A critical review on the numerical simulation related to Physical Vapour Deposition
Autor(a) principal: | |
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Data de Publicação: | 2018 |
Outros Autores: | , , , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
Texto Completo: | http://hdl.handle.net/10400.22/15879 |
Resumo: | Physical Vapour Deposition (PVD) is a process usually used for the production of advanced coatings regarding its application in several industrial and current products, such as optical lens, moulds and dies, decorative parts or tools. This process has several variants due to its strong evolution along the last decades. The process is commonly assisted by plasma, creating a particular low pressure and medium temperature atmosphere, which is responsible for the transition of atomic particles between the target and the parts to be coated into a vacuum reactor. Several parameters are directly affecting the deposition, namely the substrate temperature, pressure inside the reactor, assisting gases used, type of current, power supply, bias, substrate and target materials, samples holder and corresponding rotation, deposition time, among others. Many mathematical models have been developed in order to allow the generation of numerical simulation applications, trying to combine parameters and expect the corresponding results. Numerical simulation applications were created around the mathematical models previously developed, which can play an important role in the prediction of the coating properties and structure. This paper intends to describe the numerical simulation evolution in the last years, namely the use of Finite Elements Method (FEM) and Computational Fluid Dynamics (CFD). |
id |
RCAP_5446285a3b265eb449bdbdbfea459ad3 |
---|---|
oai_identifier_str |
oai:recipp.ipp.pt:10400.22/15879 |
network_acronym_str |
RCAP |
network_name_str |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
repository_id_str |
7160 |
spelling |
A critical review on the numerical simulation related to Physical Vapour DepositionSimulationReactorPhysical Vapor DepositionCoatingNumerical ModellingFinite Element MethodComputational Fluid DynamicsPhysical Vapour Deposition (PVD) is a process usually used for the production of advanced coatings regarding its application in several industrial and current products, such as optical lens, moulds and dies, decorative parts or tools. This process has several variants due to its strong evolution along the last decades. The process is commonly assisted by plasma, creating a particular low pressure and medium temperature atmosphere, which is responsible for the transition of atomic particles between the target and the parts to be coated into a vacuum reactor. Several parameters are directly affecting the deposition, namely the substrate temperature, pressure inside the reactor, assisting gases used, type of current, power supply, bias, substrate and target materials, samples holder and corresponding rotation, deposition time, among others. Many mathematical models have been developed in order to allow the generation of numerical simulation applications, trying to combine parameters and expect the corresponding results. Numerical simulation applications were created around the mathematical models previously developed, which can play an important role in the prediction of the coating properties and structure. This paper intends to describe the numerical simulation evolution in the last years, namely the use of Finite Elements Method (FEM) and Computational Fluid Dynamics (CFD).ElsevierRepositório Científico do Instituto Politécnico do PortoPinto, Gustavo FilipeSilva, F.J.G.Porteiro, J.Míguez, J.L.Baptista, AndresaFernandes, L.2020-04-27T18:07:41Z20182018-01-01T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleapplication/pdfhttp://hdl.handle.net/10400.22/15879eng10.1016/j.promfg.2018.10.138info:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2023-03-13T13:00:43Zoai:recipp.ipp.pt:10400.22/15879Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireopendoar:71602024-03-19T17:35:33.420201Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse |
dc.title.none.fl_str_mv |
A critical review on the numerical simulation related to Physical Vapour Deposition |
title |
A critical review on the numerical simulation related to Physical Vapour Deposition |
spellingShingle |
A critical review on the numerical simulation related to Physical Vapour Deposition Pinto, Gustavo Filipe Simulation Reactor Physical Vapor Deposition Coating Numerical Modelling Finite Element Method Computational Fluid Dynamics |
title_short |
A critical review on the numerical simulation related to Physical Vapour Deposition |
title_full |
A critical review on the numerical simulation related to Physical Vapour Deposition |
title_fullStr |
A critical review on the numerical simulation related to Physical Vapour Deposition |
title_full_unstemmed |
A critical review on the numerical simulation related to Physical Vapour Deposition |
title_sort |
A critical review on the numerical simulation related to Physical Vapour Deposition |
author |
Pinto, Gustavo Filipe |
author_facet |
Pinto, Gustavo Filipe Silva, F.J.G. Porteiro, J. Míguez, J.L. Baptista, Andresa Fernandes, L. |
author_role |
author |
author2 |
Silva, F.J.G. Porteiro, J. Míguez, J.L. Baptista, Andresa Fernandes, L. |
author2_role |
author author author author author |
dc.contributor.none.fl_str_mv |
Repositório Científico do Instituto Politécnico do Porto |
dc.contributor.author.fl_str_mv |
Pinto, Gustavo Filipe Silva, F.J.G. Porteiro, J. Míguez, J.L. Baptista, Andresa Fernandes, L. |
dc.subject.por.fl_str_mv |
Simulation Reactor Physical Vapor Deposition Coating Numerical Modelling Finite Element Method Computational Fluid Dynamics |
topic |
Simulation Reactor Physical Vapor Deposition Coating Numerical Modelling Finite Element Method Computational Fluid Dynamics |
description |
Physical Vapour Deposition (PVD) is a process usually used for the production of advanced coatings regarding its application in several industrial and current products, such as optical lens, moulds and dies, decorative parts or tools. This process has several variants due to its strong evolution along the last decades. The process is commonly assisted by plasma, creating a particular low pressure and medium temperature atmosphere, which is responsible for the transition of atomic particles between the target and the parts to be coated into a vacuum reactor. Several parameters are directly affecting the deposition, namely the substrate temperature, pressure inside the reactor, assisting gases used, type of current, power supply, bias, substrate and target materials, samples holder and corresponding rotation, deposition time, among others. Many mathematical models have been developed in order to allow the generation of numerical simulation applications, trying to combine parameters and expect the corresponding results. Numerical simulation applications were created around the mathematical models previously developed, which can play an important role in the prediction of the coating properties and structure. This paper intends to describe the numerical simulation evolution in the last years, namely the use of Finite Elements Method (FEM) and Computational Fluid Dynamics (CFD). |
publishDate |
2018 |
dc.date.none.fl_str_mv |
2018 2018-01-01T00:00:00Z 2020-04-27T18:07:41Z |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://hdl.handle.net/10400.22/15879 |
url |
http://hdl.handle.net/10400.22/15879 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
10.1016/j.promfg.2018.10.138 |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
application/pdf |
dc.publisher.none.fl_str_mv |
Elsevier |
publisher.none.fl_str_mv |
Elsevier |
dc.source.none.fl_str_mv |
reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação instacron:RCAAP |
instname_str |
Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
instacron_str |
RCAAP |
institution |
RCAAP |
reponame_str |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
collection |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
repository.name.fl_str_mv |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
repository.mail.fl_str_mv |
|
_version_ |
1799131447289708544 |