Transport properties of silicon implanted with bismuth
Autor(a) principal: | |
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Data de Publicação: | 1997 |
Outros Autores: | , , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Institucional da UFRGS |
Texto Completo: | http://hdl.handle.net/10183/104223 |
Resumo: | The Hall effect and resistivity of Si:Bi with donor concentration varying from 3.0X1017 to 1.4X1020 cm-3 were measured from room temperature down to 13 K. The samples were prepared by Bi1 implantation in Van der Pauw structures delineated in Si chips. The measured resistivities were compared with the ones calculated by a generalized Drude approach at similar temperatures and doping concentration, presenting fairly good agreement. The critical impurity concentration Nc of the metal-nonmetal transition was measured to be around 2X1019 cm-3. The critical concentration Nc was calculated by comparing the ionization energy of the insulating phase with the total energy of the metallic phase. This value of Nc agreed very well with the one obtained experimentally and the values estimated from other theoretical approaches. |
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Abramof, Eduardo G.Silva, Antonio Ferreira daSernelius, Bo E.Souza, Joel Pereira deBoudinov, Henri Ivanov2014-10-07T02:11:24Z19970163-1829http://hdl.handle.net/10183/104223000192456The Hall effect and resistivity of Si:Bi with donor concentration varying from 3.0X1017 to 1.4X1020 cm-3 were measured from room temperature down to 13 K. The samples were prepared by Bi1 implantation in Van der Pauw structures delineated in Si chips. The measured resistivities were compared with the ones calculated by a generalized Drude approach at similar temperatures and doping concentration, presenting fairly good agreement. The critical impurity concentration Nc of the metal-nonmetal transition was measured to be around 2X1019 cm-3. The critical concentration Nc was calculated by comparing the ionization energy of the insulating phase with the total energy of the metallic phase. This value of Nc agreed very well with the one obtained experimentally and the values estimated from other theoretical approaches.application/pdfengPhysical review. B, Condensed matter. New York. Vol. 55, no. 15 (Apr. 1997), p. 9584-9589Física da matéria condensadaSilícioSemicondutoresTransport properties of silicon implanted with bismuthEstrangeiroinfo:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/openAccessreponame:Repositório Institucional da UFRGSinstname:Universidade Federal do Rio Grande do Sul (UFRGS)instacron:UFRGSORIGINAL000192456.pdf000192456.pdfTexto completo (inglês)application/pdf106621http://www.lume.ufrgs.br/bitstream/10183/104223/1/000192456.pdf94b3ce9c2b11b232d30d59188b53c9e8MD51TEXT000192456.pdf.txt000192456.pdf.txtExtracted Texttext/plain21849http://www.lume.ufrgs.br/bitstream/10183/104223/2/000192456.pdf.txtc3e5e82fc8bf4b1062065d90f67bfd37MD5210183/1042232022-02-22 05:09:00.982381oai:www.lume.ufrgs.br:10183/104223Repositório de PublicaçõesPUBhttps://lume.ufrgs.br/oai/requestopendoar:2022-02-22T08:09Repositório Institucional da UFRGS - Universidade Federal do Rio Grande do Sul (UFRGS)false |
dc.title.pt_BR.fl_str_mv |
Transport properties of silicon implanted with bismuth |
title |
Transport properties of silicon implanted with bismuth |
spellingShingle |
Transport properties of silicon implanted with bismuth Abramof, Eduardo G. Física da matéria condensada Silício Semicondutores |
title_short |
Transport properties of silicon implanted with bismuth |
title_full |
Transport properties of silicon implanted with bismuth |
title_fullStr |
Transport properties of silicon implanted with bismuth |
title_full_unstemmed |
Transport properties of silicon implanted with bismuth |
title_sort |
Transport properties of silicon implanted with bismuth |
author |
Abramof, Eduardo G. |
author_facet |
Abramof, Eduardo G. Silva, Antonio Ferreira da Sernelius, Bo E. Souza, Joel Pereira de Boudinov, Henri Ivanov |
author_role |
author |
author2 |
Silva, Antonio Ferreira da Sernelius, Bo E. Souza, Joel Pereira de Boudinov, Henri Ivanov |
author2_role |
author author author author |
dc.contributor.author.fl_str_mv |
Abramof, Eduardo G. Silva, Antonio Ferreira da Sernelius, Bo E. Souza, Joel Pereira de Boudinov, Henri Ivanov |
dc.subject.por.fl_str_mv |
Física da matéria condensada Silício Semicondutores |
topic |
Física da matéria condensada Silício Semicondutores |
description |
The Hall effect and resistivity of Si:Bi with donor concentration varying from 3.0X1017 to 1.4X1020 cm-3 were measured from room temperature down to 13 K. The samples were prepared by Bi1 implantation in Van der Pauw structures delineated in Si chips. The measured resistivities were compared with the ones calculated by a generalized Drude approach at similar temperatures and doping concentration, presenting fairly good agreement. The critical impurity concentration Nc of the metal-nonmetal transition was measured to be around 2X1019 cm-3. The critical concentration Nc was calculated by comparing the ionization energy of the insulating phase with the total energy of the metallic phase. This value of Nc agreed very well with the one obtained experimentally and the values estimated from other theoretical approaches. |
publishDate |
1997 |
dc.date.issued.fl_str_mv |
1997 |
dc.date.accessioned.fl_str_mv |
2014-10-07T02:11:24Z |
dc.type.driver.fl_str_mv |
Estrangeiro info:eu-repo/semantics/article |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://hdl.handle.net/10183/104223 |
dc.identifier.issn.pt_BR.fl_str_mv |
0163-1829 |
dc.identifier.nrb.pt_BR.fl_str_mv |
000192456 |
identifier_str_mv |
0163-1829 000192456 |
url |
http://hdl.handle.net/10183/104223 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.ispartof.pt_BR.fl_str_mv |
Physical review. B, Condensed matter. New York. Vol. 55, no. 15 (Apr. 1997), p. 9584-9589 |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
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application/pdf |
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UFRGS |
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Repositório Institucional da UFRGS |
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