Direct photo-oxidation and superoxide radical as major responsible for dye photodegradation mechanism promoted by TiO2–rGO heterostructure

Detalhes bibliográficos
Autor(a) principal: Byzynski, Gabriela [UNESP]
Data de Publicação: 2018
Outros Autores: Volanti, Diogo P. [UNESP], Ribeiro, Cauê, Mastelaro, Valmor R., Longo, Elson
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Institucional da UNESP
Texto Completo: http://dx.doi.org/10.1007/s10854-018-9799-0
http://hdl.handle.net/11449/171332
Resumo: The increase in photocatalytic activity of reduced graphene oxide–TiO2 heterostructures under ultraviolet and visible illumination is already well known, as the photocatalyst mechanism modifications with heterostructure formation. However, which step in the degradation mechanism is modified with reduced graphene oxide–TiO2 heterostructure formation has been not demonstrated yet. These specific modifications are caused by the alteration in reactive oxygen species production. In this way, the goal of this study is defined which reactive oxygen species are produced by reduced graphene oxide–TiO2 heterostructure in the photocatalytic mechanism. A fast synthesis method to obtain this heterostructure by the microwave-assisted solvothermal method is presented, obtaining an improvement of photocatalytic efficiency, under UV and visible illumination. The non-hydrolytic method favors a better distribution of TiO2 nanoparticles around the reduced graphene oxide structure and inhabits the charge carrier recombination, showing a faster electron transfer than TiO2 samples. The RhB discoloration mechanism confirms that the reduced graphene oxide presence modifies the main reactive oxygen species produced. Under UV illumination, O2H* radical is the dominant reactive oxygen species produced by TiO2. For the heterostructure, the direct oxidation by oxygen vacancy is the primary mechanism step. Under visible illumination, O2H* is the main reactive oxygen species for both materials. The results present a better understanding of principal reasons related to the improvement in photocatalytic activity and could be useful in semiconductor heterostructure design.
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spelling Direct photo-oxidation and superoxide radical as major responsible for dye photodegradation mechanism promoted by TiO2–rGO heterostructureThe increase in photocatalytic activity of reduced graphene oxide–TiO2 heterostructures under ultraviolet and visible illumination is already well known, as the photocatalyst mechanism modifications with heterostructure formation. However, which step in the degradation mechanism is modified with reduced graphene oxide–TiO2 heterostructure formation has been not demonstrated yet. These specific modifications are caused by the alteration in reactive oxygen species production. In this way, the goal of this study is defined which reactive oxygen species are produced by reduced graphene oxide–TiO2 heterostructure in the photocatalytic mechanism. A fast synthesis method to obtain this heterostructure by the microwave-assisted solvothermal method is presented, obtaining an improvement of photocatalytic efficiency, under UV and visible illumination. The non-hydrolytic method favors a better distribution of TiO2 nanoparticles around the reduced graphene oxide structure and inhabits the charge carrier recombination, showing a faster electron transfer than TiO2 samples. The RhB discoloration mechanism confirms that the reduced graphene oxide presence modifies the main reactive oxygen species produced. Under UV illumination, O2H* radical is the dominant reactive oxygen species produced by TiO2. For the heterostructure, the direct oxidation by oxygen vacancy is the primary mechanism step. Under visible illumination, O2H* is the main reactive oxygen species for both materials. The results present a better understanding of principal reasons related to the improvement in photocatalytic activity and could be useful in semiconductor heterostructure design.Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)Fundação de Amparo à Pesquisa do Estado do Rio Grande do SulFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)IQ UNESP São Paulo State University, Av. Prof. Francisco Degni, 55 - Jardim QuitandinhaIBILCE UNESP São Paulo State UniversityEmbrapa InstrumentationPhysics Institute of São Carlos USPDQ UFSCar Federal University of São CarlosIQ UNESP São Paulo State University, Av. Prof. Francisco Degni, 55 - Jardim QuitandinhaIBILCE UNESP São Paulo State UniversityCNPq: #444926/2014-3Fundação de Amparo à Pesquisa do Estado do Rio Grande do Sul: CEPID 2013/07296-2Fundação de Amparo à Pesquisa do Estado do Rio Grande do Sul: grant #2012/26671-9FAPESP: grant #2014/11410-8Fundação de Amparo à Pesquisa do Estado do Rio Grande do Sul: grant #2014/17343-0Fundação de Amparo à Pesquisa do Estado do Rio Grande do Sul: grant #2015/04511-5Fundação de Amparo à Pesquisa do Estado do Rio Grande do Sul: grant #2017/01267-1Universidade Estadual Paulista (Unesp)Empresa Brasileira de Pesquisa Agropecuária (EMBRAPA)Universidade de São Paulo (USP)Universidade Federal de São Carlos (UFSCar)Byzynski, Gabriela [UNESP]Volanti, Diogo P. [UNESP]Ribeiro, CauêMastelaro, Valmor R.Longo, Elson2018-12-11T16:54:55Z2018-12-11T16:54:55Z2018-10-01info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/article17022-17037application/pdfhttp://dx.doi.org/10.1007/s10854-018-9799-0Journal of Materials Science: Materials in Electronics, v. 29, n. 19, p. 17022-17037, 2018.1573-482X0957-4522http://hdl.handle.net/11449/17133210.1007/s10854-018-9799-02-s2.0-850514980822-s2.0-85051498082.pdf23547399804067250000-0001-9315-9392Scopusreponame:Repositório Institucional da UNESPinstname:Universidade Estadual Paulista (UNESP)instacron:UNESPengJournal of Materials Science: Materials in Electronics0,503info:eu-repo/semantics/openAccess2024-01-20T06:30:07Zoai:repositorio.unesp.br:11449/171332Repositório InstitucionalPUBhttp://repositorio.unesp.br/oai/requestopendoar:29462024-08-05T23:28:38.279700Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)false
dc.title.none.fl_str_mv Direct photo-oxidation and superoxide radical as major responsible for dye photodegradation mechanism promoted by TiO2–rGO heterostructure
title Direct photo-oxidation and superoxide radical as major responsible for dye photodegradation mechanism promoted by TiO2–rGO heterostructure
spellingShingle Direct photo-oxidation and superoxide radical as major responsible for dye photodegradation mechanism promoted by TiO2–rGO heterostructure
Byzynski, Gabriela [UNESP]
title_short Direct photo-oxidation and superoxide radical as major responsible for dye photodegradation mechanism promoted by TiO2–rGO heterostructure
title_full Direct photo-oxidation and superoxide radical as major responsible for dye photodegradation mechanism promoted by TiO2–rGO heterostructure
title_fullStr Direct photo-oxidation and superoxide radical as major responsible for dye photodegradation mechanism promoted by TiO2–rGO heterostructure
title_full_unstemmed Direct photo-oxidation and superoxide radical as major responsible for dye photodegradation mechanism promoted by TiO2–rGO heterostructure
title_sort Direct photo-oxidation and superoxide radical as major responsible for dye photodegradation mechanism promoted by TiO2–rGO heterostructure
author Byzynski, Gabriela [UNESP]
author_facet Byzynski, Gabriela [UNESP]
Volanti, Diogo P. [UNESP]
Ribeiro, Cauê
Mastelaro, Valmor R.
Longo, Elson
author_role author
author2 Volanti, Diogo P. [UNESP]
Ribeiro, Cauê
Mastelaro, Valmor R.
Longo, Elson
author2_role author
author
author
author
dc.contributor.none.fl_str_mv Universidade Estadual Paulista (Unesp)
Empresa Brasileira de Pesquisa Agropecuária (EMBRAPA)
Universidade de São Paulo (USP)
Universidade Federal de São Carlos (UFSCar)
dc.contributor.author.fl_str_mv Byzynski, Gabriela [UNESP]
Volanti, Diogo P. [UNESP]
Ribeiro, Cauê
Mastelaro, Valmor R.
Longo, Elson
description The increase in photocatalytic activity of reduced graphene oxide–TiO2 heterostructures under ultraviolet and visible illumination is already well known, as the photocatalyst mechanism modifications with heterostructure formation. However, which step in the degradation mechanism is modified with reduced graphene oxide–TiO2 heterostructure formation has been not demonstrated yet. These specific modifications are caused by the alteration in reactive oxygen species production. In this way, the goal of this study is defined which reactive oxygen species are produced by reduced graphene oxide–TiO2 heterostructure in the photocatalytic mechanism. A fast synthesis method to obtain this heterostructure by the microwave-assisted solvothermal method is presented, obtaining an improvement of photocatalytic efficiency, under UV and visible illumination. The non-hydrolytic method favors a better distribution of TiO2 nanoparticles around the reduced graphene oxide structure and inhabits the charge carrier recombination, showing a faster electron transfer than TiO2 samples. The RhB discoloration mechanism confirms that the reduced graphene oxide presence modifies the main reactive oxygen species produced. Under UV illumination, O2H* radical is the dominant reactive oxygen species produced by TiO2. For the heterostructure, the direct oxidation by oxygen vacancy is the primary mechanism step. Under visible illumination, O2H* is the main reactive oxygen species for both materials. The results present a better understanding of principal reasons related to the improvement in photocatalytic activity and could be useful in semiconductor heterostructure design.
publishDate 2018
dc.date.none.fl_str_mv 2018-12-11T16:54:55Z
2018-12-11T16:54:55Z
2018-10-01
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://dx.doi.org/10.1007/s10854-018-9799-0
Journal of Materials Science: Materials in Electronics, v. 29, n. 19, p. 17022-17037, 2018.
1573-482X
0957-4522
http://hdl.handle.net/11449/171332
10.1007/s10854-018-9799-0
2-s2.0-85051498082
2-s2.0-85051498082.pdf
2354739980406725
0000-0001-9315-9392
url http://dx.doi.org/10.1007/s10854-018-9799-0
http://hdl.handle.net/11449/171332
identifier_str_mv Journal of Materials Science: Materials in Electronics, v. 29, n. 19, p. 17022-17037, 2018.
1573-482X
0957-4522
10.1007/s10854-018-9799-0
2-s2.0-85051498082
2-s2.0-85051498082.pdf
2354739980406725
0000-0001-9315-9392
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv Journal of Materials Science: Materials in Electronics
0,503
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv 17022-17037
application/pdf
dc.source.none.fl_str_mv Scopus
reponame:Repositório Institucional da UNESP
instname:Universidade Estadual Paulista (UNESP)
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instname_str Universidade Estadual Paulista (UNESP)
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institution UNESP
reponame_str Repositório Institucional da UNESP
collection Repositório Institucional da UNESP
repository.name.fl_str_mv Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)
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