Electrochemical behavior of Ti and Ti6Al4V in aqueous solutions of citric acid containing halides

Detalhes bibliográficos
Autor(a) principal: Schmidt,Anelise Marlene
Data de Publicação: 2006
Outros Autores: Azambuja,Denise Schermann
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Materials research (São Carlos. Online)
Texto Completo: http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392006000400008
Resumo: This paper reports on an investigation of the electrochemical behavior of Ti grade 2 and Ti6Al4V alloy in aqueous citric acid solutions with pH 2.0 containing halide ions. Voltammetric studies of Ti and the alloy in citric acid, with and without chloride ions, indicate that the Ti and Ti alloy presented a passive behavior in the test solutions used. Pitting was observed at 3.0 and 2.5 V/SCE for Ti and Ti6Al4V, respectively, when bromide ions were added to the solution. In solutions containing fluoride ions, dissolution of the film occurred at potentials close to - 1.0 V/SCE in both electrodes. The iodide ions oxidized on the passive oxide film at potentials close to 1.0 V/SCE. EIS results of the materials in citric acid solutions containing chloride ions revealed that the film's resistance increased as the applied potential rose from 0 to 1.0 V. In bromide-containing solutions, breakdown of the film was confirmed at potentials above 2.0 V/SCE in both electrodes. These results suggest film reformation for Ti and the alloy in solutions containing fluoride at potentials within the passive region.
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spelling Electrochemical behavior of Ti and Ti6Al4V in aqueous solutions of citric acid containing halidesTiTi6Al4Vcitric acidhalide ionsThis paper reports on an investigation of the electrochemical behavior of Ti grade 2 and Ti6Al4V alloy in aqueous citric acid solutions with pH 2.0 containing halide ions. Voltammetric studies of Ti and the alloy in citric acid, with and without chloride ions, indicate that the Ti and Ti alloy presented a passive behavior in the test solutions used. Pitting was observed at 3.0 and 2.5 V/SCE for Ti and Ti6Al4V, respectively, when bromide ions were added to the solution. In solutions containing fluoride ions, dissolution of the film occurred at potentials close to - 1.0 V/SCE in both electrodes. The iodide ions oxidized on the passive oxide film at potentials close to 1.0 V/SCE. EIS results of the materials in citric acid solutions containing chloride ions revealed that the film's resistance increased as the applied potential rose from 0 to 1.0 V. In bromide-containing solutions, breakdown of the film was confirmed at potentials above 2.0 V/SCE in both electrodes. These results suggest film reformation for Ti and the alloy in solutions containing fluoride at potentials within the passive region.ABM, ABC, ABPol2006-12-01info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersiontext/htmlhttp://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392006000400008Materials Research v.9 n.4 2006reponame:Materials research (São Carlos. Online)instname:Universidade Federal de São Carlos (UFSCAR)instacron:ABM ABC ABPOL10.1590/S1516-14392006000400008info:eu-repo/semantics/openAccessSchmidt,Anelise MarleneAzambuja,Denise Schermanneng2007-03-22T00:00:00Zoai:scielo:S1516-14392006000400008Revistahttp://www.scielo.br/mrPUBhttps://old.scielo.br/oai/scielo-oai.phpdedz@power.ufscar.br1980-53731516-1439opendoar:2007-03-22T00:00Materials research (São Carlos. Online) - Universidade Federal de São Carlos (UFSCAR)false
dc.title.none.fl_str_mv Electrochemical behavior of Ti and Ti6Al4V in aqueous solutions of citric acid containing halides
title Electrochemical behavior of Ti and Ti6Al4V in aqueous solutions of citric acid containing halides
spellingShingle Electrochemical behavior of Ti and Ti6Al4V in aqueous solutions of citric acid containing halides
Schmidt,Anelise Marlene
Ti
Ti6Al4V
citric acid
halide ions
title_short Electrochemical behavior of Ti and Ti6Al4V in aqueous solutions of citric acid containing halides
title_full Electrochemical behavior of Ti and Ti6Al4V in aqueous solutions of citric acid containing halides
title_fullStr Electrochemical behavior of Ti and Ti6Al4V in aqueous solutions of citric acid containing halides
title_full_unstemmed Electrochemical behavior of Ti and Ti6Al4V in aqueous solutions of citric acid containing halides
title_sort Electrochemical behavior of Ti and Ti6Al4V in aqueous solutions of citric acid containing halides
author Schmidt,Anelise Marlene
author_facet Schmidt,Anelise Marlene
Azambuja,Denise Schermann
author_role author
author2 Azambuja,Denise Schermann
author2_role author
dc.contributor.author.fl_str_mv Schmidt,Anelise Marlene
Azambuja,Denise Schermann
dc.subject.por.fl_str_mv Ti
Ti6Al4V
citric acid
halide ions
topic Ti
Ti6Al4V
citric acid
halide ions
description This paper reports on an investigation of the electrochemical behavior of Ti grade 2 and Ti6Al4V alloy in aqueous citric acid solutions with pH 2.0 containing halide ions. Voltammetric studies of Ti and the alloy in citric acid, with and without chloride ions, indicate that the Ti and Ti alloy presented a passive behavior in the test solutions used. Pitting was observed at 3.0 and 2.5 V/SCE for Ti and Ti6Al4V, respectively, when bromide ions were added to the solution. In solutions containing fluoride ions, dissolution of the film occurred at potentials close to - 1.0 V/SCE in both electrodes. The iodide ions oxidized on the passive oxide film at potentials close to 1.0 V/SCE. EIS results of the materials in citric acid solutions containing chloride ions revealed that the film's resistance increased as the applied potential rose from 0 to 1.0 V. In bromide-containing solutions, breakdown of the film was confirmed at potentials above 2.0 V/SCE in both electrodes. These results suggest film reformation for Ti and the alloy in solutions containing fluoride at potentials within the passive region.
publishDate 2006
dc.date.none.fl_str_mv 2006-12-01
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392006000400008
url http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392006000400008
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv 10.1590/S1516-14392006000400008
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv text/html
dc.publisher.none.fl_str_mv ABM, ABC, ABPol
publisher.none.fl_str_mv ABM, ABC, ABPol
dc.source.none.fl_str_mv Materials Research v.9 n.4 2006
reponame:Materials research (São Carlos. Online)
instname:Universidade Federal de São Carlos (UFSCAR)
instacron:ABM ABC ABPOL
instname_str Universidade Federal de São Carlos (UFSCAR)
instacron_str ABM ABC ABPOL
institution ABM ABC ABPOL
reponame_str Materials research (São Carlos. Online)
collection Materials research (São Carlos. Online)
repository.name.fl_str_mv Materials research (São Carlos. Online) - Universidade Federal de São Carlos (UFSCAR)
repository.mail.fl_str_mv dedz@power.ufscar.br
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