESP, Telecommun Dept, Sao Joao De Boa Vista, SP, BrazilIPEN CNEN SP, Ctr Lasers & Applicat, Sao Paulo, BrazilSao Paulo State Technol Coll FATEC, Sao Paulo, BrazilSao Paulo State Univ UNESP, Telecommun Dept, Sao Joao De Boa Vista, SP, BrazilCNPq: 432088/2018-0CNPq: 305447/2017-3CAPES: 88882.333330/2019-01IeeeUniversidade de São Paulo (USP)Universidade Estadual Paulista (Unesp)IPEN CNEN SPSao Paulo State Technol Coll FATECSierra, Julian H.Carvalho, Daniel O. [UNESP]Samad, Ricardo E.Rangel, Ricardo C.Alayo, MarcoIEEE2020-12-10T17:33:06Z2020-12-10T17:33:06Z2019-01-01info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/conferenceObject52019 34th Symposium On Microelectronics Technology And Devices (sbmicro 2019). New York: Ieee, 5 p., 2019.http://hdl.handle.net/11449/195391WOS:000534490900048Web of Sciencereponame:Repositório Institucional da UNESPinstname:Universidade Estadual Paulista (UNESP)instacron:UNESPeng2019 34th Symposium On Microelectronics Technology And Devices (sbmicro 2019)info:eu-repo/semantics/openAccess2021-10-22T13:12:34Zoai:repositorio.unesp.br:11449/195391Repositório InstitucionalPUBhttp://repositorio.unesp.br/oai/requestopendoar:29462024-08-05T16:49:08.622806Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)false
dc.title.none.fl_str_mv Analysis and measurement of the non-linear refractive index of SiOxNy using pedestal waveguides
title Analysis and measurement of the non-linear refractive index of SiOxNy using pedestal waveguides
spellingShingle Analysis and measurement of the non-linear refractive index of SiOxNy using pedestal waveguides
Sierra, Julian H.
optical devices
non-linear photonics
silicon oxynitride
self-phase modulation
non-linear refractive index
integrated photonics
microelectronics
title_short Analysis and measurement of the non-linear refractive index of SiOxNy using pedestal waveguides
title_full Analysis and measurement of the non-linear refractive index of SiOxNy using pedestal waveguides
title_fullStr Analysis and measurement of the non-linear refractive index of SiOxNy using pedestal waveguides
title_full_unstemmed Analysis and measurement of the non-linear refractive index of SiOxNy using pedestal waveguides
title_sort Analysis and measurement of the non-linear refractive index of SiOxNy using pedestal waveguides
author Sierra, Julian H.
author_facet Sierra, Julian H.
Carvalho, Daniel O. [UNESP]
Samad, Ricardo E.
Rangel, Ricardo C.
Alayo, Marco
IEEE
author_role author
author2 Carvalho, Daniel O. [UNESP]
Samad, Ricardo E.
Rangel, Ricardo C.
Alayo, Marco
IEEE
author2_role author
author
author
author
author
dc.contributor.none.fl_str_mv Universidade de São Paulo (USP)
Universidade Estadual Paulista (Unesp)
IPEN CNEN SP
Sao Paulo State Technol Coll FATEC
dc.contributor.author.fl_str_mv Sierra, Julian H.
Carvalho, Daniel O. [UNESP]
Samad, Ricardo E.
Rangel, Ricardo C.
Alayo, Marco
IEEE
dc.subject.por.fl_str_mv optical devices
non-linear photonics
silicon oxynitride
self-phase modulation
non-linear refractive index
integrated photonics
microelectronics
topic optical devices
non-linear photonics
silicon oxynitride
self-phase modulation
non-linear refractive index
integrated photonics
microelectronics
description In this work, the non-linear refractive index (n(2)) of silicon oxynitride (SiOxNy) is determined, obtaining a value for this material of n(2) = 2.11x10(-19) m(2)/W. The results demonstrate that this material has interesting properties for the development of non-linear optical devices. The paper presents in detail the waveguide fabrication process using the pedestal technique, which allows using different materials since it does not require etching to define the sidewalls of the waveguides. We show the results of the measurement of the n(2) employing the non-linear optical phenomena of Self-Phase Modulation (SPM).
publishDate 2019
dc.date.none.fl_str_mv 2019-01-01
2020-12-10T17:33:06Z
2020-12-10T17:33:06Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/conferenceObject
format conferenceObject
status_str publishedVersion
dc.identifier.uri.fl_str_mv 2019 34th Symposium On Microelectronics Technology And Devices (sbmicro 2019). New York: Ieee, 5 p., 2019.
http://hdl.handle.net/11449/195391
WOS:000534490900048
identifier_str_mv 2019 34th Symposium On Microelectronics Technology And Devices (sbmicro 2019). New York: Ieee, 5 p., 2019.
WOS:000534490900048
url http://hdl.handle.net/11449/195391
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv 2019 34th Symposium On Microelectronics Technology And Devices (sbmicro 2019)
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv 5
dc.publisher.none.fl_str_mv Ieee
publisher.none.fl_str_mv Ieee
dc.source.none.fl_str_mv Web of Science
reponame:Repositório Institucional da UNESP
instname:Universidade Estadual Paulista (UNESP)
instacron:UNESP
instname_str Universidade Estadual Paulista (UNESP)
instacron_str UNESP
institution UNESP
reponame_str Repositório Institucional da UNESP
collection Repositório Institucional da UNESP
repository.name.fl_str_mv Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)
repository.mail.fl_str_mv
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