Erbium-activated silica-titania planar waveguides prepared by rf-sputtering

Detalhes bibliográficos
Autor(a) principal: Ronchin, Sabina
Data de Publicação: 2001
Outros Autores: Chiasera, Alessandro, Montagna, Maurizio, Rolli, Raffaella, Tosello, Cristiana, Pelli, Stefano, Righini, Giancarlo C., Gonçalves, Rogeria R. [UNESP], Ribeiro, Sidney [UNESP], De Bernardi, Carlo, Pozzi, Fabio, Duverger, Claire, Belli, Romina, Ferrari, Maurizio
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Institucional da UNESP
Texto Completo: http://dx.doi.org/10.1117/12.424788
http://hdl.handle.net/11449/219327
Resumo: Erbium-activated silica-titania planar waveguides were prepared by rf-sputtering technique. The films were deposited both on v-SiO2 and silica-on-silicon substrates obtained by plasma-enhanced chemical vapor deposition. The refractive index, the thickness and the total attenuation coefficient of the waveguides were measured by prism coupling technique. Scanning electron microscopy was used to analyze the morphology of both substrates and waveguiding film. Energy Dispersive Spectrometry was performed in order to obtain a compositional analysis. Roughness measurements were carried out by means of a stylus profilometer. After thermal annealing at 600°C for 6 hours the waveguides exhibited several well confined TE and TM propagating modes at 633 nm and one mode at 1550 nm. The attenuation coefficient at 1550 nm was 0.9 and 0.7 dB/cm for the films deposited on silica-on-silicon and the v-SiO2 substrates, respectively. Structural information about the deposited films were obtained by waveguide Raman spectroscopy. Waveguide luminescence spectroscopy was used to study the 4I13/2 → 4I15/2 transition of Er3+ ion. The emission at 1530 nm was observed at room temperature upon continuous wave excitation at 514.5 nm. A lifetime of 3.7 ms for the metastable 4I13/2 level was measured.
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spelling Erbium-activated silica-titania planar waveguides prepared by rf-sputteringErbiumOptical propertiesPhotoluminescencePlanar waveguidesRaman spectroscopyRf-sputteringSiO2-TiO2Erbium-activated silica-titania planar waveguides were prepared by rf-sputtering technique. The films were deposited both on v-SiO2 and silica-on-silicon substrates obtained by plasma-enhanced chemical vapor deposition. The refractive index, the thickness and the total attenuation coefficient of the waveguides were measured by prism coupling technique. Scanning electron microscopy was used to analyze the morphology of both substrates and waveguiding film. Energy Dispersive Spectrometry was performed in order to obtain a compositional analysis. Roughness measurements were carried out by means of a stylus profilometer. After thermal annealing at 600°C for 6 hours the waveguides exhibited several well confined TE and TM propagating modes at 633 nm and one mode at 1550 nm. The attenuation coefficient at 1550 nm was 0.9 and 0.7 dB/cm for the films deposited on silica-on-silicon and the v-SiO2 substrates, respectively. Structural information about the deposited films were obtained by waveguide Raman spectroscopy. Waveguide luminescence spectroscopy was used to study the 4I13/2 → 4I15/2 transition of Er3+ ion. The emission at 1530 nm was observed at room temperature upon continuous wave excitation at 514.5 nm. A lifetime of 3.7 ms for the metastable 4I13/2 level was measured.INFM Dip. Di Fisica Università di Trento, via Sommarive 14, I-38050 Povo, TrentoOptoelectronics and Photonics Dept. IROE-CNR, via Panciatichi 64, 1-50127 FirenzeInstitute of Chemistry UNESP C. P. 355 CEP, 14801-970, Araraquara-SPAgilent Technologies Torino Technology Centre, via G. Reiss Romoli 274, 10148 TorinoLab. Des Fluorures UPRES A 6010 CNRS Université du Maine, Av. Messiaen, 72017 Le Mans CedexDip. Di Ingegneria Meccanica e Strutturale Università di Trento, via Mesiano 44, 1-38050 Povo, TrentoCNR-CeFSA Centro Fisica Stati Aggregati, via Sommarive, 14, I-38050 Povo, TrentoInstitute of Chemistry UNESP C. P. 355 CEP, 14801-970, Araraquara-SPUniversità di TrentoDept. IROE-CNRUniversidade Estadual Paulista (UNESP)Agilent Technologies Torino Technology CentreUniversité du MaineCentro Fisica Stati AggregatiRonchin, SabinaChiasera, AlessandroMontagna, MaurizioRolli, RaffaellaTosello, CristianaPelli, StefanoRighini, Giancarlo C.Gonçalves, Rogeria R. [UNESP]Ribeiro, Sidney [UNESP]De Bernardi, CarloPozzi, FabioDuverger, ClaireBelli, RominaFerrari, Maurizio2022-04-28T18:55:01Z2022-04-28T18:55:01Z2001-01-01info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/article31-39http://dx.doi.org/10.1117/12.424788Proceedings of SPIE - The International Society for Optical Engineering, v. 4282, p. 31-39.0277-786Xhttp://hdl.handle.net/11449/21932710.1117/12.4247882-s2.0-10744224253Scopusreponame:Repositório Institucional da UNESPinstname:Universidade Estadual Paulista (UNESP)instacron:UNESPengProceedings of SPIE - The International Society for Optical Engineeringinfo:eu-repo/semantics/openAccess2022-04-28T18:55:01Zoai:repositorio.unesp.br:11449/219327Repositório InstitucionalPUBhttp://repositorio.unesp.br/oai/requestopendoar:29462022-04-28T18:55:01Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)false
dc.title.none.fl_str_mv Erbium-activated silica-titania planar waveguides prepared by rf-sputtering
title Erbium-activated silica-titania planar waveguides prepared by rf-sputtering
spellingShingle Erbium-activated silica-titania planar waveguides prepared by rf-sputtering
Ronchin, Sabina
Erbium
Optical properties
Photoluminescence
Planar waveguides
Raman spectroscopy
Rf-sputtering
SiO2-TiO2
title_short Erbium-activated silica-titania planar waveguides prepared by rf-sputtering
title_full Erbium-activated silica-titania planar waveguides prepared by rf-sputtering
title_fullStr Erbium-activated silica-titania planar waveguides prepared by rf-sputtering
title_full_unstemmed Erbium-activated silica-titania planar waveguides prepared by rf-sputtering
title_sort Erbium-activated silica-titania planar waveguides prepared by rf-sputtering
author Ronchin, Sabina
author_facet Ronchin, Sabina
Chiasera, Alessandro
Montagna, Maurizio
Rolli, Raffaella
Tosello, Cristiana
Pelli, Stefano
Righini, Giancarlo C.
Gonçalves, Rogeria R. [UNESP]
Ribeiro, Sidney [UNESP]
De Bernardi, Carlo
Pozzi, Fabio
Duverger, Claire
Belli, Romina
Ferrari, Maurizio
author_role author
author2 Chiasera, Alessandro
Montagna, Maurizio
Rolli, Raffaella
Tosello, Cristiana
Pelli, Stefano
Righini, Giancarlo C.
Gonçalves, Rogeria R. [UNESP]
Ribeiro, Sidney [UNESP]
De Bernardi, Carlo
Pozzi, Fabio
Duverger, Claire
Belli, Romina
Ferrari, Maurizio
author2_role author
author
author
author
author
author
author
author
author
author
author
author
author
dc.contributor.none.fl_str_mv Università di Trento
Dept. IROE-CNR
Universidade Estadual Paulista (UNESP)
Agilent Technologies Torino Technology Centre
Université du Maine
Centro Fisica Stati Aggregati
dc.contributor.author.fl_str_mv Ronchin, Sabina
Chiasera, Alessandro
Montagna, Maurizio
Rolli, Raffaella
Tosello, Cristiana
Pelli, Stefano
Righini, Giancarlo C.
Gonçalves, Rogeria R. [UNESP]
Ribeiro, Sidney [UNESP]
De Bernardi, Carlo
Pozzi, Fabio
Duverger, Claire
Belli, Romina
Ferrari, Maurizio
dc.subject.por.fl_str_mv Erbium
Optical properties
Photoluminescence
Planar waveguides
Raman spectroscopy
Rf-sputtering
SiO2-TiO2
topic Erbium
Optical properties
Photoluminescence
Planar waveguides
Raman spectroscopy
Rf-sputtering
SiO2-TiO2
description Erbium-activated silica-titania planar waveguides were prepared by rf-sputtering technique. The films were deposited both on v-SiO2 and silica-on-silicon substrates obtained by plasma-enhanced chemical vapor deposition. The refractive index, the thickness and the total attenuation coefficient of the waveguides were measured by prism coupling technique. Scanning electron microscopy was used to analyze the morphology of both substrates and waveguiding film. Energy Dispersive Spectrometry was performed in order to obtain a compositional analysis. Roughness measurements were carried out by means of a stylus profilometer. After thermal annealing at 600°C for 6 hours the waveguides exhibited several well confined TE and TM propagating modes at 633 nm and one mode at 1550 nm. The attenuation coefficient at 1550 nm was 0.9 and 0.7 dB/cm for the films deposited on silica-on-silicon and the v-SiO2 substrates, respectively. Structural information about the deposited films were obtained by waveguide Raman spectroscopy. Waveguide luminescence spectroscopy was used to study the 4I13/2 → 4I15/2 transition of Er3+ ion. The emission at 1530 nm was observed at room temperature upon continuous wave excitation at 514.5 nm. A lifetime of 3.7 ms for the metastable 4I13/2 level was measured.
publishDate 2001
dc.date.none.fl_str_mv 2001-01-01
2022-04-28T18:55:01Z
2022-04-28T18:55:01Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://dx.doi.org/10.1117/12.424788
Proceedings of SPIE - The International Society for Optical Engineering, v. 4282, p. 31-39.
0277-786X
http://hdl.handle.net/11449/219327
10.1117/12.424788
2-s2.0-10744224253
url http://dx.doi.org/10.1117/12.424788
http://hdl.handle.net/11449/219327
identifier_str_mv Proceedings of SPIE - The International Society for Optical Engineering, v. 4282, p. 31-39.
0277-786X
10.1117/12.424788
2-s2.0-10744224253
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv Proceedings of SPIE - The International Society for Optical Engineering
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv 31-39
dc.source.none.fl_str_mv Scopus
reponame:Repositório Institucional da UNESP
instname:Universidade Estadual Paulista (UNESP)
instacron:UNESP
instname_str Universidade Estadual Paulista (UNESP)
instacron_str UNESP
institution UNESP
reponame_str Repositório Institucional da UNESP
collection Repositório Institucional da UNESP
repository.name.fl_str_mv Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)
repository.mail.fl_str_mv
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