Thin Tin and Tio2 Film Deposition in Glass Samples by Cathodic Cage

Detalhes bibliográficos
Autor(a) principal: Sousa,Rômulo Ribeiro Magalhães de
Data de Publicação: 2015
Outros Autores: Araújo,Francisco Odolberto de, Costa,Thercio Henrique de Carvalho, Nascimento,Igor Oliveira, Santos,Francisco Eroni Paes, Alves Júnior,Clodomiro, Feitor,Michelle Cequeira
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Materials research (São Carlos. Online)
Texto Completo: http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392015000200347
Resumo: Thin nitride and titanium dioxide films were produced using an innovative technique called cathodic cage depositon. Uniformity, three-dimensionality and high rate deposition are some of the advantages of this technique. In this study we discuss the influences of temperature, treatment time and gaseous atmosphere on the characteristics of the deposited films. The TiN (titanium nitride) and TiO2 (titanium dioxide) films were produced using a high deposition rate of 2,5 µm/h at a work temperature and pressure of 400°C and 150 Pa respectively. EDS technique was used to identify the chemical composition of the thin film deposited, whilst Raman spectroscopy indicated the phases present confirmed by DRX analysis. The thickness of the deposited films was studied using electron microscopy scanning. The results based on the deposition parameters confirm the great efficiency and versatility of this technique, which allows a uniform three-dimensional film deposition on any material without the appearance of stress. Compared to other techniques, cathodic cage deposition enables deposition at lower temperatures and higher pressures.
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spelling Thin Tin and Tio2 Film Deposition in Glass Samples by Cathodic Cagetitanium nitridecathodic cagetitanium dioxidethin films and hollow cathodeThin nitride and titanium dioxide films were produced using an innovative technique called cathodic cage depositon. Uniformity, three-dimensionality and high rate deposition are some of the advantages of this technique. In this study we discuss the influences of temperature, treatment time and gaseous atmosphere on the characteristics of the deposited films. The TiN (titanium nitride) and TiO2 (titanium dioxide) films were produced using a high deposition rate of 2,5 µm/h at a work temperature and pressure of 400°C and 150 Pa respectively. EDS technique was used to identify the chemical composition of the thin film deposited, whilst Raman spectroscopy indicated the phases present confirmed by DRX analysis. The thickness of the deposited films was studied using electron microscopy scanning. The results based on the deposition parameters confirm the great efficiency and versatility of this technique, which allows a uniform three-dimensional film deposition on any material without the appearance of stress. Compared to other techniques, cathodic cage deposition enables deposition at lower temperatures and higher pressures.ABM, ABC, ABPol2015-04-01info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersiontext/htmlhttp://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392015000200347Materials Research v.18 n.2 2015reponame:Materials research (São Carlos. Online)instname:Universidade Federal de São Carlos (UFSCAR)instacron:ABM ABC ABPOL10.1590/1516-1439.313914info:eu-repo/semantics/openAccessSousa,Rômulo Ribeiro Magalhães deAraújo,Francisco Odolberto deCosta,Thercio Henrique de CarvalhoNascimento,Igor OliveiraSantos,Francisco Eroni PaesAlves Júnior,ClodomiroFeitor,Michelle Cequeiraeng2016-06-10T00:00:00Zoai:scielo:S1516-14392015000200347Revistahttp://www.scielo.br/mrPUBhttps://old.scielo.br/oai/scielo-oai.phpdedz@power.ufscar.br1980-53731516-1439opendoar:2016-06-10T00:00Materials research (São Carlos. Online) - Universidade Federal de São Carlos (UFSCAR)false
dc.title.none.fl_str_mv Thin Tin and Tio2 Film Deposition in Glass Samples by Cathodic Cage
title Thin Tin and Tio2 Film Deposition in Glass Samples by Cathodic Cage
spellingShingle Thin Tin and Tio2 Film Deposition in Glass Samples by Cathodic Cage
Sousa,Rômulo Ribeiro Magalhães de
titanium nitride
cathodic cage
titanium dioxide
thin films and hollow cathode
title_short Thin Tin and Tio2 Film Deposition in Glass Samples by Cathodic Cage
title_full Thin Tin and Tio2 Film Deposition in Glass Samples by Cathodic Cage
title_fullStr Thin Tin and Tio2 Film Deposition in Glass Samples by Cathodic Cage
title_full_unstemmed Thin Tin and Tio2 Film Deposition in Glass Samples by Cathodic Cage
title_sort Thin Tin and Tio2 Film Deposition in Glass Samples by Cathodic Cage
author Sousa,Rômulo Ribeiro Magalhães de
author_facet Sousa,Rômulo Ribeiro Magalhães de
Araújo,Francisco Odolberto de
Costa,Thercio Henrique de Carvalho
Nascimento,Igor Oliveira
Santos,Francisco Eroni Paes
Alves Júnior,Clodomiro
Feitor,Michelle Cequeira
author_role author
author2 Araújo,Francisco Odolberto de
Costa,Thercio Henrique de Carvalho
Nascimento,Igor Oliveira
Santos,Francisco Eroni Paes
Alves Júnior,Clodomiro
Feitor,Michelle Cequeira
author2_role author
author
author
author
author
author
dc.contributor.author.fl_str_mv Sousa,Rômulo Ribeiro Magalhães de
Araújo,Francisco Odolberto de
Costa,Thercio Henrique de Carvalho
Nascimento,Igor Oliveira
Santos,Francisco Eroni Paes
Alves Júnior,Clodomiro
Feitor,Michelle Cequeira
dc.subject.por.fl_str_mv titanium nitride
cathodic cage
titanium dioxide
thin films and hollow cathode
topic titanium nitride
cathodic cage
titanium dioxide
thin films and hollow cathode
description Thin nitride and titanium dioxide films were produced using an innovative technique called cathodic cage depositon. Uniformity, three-dimensionality and high rate deposition are some of the advantages of this technique. In this study we discuss the influences of temperature, treatment time and gaseous atmosphere on the characteristics of the deposited films. The TiN (titanium nitride) and TiO2 (titanium dioxide) films were produced using a high deposition rate of 2,5 µm/h at a work temperature and pressure of 400°C and 150 Pa respectively. EDS technique was used to identify the chemical composition of the thin film deposited, whilst Raman spectroscopy indicated the phases present confirmed by DRX analysis. The thickness of the deposited films was studied using electron microscopy scanning. The results based on the deposition parameters confirm the great efficiency and versatility of this technique, which allows a uniform three-dimensional film deposition on any material without the appearance of stress. Compared to other techniques, cathodic cage deposition enables deposition at lower temperatures and higher pressures.
publishDate 2015
dc.date.none.fl_str_mv 2015-04-01
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392015000200347
url http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392015000200347
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv 10.1590/1516-1439.313914
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv text/html
dc.publisher.none.fl_str_mv ABM, ABC, ABPol
publisher.none.fl_str_mv ABM, ABC, ABPol
dc.source.none.fl_str_mv Materials Research v.18 n.2 2015
reponame:Materials research (São Carlos. Online)
instname:Universidade Federal de São Carlos (UFSCAR)
instacron:ABM ABC ABPOL
instname_str Universidade Federal de São Carlos (UFSCAR)
instacron_str ABM ABC ABPOL
institution ABM ABC ABPOL
reponame_str Materials research (São Carlos. Online)
collection Materials research (São Carlos. Online)
repository.name.fl_str_mv Materials research (São Carlos. Online) - Universidade Federal de São Carlos (UFSCAR)
repository.mail.fl_str_mv dedz@power.ufscar.br
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