Bond strength of a pit-and-fissure sealant associated to etch-and-rinse and self-etching adhesive systems to saliva-contaminated enamel: individual vs. simultaneous light curing
Autor(a) principal: | |
---|---|
Data de Publicação: | 2008 |
Outros Autores: | , , , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Brazilian Dental Journal |
Texto Completo: | http://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-64402008000400010 |
Resumo: | This study evaluated in vitro the shear bond strength (SBS) of a resin-based pit-and-fissure sealant [Fluroshield (F), Dentsply/Caulk] associated with either an etch-and-rinse [Adper Single Bond 2 (SB), 3M/ESPE] or a self-etching adhesive system [Clearfil S3 Bond (S3), Kuraray Co., Ltd.] to saliva-contaminated enamel, comparing two curing protocols: individual light curing of the adhesive system and the sealant or simultaneous curing of both materials. Mesial and distal enamel surfaces from 45 sound third molars were randomly assigned to 6 groups (n=15), according to the bonding technique: I - F was applied to 37% phosphoric acid etched enamel. The other groups were contaminated with fresh human saliva (0.01 mL; 10 s) after acid etching: II - SB and F were light cured separately; III - SB and F were light cured together; IV - S3 and F were light cured separately; V - S3 and F were light cured simultaneously; VI - F was applied to saliva-contaminated, acid-etched enamel without an intermediate bonding agent layer. SBS was tested to failure in a universal testing machine at 0.5 mm/min. Data were analyzed by one-way ANOVA and Fisher's test (α=0.05).The debonded specimens were examined with a stereomicroscope to assess the failure modes. Three representative specimens from each group were observed under scanning electron microscopy for a qualitative analysis. Mean SBS in MPa were: I-12.28 (±4.29); II-8.57 (±3.19); III-7.97 (±2.16); IV-12.56 (±3.11); V-11.45 (±3.77); and VI-7.47 (±1.99). In conclusion, individual or simultaneous curing of the intermediate bonding agent layer and the resin sealant did not seem to affect bond strength to saliva-contaminated enamel. S3/F presented significantly higher SBS than the that of the groups treated with SB etch-and-rinse adhesive system and similar SBS to that of the control group, in which the sealant was applied under ideal dry, noncontaminated conditions. |
id |
FUNORP-1_600c2af0d702368904754d8b201afe6e |
---|---|
oai_identifier_str |
oai:scielo:S0103-64402008000400010 |
network_acronym_str |
FUNORP-1 |
network_name_str |
Brazilian Dental Journal |
repository_id_str |
|
spelling |
Bond strength of a pit-and-fissure sealant associated to etch-and-rinse and self-etching adhesive systems to saliva-contaminated enamel: individual vs. simultaneous light curingpit-and-fissure sealantshear bond strengthsalivary contaminationadhesive systemlight curingThis study evaluated in vitro the shear bond strength (SBS) of a resin-based pit-and-fissure sealant [Fluroshield (F), Dentsply/Caulk] associated with either an etch-and-rinse [Adper Single Bond 2 (SB), 3M/ESPE] or a self-etching adhesive system [Clearfil S3 Bond (S3), Kuraray Co., Ltd.] to saliva-contaminated enamel, comparing two curing protocols: individual light curing of the adhesive system and the sealant or simultaneous curing of both materials. Mesial and distal enamel surfaces from 45 sound third molars were randomly assigned to 6 groups (n=15), according to the bonding technique: I - F was applied to 37% phosphoric acid etched enamel. The other groups were contaminated with fresh human saliva (0.01 mL; 10 s) after acid etching: II - SB and F were light cured separately; III - SB and F were light cured together; IV - S3 and F were light cured separately; V - S3 and F were light cured simultaneously; VI - F was applied to saliva-contaminated, acid-etched enamel without an intermediate bonding agent layer. SBS was tested to failure in a universal testing machine at 0.5 mm/min. Data were analyzed by one-way ANOVA and Fisher's test (α=0.05).The debonded specimens were examined with a stereomicroscope to assess the failure modes. Three representative specimens from each group were observed under scanning electron microscopy for a qualitative analysis. Mean SBS in MPa were: I-12.28 (±4.29); II-8.57 (±3.19); III-7.97 (±2.16); IV-12.56 (±3.11); V-11.45 (±3.77); and VI-7.47 (±1.99). In conclusion, individual or simultaneous curing of the intermediate bonding agent layer and the resin sealant did not seem to affect bond strength to saliva-contaminated enamel. S3/F presented significantly higher SBS than the that of the groups treated with SB etch-and-rinse adhesive system and similar SBS to that of the control group, in which the sealant was applied under ideal dry, noncontaminated conditions.Fundação Odontológica de Ribeirão Preto2008-01-01info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersiontext/htmlhttp://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-64402008000400010Brazilian Dental Journal v.19 n.4 2008reponame:Brazilian Dental Journalinstname:Fundação Odontológica de Ribeirão Preto (FUNORP)instacron:FUNORP10.1590/S0103-64402008000400010info:eu-repo/semantics/openAccessGomes-Silva,Jaciara MirandaTorres,Carolina PaesContente,Marta Maria Martins GiamateiOliveira,Maria Angélica Hueb de MenezesPalma-Dibb,Regina GuenkaBorsatto,Maria Cristinaeng2009-01-26T00:00:00Zoai:scielo:S0103-64402008000400010Revistahttps://www.scielo.br/j/bdj/https://old.scielo.br/oai/scielo-oai.phpbdj@forp.usp.br||sergio@fosjc.unesp.br1806-47600103-6440opendoar:2009-01-26T00:00Brazilian Dental Journal - Fundação Odontológica de Ribeirão Preto (FUNORP)false |
dc.title.none.fl_str_mv |
Bond strength of a pit-and-fissure sealant associated to etch-and-rinse and self-etching adhesive systems to saliva-contaminated enamel: individual vs. simultaneous light curing |
title |
Bond strength of a pit-and-fissure sealant associated to etch-and-rinse and self-etching adhesive systems to saliva-contaminated enamel: individual vs. simultaneous light curing |
spellingShingle |
Bond strength of a pit-and-fissure sealant associated to etch-and-rinse and self-etching adhesive systems to saliva-contaminated enamel: individual vs. simultaneous light curing Gomes-Silva,Jaciara Miranda pit-and-fissure sealant shear bond strength salivary contamination adhesive system light curing |
title_short |
Bond strength of a pit-and-fissure sealant associated to etch-and-rinse and self-etching adhesive systems to saliva-contaminated enamel: individual vs. simultaneous light curing |
title_full |
Bond strength of a pit-and-fissure sealant associated to etch-and-rinse and self-etching adhesive systems to saliva-contaminated enamel: individual vs. simultaneous light curing |
title_fullStr |
Bond strength of a pit-and-fissure sealant associated to etch-and-rinse and self-etching adhesive systems to saliva-contaminated enamel: individual vs. simultaneous light curing |
title_full_unstemmed |
Bond strength of a pit-and-fissure sealant associated to etch-and-rinse and self-etching adhesive systems to saliva-contaminated enamel: individual vs. simultaneous light curing |
title_sort |
Bond strength of a pit-and-fissure sealant associated to etch-and-rinse and self-etching adhesive systems to saliva-contaminated enamel: individual vs. simultaneous light curing |
author |
Gomes-Silva,Jaciara Miranda |
author_facet |
Gomes-Silva,Jaciara Miranda Torres,Carolina Paes Contente,Marta Maria Martins Giamatei Oliveira,Maria Angélica Hueb de Menezes Palma-Dibb,Regina Guenka Borsatto,Maria Cristina |
author_role |
author |
author2 |
Torres,Carolina Paes Contente,Marta Maria Martins Giamatei Oliveira,Maria Angélica Hueb de Menezes Palma-Dibb,Regina Guenka Borsatto,Maria Cristina |
author2_role |
author author author author author |
dc.contributor.author.fl_str_mv |
Gomes-Silva,Jaciara Miranda Torres,Carolina Paes Contente,Marta Maria Martins Giamatei Oliveira,Maria Angélica Hueb de Menezes Palma-Dibb,Regina Guenka Borsatto,Maria Cristina |
dc.subject.por.fl_str_mv |
pit-and-fissure sealant shear bond strength salivary contamination adhesive system light curing |
topic |
pit-and-fissure sealant shear bond strength salivary contamination adhesive system light curing |
description |
This study evaluated in vitro the shear bond strength (SBS) of a resin-based pit-and-fissure sealant [Fluroshield (F), Dentsply/Caulk] associated with either an etch-and-rinse [Adper Single Bond 2 (SB), 3M/ESPE] or a self-etching adhesive system [Clearfil S3 Bond (S3), Kuraray Co., Ltd.] to saliva-contaminated enamel, comparing two curing protocols: individual light curing of the adhesive system and the sealant or simultaneous curing of both materials. Mesial and distal enamel surfaces from 45 sound third molars were randomly assigned to 6 groups (n=15), according to the bonding technique: I - F was applied to 37% phosphoric acid etched enamel. The other groups were contaminated with fresh human saliva (0.01 mL; 10 s) after acid etching: II - SB and F were light cured separately; III - SB and F were light cured together; IV - S3 and F were light cured separately; V - S3 and F were light cured simultaneously; VI - F was applied to saliva-contaminated, acid-etched enamel without an intermediate bonding agent layer. SBS was tested to failure in a universal testing machine at 0.5 mm/min. Data were analyzed by one-way ANOVA and Fisher's test (α=0.05).The debonded specimens were examined with a stereomicroscope to assess the failure modes. Three representative specimens from each group were observed under scanning electron microscopy for a qualitative analysis. Mean SBS in MPa were: I-12.28 (±4.29); II-8.57 (±3.19); III-7.97 (±2.16); IV-12.56 (±3.11); V-11.45 (±3.77); and VI-7.47 (±1.99). In conclusion, individual or simultaneous curing of the intermediate bonding agent layer and the resin sealant did not seem to affect bond strength to saliva-contaminated enamel. S3/F presented significantly higher SBS than the that of the groups treated with SB etch-and-rinse adhesive system and similar SBS to that of the control group, in which the sealant was applied under ideal dry, noncontaminated conditions. |
publishDate |
2008 |
dc.date.none.fl_str_mv |
2008-01-01 |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-64402008000400010 |
url |
http://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-64402008000400010 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
10.1590/S0103-64402008000400010 |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
text/html |
dc.publisher.none.fl_str_mv |
Fundação Odontológica de Ribeirão Preto |
publisher.none.fl_str_mv |
Fundação Odontológica de Ribeirão Preto |
dc.source.none.fl_str_mv |
Brazilian Dental Journal v.19 n.4 2008 reponame:Brazilian Dental Journal instname:Fundação Odontológica de Ribeirão Preto (FUNORP) instacron:FUNORP |
instname_str |
Fundação Odontológica de Ribeirão Preto (FUNORP) |
instacron_str |
FUNORP |
institution |
FUNORP |
reponame_str |
Brazilian Dental Journal |
collection |
Brazilian Dental Journal |
repository.name.fl_str_mv |
Brazilian Dental Journal - Fundação Odontológica de Ribeirão Preto (FUNORP) |
repository.mail.fl_str_mv |
bdj@forp.usp.br||sergio@fosjc.unesp.br |
_version_ |
1754204090913521664 |