Structure of the Electrical Double Layer at the Interface between an Ionic Liquid and Tungsten Oxide in Ion-Gated Transistors
Autor(a) principal: | |
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Data de Publicação: | 2020 |
Outros Autores: | , , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Institucional da UNESP |
Texto Completo: | http://dx.doi.org/10.1021/acs.jpclett.0c00651 http://hdl.handle.net/11449/196903 |
Resumo: | The structure of electrical double layers at electrified interfaces is of utmost importance for electrochemical energy storage as well as printable, flexible, and bioelectronic devices, such as ion-gated transistors (IGTs). Here we report a study based on atomic force microscopy force-distance profiling on electrical double layers forming at the interface between the ionic liquid 1-ethyl-3-methylimidazolium bis(trifluoromethylsulfonyl)imide and sol-gel films of mesoporous tungsten oxide. We successfully followed, under in operando conditions, the evolution of the arrangement of the ions at the interface with the tungsten oxide films used as channel materials in IGTs. Our work sheds light on the mechanism of operation of IGTs, thus offering the possibility of optimizing their performance. |
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Repositório Institucional da UNESP |
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Structure of the Electrical Double Layer at the Interface between an Ionic Liquid and Tungsten Oxide in Ion-Gated TransistorsThe structure of electrical double layers at electrified interfaces is of utmost importance for electrochemical energy storage as well as printable, flexible, and bioelectronic devices, such as ion-gated transistors (IGTs). Here we report a study based on atomic force microscopy force-distance profiling on electrical double layers forming at the interface between the ionic liquid 1-ethyl-3-methylimidazolium bis(trifluoromethylsulfonyl)imide and sol-gel films of mesoporous tungsten oxide. We successfully followed, under in operando conditions, the evolution of the arrangement of the ions at the interface with the tungsten oxide films used as channel materials in IGTs. Our work sheds light on the mechanism of operation of IGTs, thus offering the possibility of optimizing their performance.Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES)Fluid Interface Reactions, Structures and Transport (FIRST) Center, an Energy Frontier Research Center (EFRC) - DOE Office of Science, Office of Basic Energy SciencesNSERCUniv Estadual Paulista, Dept Fis Quim, BR-14800060 Araraquara, SP, BrazilPolytech Montreal, Dept Genie Phys, Montreal, PQ H3C 3A7, CanadaOak Ridge Natl Lab, Ctr Nanophase Mat Sci, Oak Ridge, TN 37831 USAUniv Estadual Paulista, Dept Fis Quim, BR-14800060 Araraquara, SP, BrazilCAPES: FAPESP/CAPES 2014/27079-9CAPES: 2015/50526-4CAPES: 2016/09033-7Amer Chemical SocUniversidade Estadual Paulista (Unesp)Polytech MontrealOak Ridge Natl LabBarbosa, Martin S. [UNESP]Balke, NinaTsai, Wan-YuSantato, ClaraOrlandi, Marcelo O. [UNESP]2020-12-10T19:59:50Z2020-12-10T19:59:50Z2020-05-07info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/article3257-3262http://dx.doi.org/10.1021/acs.jpclett.0c00651Journal Of Physical Chemistry Letters. Washington: Amer Chemical Soc, v. 11, n. 9, p. 3257-3262, 2020.1948-7185http://hdl.handle.net/11449/19690310.1021/acs.jpclett.0c00651WOS:000535177500013Web of Sciencereponame:Repositório Institucional da UNESPinstname:Universidade Estadual Paulista (UNESP)instacron:UNESPengJournal Of Physical Chemistry Lettersinfo:eu-repo/semantics/openAccess2021-10-23T10:10:59Zoai:repositorio.unesp.br:11449/196903Repositório InstitucionalPUBhttp://repositorio.unesp.br/oai/requestopendoar:29462021-10-23T10:10:59Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)false |
dc.title.none.fl_str_mv |
Structure of the Electrical Double Layer at the Interface between an Ionic Liquid and Tungsten Oxide in Ion-Gated Transistors |
title |
Structure of the Electrical Double Layer at the Interface between an Ionic Liquid and Tungsten Oxide in Ion-Gated Transistors |
spellingShingle |
Structure of the Electrical Double Layer at the Interface between an Ionic Liquid and Tungsten Oxide in Ion-Gated Transistors Barbosa, Martin S. [UNESP] |
title_short |
Structure of the Electrical Double Layer at the Interface between an Ionic Liquid and Tungsten Oxide in Ion-Gated Transistors |
title_full |
Structure of the Electrical Double Layer at the Interface between an Ionic Liquid and Tungsten Oxide in Ion-Gated Transistors |
title_fullStr |
Structure of the Electrical Double Layer at the Interface between an Ionic Liquid and Tungsten Oxide in Ion-Gated Transistors |
title_full_unstemmed |
Structure of the Electrical Double Layer at the Interface between an Ionic Liquid and Tungsten Oxide in Ion-Gated Transistors |
title_sort |
Structure of the Electrical Double Layer at the Interface between an Ionic Liquid and Tungsten Oxide in Ion-Gated Transistors |
author |
Barbosa, Martin S. [UNESP] |
author_facet |
Barbosa, Martin S. [UNESP] Balke, Nina Tsai, Wan-Yu Santato, Clara Orlandi, Marcelo O. [UNESP] |
author_role |
author |
author2 |
Balke, Nina Tsai, Wan-Yu Santato, Clara Orlandi, Marcelo O. [UNESP] |
author2_role |
author author author author |
dc.contributor.none.fl_str_mv |
Universidade Estadual Paulista (Unesp) Polytech Montreal Oak Ridge Natl Lab |
dc.contributor.author.fl_str_mv |
Barbosa, Martin S. [UNESP] Balke, Nina Tsai, Wan-Yu Santato, Clara Orlandi, Marcelo O. [UNESP] |
description |
The structure of electrical double layers at electrified interfaces is of utmost importance for electrochemical energy storage as well as printable, flexible, and bioelectronic devices, such as ion-gated transistors (IGTs). Here we report a study based on atomic force microscopy force-distance profiling on electrical double layers forming at the interface between the ionic liquid 1-ethyl-3-methylimidazolium bis(trifluoromethylsulfonyl)imide and sol-gel films of mesoporous tungsten oxide. We successfully followed, under in operando conditions, the evolution of the arrangement of the ions at the interface with the tungsten oxide films used as channel materials in IGTs. Our work sheds light on the mechanism of operation of IGTs, thus offering the possibility of optimizing their performance. |
publishDate |
2020 |
dc.date.none.fl_str_mv |
2020-12-10T19:59:50Z 2020-12-10T19:59:50Z 2020-05-07 |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://dx.doi.org/10.1021/acs.jpclett.0c00651 Journal Of Physical Chemistry Letters. Washington: Amer Chemical Soc, v. 11, n. 9, p. 3257-3262, 2020. 1948-7185 http://hdl.handle.net/11449/196903 10.1021/acs.jpclett.0c00651 WOS:000535177500013 |
url |
http://dx.doi.org/10.1021/acs.jpclett.0c00651 http://hdl.handle.net/11449/196903 |
identifier_str_mv |
Journal Of Physical Chemistry Letters. Washington: Amer Chemical Soc, v. 11, n. 9, p. 3257-3262, 2020. 1948-7185 10.1021/acs.jpclett.0c00651 WOS:000535177500013 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
Journal Of Physical Chemistry Letters |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
3257-3262 |
dc.publisher.none.fl_str_mv |
Amer Chemical Soc |
publisher.none.fl_str_mv |
Amer Chemical Soc |
dc.source.none.fl_str_mv |
Web of Science reponame:Repositório Institucional da UNESP instname:Universidade Estadual Paulista (UNESP) instacron:UNESP |
instname_str |
Universidade Estadual Paulista (UNESP) |
instacron_str |
UNESP |
institution |
UNESP |
reponame_str |
Repositório Institucional da UNESP |
collection |
Repositório Institucional da UNESP |
repository.name.fl_str_mv |
Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP) |
repository.mail.fl_str_mv |
|
_version_ |
1799965171656949760 |