Electrochemical Behavior of Titanium Nitride Thin Films Deposited on Silicon by Plasma Discharge Technique in Cathodic Cage

Detalhes bibliográficos
Autor(a) principal: Bottoni,Cintia de Laet Ravani
Data de Publicação: 2016
Outros Autores: Dias,Mauro César, Gontijo,L. C.
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Materials research (São Carlos. Online)
Texto Completo: http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392016000501098
Resumo: Titanium nitride films were deposited on silicon by plasma discharge in cathodic cage with holes and without holes on the sides. Each film was deposited with a pressure of 253 Pa, treatment time of 2 h, and at diverse conditions of temperature and gas flow of N2 and H2. The electrochemical polarization and electrochemical impedance techniques were used to understand the effect on the electrochemical properties of these films in relation to the presence or absence of holes on the sides of the cathodic cage and to investigate the electrochemical behavior of the films formed, which presented as both capacitive and resistive for the conditionsanalyzed.
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spelling Electrochemical Behavior of Titanium Nitride Thin Films Deposited on Silicon by Plasma Discharge Technique in Cathodic Cagethin filmstitanium nitridecathodic cageEISpolarizationTitanium nitride films were deposited on silicon by plasma discharge in cathodic cage with holes and without holes on the sides. Each film was deposited with a pressure of 253 Pa, treatment time of 2 h, and at diverse conditions of temperature and gas flow of N2 and H2. The electrochemical polarization and electrochemical impedance techniques were used to understand the effect on the electrochemical properties of these films in relation to the presence or absence of holes on the sides of the cathodic cage and to investigate the electrochemical behavior of the films formed, which presented as both capacitive and resistive for the conditionsanalyzed.ABM, ABC, ABPol2016-10-01info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersiontext/htmlhttp://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392016000501098Materials Research v.19 n.5 2016reponame:Materials research (São Carlos. Online)instname:Universidade Federal de São Carlos (UFSCAR)instacron:ABM ABC ABPOL10.1590/1980-5373-MR-2015-0241info:eu-repo/semantics/openAccessBottoni,Cintia de Laet RavaniDias,Mauro CésarGontijo,L. C.eng2016-09-27T00:00:00Zoai:scielo:S1516-14392016000501098Revistahttp://www.scielo.br/mrPUBhttps://old.scielo.br/oai/scielo-oai.phpdedz@power.ufscar.br1980-53731516-1439opendoar:2016-09-27T00:00Materials research (São Carlos. Online) - Universidade Federal de São Carlos (UFSCAR)false
dc.title.none.fl_str_mv Electrochemical Behavior of Titanium Nitride Thin Films Deposited on Silicon by Plasma Discharge Technique in Cathodic Cage
title Electrochemical Behavior of Titanium Nitride Thin Films Deposited on Silicon by Plasma Discharge Technique in Cathodic Cage
spellingShingle Electrochemical Behavior of Titanium Nitride Thin Films Deposited on Silicon by Plasma Discharge Technique in Cathodic Cage
Bottoni,Cintia de Laet Ravani
thin films
titanium nitride
cathodic cage
EIS
polarization
title_short Electrochemical Behavior of Titanium Nitride Thin Films Deposited on Silicon by Plasma Discharge Technique in Cathodic Cage
title_full Electrochemical Behavior of Titanium Nitride Thin Films Deposited on Silicon by Plasma Discharge Technique in Cathodic Cage
title_fullStr Electrochemical Behavior of Titanium Nitride Thin Films Deposited on Silicon by Plasma Discharge Technique in Cathodic Cage
title_full_unstemmed Electrochemical Behavior of Titanium Nitride Thin Films Deposited on Silicon by Plasma Discharge Technique in Cathodic Cage
title_sort Electrochemical Behavior of Titanium Nitride Thin Films Deposited on Silicon by Plasma Discharge Technique in Cathodic Cage
author Bottoni,Cintia de Laet Ravani
author_facet Bottoni,Cintia de Laet Ravani
Dias,Mauro César
Gontijo,L. C.
author_role author
author2 Dias,Mauro César
Gontijo,L. C.
author2_role author
author
dc.contributor.author.fl_str_mv Bottoni,Cintia de Laet Ravani
Dias,Mauro César
Gontijo,L. C.
dc.subject.por.fl_str_mv thin films
titanium nitride
cathodic cage
EIS
polarization
topic thin films
titanium nitride
cathodic cage
EIS
polarization
description Titanium nitride films were deposited on silicon by plasma discharge in cathodic cage with holes and without holes on the sides. Each film was deposited with a pressure of 253 Pa, treatment time of 2 h, and at diverse conditions of temperature and gas flow of N2 and H2. The electrochemical polarization and electrochemical impedance techniques were used to understand the effect on the electrochemical properties of these films in relation to the presence or absence of holes on the sides of the cathodic cage and to investigate the electrochemical behavior of the films formed, which presented as both capacitive and resistive for the conditionsanalyzed.
publishDate 2016
dc.date.none.fl_str_mv 2016-10-01
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392016000501098
url http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392016000501098
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv 10.1590/1980-5373-MR-2015-0241
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv text/html
dc.publisher.none.fl_str_mv ABM, ABC, ABPol
publisher.none.fl_str_mv ABM, ABC, ABPol
dc.source.none.fl_str_mv Materials Research v.19 n.5 2016
reponame:Materials research (São Carlos. Online)
instname:Universidade Federal de São Carlos (UFSCAR)
instacron:ABM ABC ABPOL
instname_str Universidade Federal de São Carlos (UFSCAR)
instacron_str ABM ABC ABPOL
institution ABM ABC ABPOL
reponame_str Materials research (São Carlos. Online)
collection Materials research (São Carlos. Online)
repository.name.fl_str_mv Materials research (São Carlos. Online) - Universidade Federal de São Carlos (UFSCAR)
repository.mail.fl_str_mv dedz@power.ufscar.br
_version_ 1754212668391030784

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