Microcrystalline silicon thin films prepared by RF reactive magnetron sputter deposition

Detalhes bibliográficos
Autor(a) principal: Cerqueira, M. F.
Data de Publicação: 1995
Outros Autores: Andritschky, M., Rebouta, L., Ferreira, J. A., Silva, M. F.
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
Texto Completo: http://hdl.handle.net/1822/14188
Resumo: Hydrogenated microcrystalline silicon (microc-Si:H) thin films with Cu as a dopant material (about 2 wt.%) were deposited by RF planar magnetron sputtering in an argon/hydrogen plasma. The composition and microstructure of the films were analysed by SEM, ERD/RBS, X-ray diffraction and Raman spectroscopy. These techniques revealed a columnar film structure, each column consisting of several small (nano) crystals with a lateral dimension up to 10nm. The crystals are oriented, generally with the (111) plane parallel to the sample surface. The hydrogen content of the thin films is about 27-33 at.%. Low deposition rates and low sputter gas pressures favour crystallisation and grain growth. The behaviour can be understood in terms of the diffusion or relaxation length of the deposited Si-atoms.
id RCAP_5de1f131aa1608a87cf6124a7cae1e54
oai_identifier_str oai:repositorium.sdum.uminho.pt:1822/14188
network_acronym_str RCAP
network_name_str Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
repository_id_str
spelling Microcrystalline silicon thin films prepared by RF reactive magnetron sputter depositionHydrogenated microcrystalline siliconMagnetron sputteringX-ray diffractionRaman spectroscopyScience & TechnologyHydrogenated microcrystalline silicon (microc-Si:H) thin films with Cu as a dopant material (about 2 wt.%) were deposited by RF planar magnetron sputtering in an argon/hydrogen plasma. The composition and microstructure of the films were analysed by SEM, ERD/RBS, X-ray diffraction and Raman spectroscopy. These techniques revealed a columnar film structure, each column consisting of several small (nano) crystals with a lateral dimension up to 10nm. The crystals are oriented, generally with the (111) plane parallel to the sample surface. The hydrogen content of the thin films is about 27-33 at.%. Low deposition rates and low sputter gas pressures favour crystallisation and grain growth. The behaviour can be understood in terms of the diffusion or relaxation length of the deposited Si-atoms.ElsevierUniversidade do MinhoCerqueira, M. F.Andritschky, M.Rebouta, L.Ferreira, J. A.Silva, M. F.19951995-01-01T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleapplication/pdfhttp://hdl.handle.net/1822/14188eng0042-207X10.1016/0042-207X(95)00158-1http://www.sciencedirect.com/science/article/pii/0042207X95001581info:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2023-07-21T12:16:20ZPortal AgregadorONG
dc.title.none.fl_str_mv Microcrystalline silicon thin films prepared by RF reactive magnetron sputter deposition
title Microcrystalline silicon thin films prepared by RF reactive magnetron sputter deposition
spellingShingle Microcrystalline silicon thin films prepared by RF reactive magnetron sputter deposition
Cerqueira, M. F.
Hydrogenated microcrystalline silicon
Magnetron sputtering
X-ray diffraction
Raman spectroscopy
Science & Technology
title_short Microcrystalline silicon thin films prepared by RF reactive magnetron sputter deposition
title_full Microcrystalline silicon thin films prepared by RF reactive magnetron sputter deposition
title_fullStr Microcrystalline silicon thin films prepared by RF reactive magnetron sputter deposition
title_full_unstemmed Microcrystalline silicon thin films prepared by RF reactive magnetron sputter deposition
title_sort Microcrystalline silicon thin films prepared by RF reactive magnetron sputter deposition
author Cerqueira, M. F.
author_facet Cerqueira, M. F.
Andritschky, M.
Rebouta, L.
Ferreira, J. A.
Silva, M. F.
author_role author
author2 Andritschky, M.
Rebouta, L.
Ferreira, J. A.
Silva, M. F.
author2_role author
author
author
author
dc.contributor.none.fl_str_mv Universidade do Minho
dc.contributor.author.fl_str_mv Cerqueira, M. F.
Andritschky, M.
Rebouta, L.
Ferreira, J. A.
Silva, M. F.
dc.subject.por.fl_str_mv Hydrogenated microcrystalline silicon
Magnetron sputtering
X-ray diffraction
Raman spectroscopy
Science & Technology
topic Hydrogenated microcrystalline silicon
Magnetron sputtering
X-ray diffraction
Raman spectroscopy
Science & Technology
description Hydrogenated microcrystalline silicon (microc-Si:H) thin films with Cu as a dopant material (about 2 wt.%) were deposited by RF planar magnetron sputtering in an argon/hydrogen plasma. The composition and microstructure of the films were analysed by SEM, ERD/RBS, X-ray diffraction and Raman spectroscopy. These techniques revealed a columnar film structure, each column consisting of several small (nano) crystals with a lateral dimension up to 10nm. The crystals are oriented, generally with the (111) plane parallel to the sample surface. The hydrogen content of the thin films is about 27-33 at.%. Low deposition rates and low sputter gas pressures favour crystallisation and grain growth. The behaviour can be understood in terms of the diffusion or relaxation length of the deposited Si-atoms.
publishDate 1995
dc.date.none.fl_str_mv 1995
1995-01-01T00:00:00Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://hdl.handle.net/1822/14188
url http://hdl.handle.net/1822/14188
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv 0042-207X
10.1016/0042-207X(95)00158-1
http://www.sciencedirect.com/science/article/pii/0042207X95001581
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv application/pdf
dc.publisher.none.fl_str_mv Elsevier
publisher.none.fl_str_mv Elsevier
dc.source.none.fl_str_mv reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron:RCAAP
instname_str Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron_str RCAAP
institution RCAAP
reponame_str Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
collection Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
repository.name.fl_str_mv
repository.mail.fl_str_mv
_version_ 1777303719462830080

Registros relacionados