Structure, mechanical properties and oxidation resistance of iso and non-iso architected TiN/Cr multilayers coatings deposited by magnetron sputtering

Detalhes bibliográficos
Autor(a) principal: Soares,Vagner F. G.
Data de Publicação: 2021
Outros Autores: Ramirez,Daniel A., Damasceno,Igor Z., Echevirrigaray,Fernando G., Figueroa,Carlos A., Perotti,Bruna L., Serafini,Francisco L., Oliveira,Givanilson B., Terto,André R., Tentardini,Eduardo K.
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Materials research (São Carlos. Online)
Texto Completo: http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392021000100206
Resumo: Abstract Iso and non-iso architected TiN/Cr multilayers with constant composition were deposited by balanced magnetron sputtering aiming to investigate the influence of different architectures over coatings structures and properties. Glow discharge optical emission spectroscopy analyses were used to determine in-depth constituents and suggested that no diffusion of elements occurred between layers in room temperature. Field emission gun scanning electron microscopy analyses showed that all multilayers presented sharp interfaces and low porosity microstructures, with column-like grain growth influenced by layer sizes. Glancing angle X-ray diffraction analyses showed that multilayers consist of polycrystalline α-Cr and δ-TiN phases with a main peak in Cr(110) plane. The overlapping of TiN onto metallic layers led to the suppression of growth in the TiN(111) plane, although TiN layers thicker than 50 nm demonstrated a growth in plane TiN(200). Nanoindentation tests registered equal hardness values for all multilayers of around 16.2 GPa, on the other hand, a tendency to improve hardness has been identified for hierarchical multilayer. Oxidation tests revealed that architectures with thicker TiN top layers presented an improved oxidation resistance up to 600 ºC, probably due to growth in more compact TiN(200) plane. However, TiN/Cr coatings did not resist integrally to oxidation tests at 750 ºC.
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spelling Structure, mechanical properties and oxidation resistance of iso and non-iso architected TiN/Cr multilayers coatings deposited by magnetron sputteringCoatingsmagnetron sputteringTiN/Cr multilayersnon-iso architectureshigh temperature oxidationAbstract Iso and non-iso architected TiN/Cr multilayers with constant composition were deposited by balanced magnetron sputtering aiming to investigate the influence of different architectures over coatings structures and properties. Glow discharge optical emission spectroscopy analyses were used to determine in-depth constituents and suggested that no diffusion of elements occurred between layers in room temperature. Field emission gun scanning electron microscopy analyses showed that all multilayers presented sharp interfaces and low porosity microstructures, with column-like grain growth influenced by layer sizes. Glancing angle X-ray diffraction analyses showed that multilayers consist of polycrystalline α-Cr and δ-TiN phases with a main peak in Cr(110) plane. The overlapping of TiN onto metallic layers led to the suppression of growth in the TiN(111) plane, although TiN layers thicker than 50 nm demonstrated a growth in plane TiN(200). Nanoindentation tests registered equal hardness values for all multilayers of around 16.2 GPa, on the other hand, a tendency to improve hardness has been identified for hierarchical multilayer. Oxidation tests revealed that architectures with thicker TiN top layers presented an improved oxidation resistance up to 600 ºC, probably due to growth in more compact TiN(200) plane. However, TiN/Cr coatings did not resist integrally to oxidation tests at 750 ºC.ABM, ABC, ABPol2021-01-01info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersiontext/htmlhttp://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392021000100206Materials Research v.24 n.1 2021reponame:Materials research (São Carlos. Online)instname:Universidade Federal de São Carlos (UFSCAR)instacron:ABM ABC ABPOL10.1590/1980-5373-mr-2020-0315info:eu-repo/semantics/openAccessSoares,Vagner F. G.Ramirez,Daniel A.Damasceno,Igor Z.Echevirrigaray,Fernando G.Figueroa,Carlos A.Perotti,Bruna L.Serafini,Francisco L.Oliveira,Givanilson B.Terto,André R.Tentardini,Eduardo K.eng2021-01-20T00:00:00Zoai:scielo:S1516-14392021000100206Revistahttp://www.scielo.br/mrPUBhttps://old.scielo.br/oai/scielo-oai.phpdedz@power.ufscar.br1980-53731516-1439opendoar:2021-01-20T00:00Materials research (São Carlos. Online) - Universidade Federal de São Carlos (UFSCAR)false
dc.title.none.fl_str_mv Structure, mechanical properties and oxidation resistance of iso and non-iso architected TiN/Cr multilayers coatings deposited by magnetron sputtering
title Structure, mechanical properties and oxidation resistance of iso and non-iso architected TiN/Cr multilayers coatings deposited by magnetron sputtering
spellingShingle Structure, mechanical properties and oxidation resistance of iso and non-iso architected TiN/Cr multilayers coatings deposited by magnetron sputtering
Soares,Vagner F. G.
Coatings
magnetron sputtering
TiN/Cr multilayers
non-iso architectures
high temperature oxidation
title_short Structure, mechanical properties and oxidation resistance of iso and non-iso architected TiN/Cr multilayers coatings deposited by magnetron sputtering
title_full Structure, mechanical properties and oxidation resistance of iso and non-iso architected TiN/Cr multilayers coatings deposited by magnetron sputtering
title_fullStr Structure, mechanical properties and oxidation resistance of iso and non-iso architected TiN/Cr multilayers coatings deposited by magnetron sputtering
title_full_unstemmed Structure, mechanical properties and oxidation resistance of iso and non-iso architected TiN/Cr multilayers coatings deposited by magnetron sputtering
title_sort Structure, mechanical properties and oxidation resistance of iso and non-iso architected TiN/Cr multilayers coatings deposited by magnetron sputtering
author Soares,Vagner F. G.
author_facet Soares,Vagner F. G.
Ramirez,Daniel A.
Damasceno,Igor Z.
Echevirrigaray,Fernando G.
Figueroa,Carlos A.
Perotti,Bruna L.
Serafini,Francisco L.
Oliveira,Givanilson B.
Terto,André R.
Tentardini,Eduardo K.
author_role author
author2 Ramirez,Daniel A.
Damasceno,Igor Z.
Echevirrigaray,Fernando G.
Figueroa,Carlos A.
Perotti,Bruna L.
Serafini,Francisco L.
Oliveira,Givanilson B.
Terto,André R.
Tentardini,Eduardo K.
author2_role author
author
author
author
author
author
author
author
author
dc.contributor.author.fl_str_mv Soares,Vagner F. G.
Ramirez,Daniel A.
Damasceno,Igor Z.
Echevirrigaray,Fernando G.
Figueroa,Carlos A.
Perotti,Bruna L.
Serafini,Francisco L.
Oliveira,Givanilson B.
Terto,André R.
Tentardini,Eduardo K.
dc.subject.por.fl_str_mv Coatings
magnetron sputtering
TiN/Cr multilayers
non-iso architectures
high temperature oxidation
topic Coatings
magnetron sputtering
TiN/Cr multilayers
non-iso architectures
high temperature oxidation
description Abstract Iso and non-iso architected TiN/Cr multilayers with constant composition were deposited by balanced magnetron sputtering aiming to investigate the influence of different architectures over coatings structures and properties. Glow discharge optical emission spectroscopy analyses were used to determine in-depth constituents and suggested that no diffusion of elements occurred between layers in room temperature. Field emission gun scanning electron microscopy analyses showed that all multilayers presented sharp interfaces and low porosity microstructures, with column-like grain growth influenced by layer sizes. Glancing angle X-ray diffraction analyses showed that multilayers consist of polycrystalline α-Cr and δ-TiN phases with a main peak in Cr(110) plane. The overlapping of TiN onto metallic layers led to the suppression of growth in the TiN(111) plane, although TiN layers thicker than 50 nm demonstrated a growth in plane TiN(200). Nanoindentation tests registered equal hardness values for all multilayers of around 16.2 GPa, on the other hand, a tendency to improve hardness has been identified for hierarchical multilayer. Oxidation tests revealed that architectures with thicker TiN top layers presented an improved oxidation resistance up to 600 ºC, probably due to growth in more compact TiN(200) plane. However, TiN/Cr coatings did not resist integrally to oxidation tests at 750 ºC.
publishDate 2021
dc.date.none.fl_str_mv 2021-01-01
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392021000100206
url http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392021000100206
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv 10.1590/1980-5373-mr-2020-0315
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv text/html
dc.publisher.none.fl_str_mv ABM, ABC, ABPol
publisher.none.fl_str_mv ABM, ABC, ABPol
dc.source.none.fl_str_mv Materials Research v.24 n.1 2021
reponame:Materials research (São Carlos. Online)
instname:Universidade Federal de São Carlos (UFSCAR)
instacron:ABM ABC ABPOL
instname_str Universidade Federal de São Carlos (UFSCAR)
instacron_str ABM ABC ABPOL
institution ABM ABC ABPOL
reponame_str Materials research (São Carlos. Online)
collection Materials research (São Carlos. Online)
repository.name.fl_str_mv Materials research (São Carlos. Online) - Universidade Federal de São Carlos (UFSCAR)
repository.mail.fl_str_mv dedz@power.ufscar.br
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