Ion beam analyses in titanium nitride technology

Detalhes bibliográficos
Autor(a) principal: Baumvol, Israel Jacob Rabin
Data de Publicação: 1993
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Institucional da UFRGS
Texto Completo: http://hdl.handle.net/10183/118158
Resumo: TI e technology of hard coatings based on stoichiometric titanium nitride thin films has been inovated since the past few years in order to fulfill the demands for better performance and lower processing cost put by the large xale industrial users. The different strategies used to improve the performance consist in (i) modifying the coating composition by introducing otlier elements than Ti and N in the film (multicomponent coatings), (ii) modifying the coating structure by using multilayered composites, and (iii) altering the coating density and porosity by using plasma and ion beam assisted processes. All these different strategies bring about new materials which have to be characterized as an essential part of the refearch and development work. In the present article the use of ion beam analyses is de jcribed (mainly Rutherford backscattering and nuclear reaction analyses) to characterize the thickness, composition, depth profile, contamination and structure of new thin film protective coating materials based on titaniun nitride
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spelling Baumvol, Israel Jacob Rabin2015-06-25T02:00:15Z19930103-9733http://hdl.handle.net/10183/118158000056682TI e technology of hard coatings based on stoichiometric titanium nitride thin films has been inovated since the past few years in order to fulfill the demands for better performance and lower processing cost put by the large xale industrial users. The different strategies used to improve the performance consist in (i) modifying the coating composition by introducing otlier elements than Ti and N in the film (multicomponent coatings), (ii) modifying the coating structure by using multilayered composites, and (iii) altering the coating density and porosity by using plasma and ion beam assisted processes. All these different strategies bring about new materials which have to be characterized as an essential part of the refearch and development work. In the present article the use of ion beam analyses is de jcribed (mainly Rutherford backscattering and nuclear reaction analyses) to characterize the thickness, composition, depth profile, contamination and structure of new thin film protective coating materials based on titaniun nitrideapplication/pdfengBrazilian journal of physics. São Paulo. Vol. 23, no. 3 (1993), p. 243-252Física da matéria condensadaLigas de titânioFilmes finosRetroespalhamento rutherfordIon beam analyses in titanium nitride technologyinfo:eu-repo/semantics/articleinfo:eu-repo/semantics/otherinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/openAccessreponame:Repositório Institucional da UFRGSinstname:Universidade Federal do Rio Grande do Sul (UFRGS)instacron:UFRGSORIGINAL000056682.pdf000056682.pdfTexto completo (inglês)application/pdf357262http://www.lume.ufrgs.br/bitstream/10183/118158/1/000056682.pdfeffadb0eb2ceab043ba9e2c43c712dfaMD51TEXT000056682.pdf.txt000056682.pdf.txtExtracted Texttext/plain30202http://www.lume.ufrgs.br/bitstream/10183/118158/2/000056682.pdf.txta21ea40ca4ee70b06d3209c4cacbe374MD52THUMBNAIL000056682.pdf.jpg000056682.pdf.jpgGenerated Thumbnailimage/jpeg1897http://www.lume.ufrgs.br/bitstream/10183/118158/3/000056682.pdf.jpg1072a5b49dfb0addbaa648cb838d2688MD5310183/1181582021-06-26 04:41:49.958023oai:www.lume.ufrgs.br:10183/118158Repositório de PublicaçõesPUBhttps://lume.ufrgs.br/oai/requestopendoar:2021-06-26T07:41:49Repositório Institucional da UFRGS - Universidade Federal do Rio Grande do Sul (UFRGS)false
dc.title.pt_BR.fl_str_mv Ion beam analyses in titanium nitride technology
title Ion beam analyses in titanium nitride technology
spellingShingle Ion beam analyses in titanium nitride technology
Baumvol, Israel Jacob Rabin
Física da matéria condensada
Ligas de titânio
Filmes finos
Retroespalhamento rutherford
title_short Ion beam analyses in titanium nitride technology
title_full Ion beam analyses in titanium nitride technology
title_fullStr Ion beam analyses in titanium nitride technology
title_full_unstemmed Ion beam analyses in titanium nitride technology
title_sort Ion beam analyses in titanium nitride technology
author Baumvol, Israel Jacob Rabin
author_facet Baumvol, Israel Jacob Rabin
author_role author
dc.contributor.author.fl_str_mv Baumvol, Israel Jacob Rabin
dc.subject.por.fl_str_mv Física da matéria condensada
Ligas de titânio
Filmes finos
Retroespalhamento rutherford
topic Física da matéria condensada
Ligas de titânio
Filmes finos
Retroespalhamento rutherford
description TI e technology of hard coatings based on stoichiometric titanium nitride thin films has been inovated since the past few years in order to fulfill the demands for better performance and lower processing cost put by the large xale industrial users. The different strategies used to improve the performance consist in (i) modifying the coating composition by introducing otlier elements than Ti and N in the film (multicomponent coatings), (ii) modifying the coating structure by using multilayered composites, and (iii) altering the coating density and porosity by using plasma and ion beam assisted processes. All these different strategies bring about new materials which have to be characterized as an essential part of the refearch and development work. In the present article the use of ion beam analyses is de jcribed (mainly Rutherford backscattering and nuclear reaction analyses) to characterize the thickness, composition, depth profile, contamination and structure of new thin film protective coating materials based on titaniun nitride
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dc.relation.ispartof.pt_BR.fl_str_mv Brazilian journal of physics. São Paulo. Vol. 23, no. 3 (1993), p. 243-252
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