Synthesis and characterization of nanostructured TiO2 and TiO2/W thin films deposited by co-sputtering
Autor(a) principal: | |
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Data de Publicação: | 2018 |
Outros Autores: | , , , , , , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Matéria (Rio de Janeiro. Online) |
Texto Completo: | http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1517-70762018000200475 |
Resumo: | ABSTRACT Nanostructured TiO2 and TiO2/W thin films were deposited on Corning glass substrates by RF and DC magnetron co-sputtering at room temperature, using three targets of TiO, Ti and W. After deposition, samples were subjected to an annealing treatment in air at 500 °C for 3 hrs. The effect of the annealing treatment and tungsten addition to the TiO2 matrix were studied by Raman spectroscopy and X-ray diffraction. Morphology and composition was studied with field emission scanning electron microscopy and optical characterization was made with UV-Vis spectroscopy. All the obtained samples presented an amorphous TiO2 phase; however, after the annealing treatment, a crystallization process from amorphous to anatase phase occurred with gain sizes between 15.6 and 18.3 nm, additionally, a small amount of rutile was also observable. The SEM images corroborated the XRD behavior, besides it was possible to calculate the thickness of the films which was greater for the W-doped films owing the extra power of the sputtering growth, and after the samples had the thermal treatment the thickness decreased due to a more organized structure. Finally, the UV-vis transmittance analysis revealed that the transmittance is higher in heat-treated films as compared to those without any thermal treatment; also, the TiO2 thin films showed a greater transmittance than the W doped TiO2 films, reaching 91%. The lack of transmittance in the non-thermal-treated films made it impossible to compute the band gap of the films; nevertheless, for the thermal-treated films the band gap had a minimal change to the classic TiO2 bang gap value, even for the W doped sample, providing them with the benefits of the tungsten within the same TiO2 structure due to a great homogenization on the structure. |
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Synthesis and characterization of nanostructured TiO2 and TiO2/W thin films deposited by co-sputteringSputteringTiO2annealing treatmentRamanXRDPhotoluminescenceUV-VisABSTRACT Nanostructured TiO2 and TiO2/W thin films were deposited on Corning glass substrates by RF and DC magnetron co-sputtering at room temperature, using three targets of TiO, Ti and W. After deposition, samples were subjected to an annealing treatment in air at 500 °C for 3 hrs. The effect of the annealing treatment and tungsten addition to the TiO2 matrix were studied by Raman spectroscopy and X-ray diffraction. Morphology and composition was studied with field emission scanning electron microscopy and optical characterization was made with UV-Vis spectroscopy. All the obtained samples presented an amorphous TiO2 phase; however, after the annealing treatment, a crystallization process from amorphous to anatase phase occurred with gain sizes between 15.6 and 18.3 nm, additionally, a small amount of rutile was also observable. The SEM images corroborated the XRD behavior, besides it was possible to calculate the thickness of the films which was greater for the W-doped films owing the extra power of the sputtering growth, and after the samples had the thermal treatment the thickness decreased due to a more organized structure. Finally, the UV-vis transmittance analysis revealed that the transmittance is higher in heat-treated films as compared to those without any thermal treatment; also, the TiO2 thin films showed a greater transmittance than the W doped TiO2 films, reaching 91%. The lack of transmittance in the non-thermal-treated films made it impossible to compute the band gap of the films; nevertheless, for the thermal-treated films the band gap had a minimal change to the classic TiO2 bang gap value, even for the W doped sample, providing them with the benefits of the tungsten within the same TiO2 structure due to a great homogenization on the structure.Laboratório de Hidrogênio, Coppe - Universidade Federal do Rio de Janeiroem cooperação com a Associação Brasileira do Hidrogênio, ABH22018-01-01info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersiontext/htmlhttp://old.scielo.br/scielo.php?script=sci_arttext&pid=S1517-70762018000200475Matéria (Rio de Janeiro) v.23 n.2 2018reponame:Matéria (Rio de Janeiro. Online)instname:Matéria (Rio de Janeiro. Online)instacron:RLAM10.1590/s1517-707620180002.0401info:eu-repo/semantics/openAccessGonzález,Leandro GarcíaPeredo,Luis ZamoraPérez,Daniel de Jesús AraujoGuevara,Joaquín VillalbaRamírez,Nelly FloresGarcía,Salomón Ramiro VásquezRomo,María Guadalupe GarnicaQuiroz,Teresa HernándezTorres,Julián Hernándezeng2018-07-16T00:00:00Zoai:scielo:S1517-70762018000200475Revistahttp://www.materia.coppe.ufrj.br/https://old.scielo.br/oai/scielo-oai.php||materia@labh2.coppe.ufrj.br1517-70761517-7076opendoar:2018-07-16T00:00Matéria (Rio de Janeiro. Online) - Matéria (Rio de Janeiro. Online)false |
dc.title.none.fl_str_mv |
Synthesis and characterization of nanostructured TiO2 and TiO2/W thin films deposited by co-sputtering |
title |
Synthesis and characterization of nanostructured TiO2 and TiO2/W thin films deposited by co-sputtering |
spellingShingle |
Synthesis and characterization of nanostructured TiO2 and TiO2/W thin films deposited by co-sputtering González,Leandro García Sputtering TiO2 annealing treatment Raman XRD Photoluminescence UV-Vis |
title_short |
Synthesis and characterization of nanostructured TiO2 and TiO2/W thin films deposited by co-sputtering |
title_full |
Synthesis and characterization of nanostructured TiO2 and TiO2/W thin films deposited by co-sputtering |
title_fullStr |
Synthesis and characterization of nanostructured TiO2 and TiO2/W thin films deposited by co-sputtering |
title_full_unstemmed |
Synthesis and characterization of nanostructured TiO2 and TiO2/W thin films deposited by co-sputtering |
title_sort |
Synthesis and characterization of nanostructured TiO2 and TiO2/W thin films deposited by co-sputtering |
author |
González,Leandro García |
author_facet |
González,Leandro García Peredo,Luis Zamora Pérez,Daniel de Jesús Araujo Guevara,Joaquín Villalba Ramírez,Nelly Flores García,Salomón Ramiro Vásquez Romo,María Guadalupe Garnica Quiroz,Teresa Hernández Torres,Julián Hernández |
author_role |
author |
author2 |
Peredo,Luis Zamora Pérez,Daniel de Jesús Araujo Guevara,Joaquín Villalba Ramírez,Nelly Flores García,Salomón Ramiro Vásquez Romo,María Guadalupe Garnica Quiroz,Teresa Hernández Torres,Julián Hernández |
author2_role |
author author author author author author author author |
dc.contributor.author.fl_str_mv |
González,Leandro García Peredo,Luis Zamora Pérez,Daniel de Jesús Araujo Guevara,Joaquín Villalba Ramírez,Nelly Flores García,Salomón Ramiro Vásquez Romo,María Guadalupe Garnica Quiroz,Teresa Hernández Torres,Julián Hernández |
dc.subject.por.fl_str_mv |
Sputtering TiO2 annealing treatment Raman XRD Photoluminescence UV-Vis |
topic |
Sputtering TiO2 annealing treatment Raman XRD Photoluminescence UV-Vis |
description |
ABSTRACT Nanostructured TiO2 and TiO2/W thin films were deposited on Corning glass substrates by RF and DC magnetron co-sputtering at room temperature, using three targets of TiO, Ti and W. After deposition, samples were subjected to an annealing treatment in air at 500 °C for 3 hrs. The effect of the annealing treatment and tungsten addition to the TiO2 matrix were studied by Raman spectroscopy and X-ray diffraction. Morphology and composition was studied with field emission scanning electron microscopy and optical characterization was made with UV-Vis spectroscopy. All the obtained samples presented an amorphous TiO2 phase; however, after the annealing treatment, a crystallization process from amorphous to anatase phase occurred with gain sizes between 15.6 and 18.3 nm, additionally, a small amount of rutile was also observable. The SEM images corroborated the XRD behavior, besides it was possible to calculate the thickness of the films which was greater for the W-doped films owing the extra power of the sputtering growth, and after the samples had the thermal treatment the thickness decreased due to a more organized structure. Finally, the UV-vis transmittance analysis revealed that the transmittance is higher in heat-treated films as compared to those without any thermal treatment; also, the TiO2 thin films showed a greater transmittance than the W doped TiO2 films, reaching 91%. The lack of transmittance in the non-thermal-treated films made it impossible to compute the band gap of the films; nevertheless, for the thermal-treated films the band gap had a minimal change to the classic TiO2 bang gap value, even for the W doped sample, providing them with the benefits of the tungsten within the same TiO2 structure due to a great homogenization on the structure. |
publishDate |
2018 |
dc.date.none.fl_str_mv |
2018-01-01 |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1517-70762018000200475 |
url |
http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1517-70762018000200475 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
10.1590/s1517-707620180002.0401 |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
text/html |
dc.publisher.none.fl_str_mv |
Laboratório de Hidrogênio, Coppe - Universidade Federal do Rio de Janeiro em cooperação com a Associação Brasileira do Hidrogênio, ABH2 |
publisher.none.fl_str_mv |
Laboratório de Hidrogênio, Coppe - Universidade Federal do Rio de Janeiro em cooperação com a Associação Brasileira do Hidrogênio, ABH2 |
dc.source.none.fl_str_mv |
Matéria (Rio de Janeiro) v.23 n.2 2018 reponame:Matéria (Rio de Janeiro. Online) instname:Matéria (Rio de Janeiro. Online) instacron:RLAM |
instname_str |
Matéria (Rio de Janeiro. Online) |
instacron_str |
RLAM |
institution |
RLAM |
reponame_str |
Matéria (Rio de Janeiro. Online) |
collection |
Matéria (Rio de Janeiro. Online) |
repository.name.fl_str_mv |
Matéria (Rio de Janeiro. Online) - Matéria (Rio de Janeiro. Online) |
repository.mail.fl_str_mv |
||materia@labh2.coppe.ufrj.br |
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1752126690687975424 |