Bond strength of a pit-and-fissure sealant associated to etch-and-rinse and self-etching adhesive systems to saliva-contaminated enamel: individual vs. simultaneous light curing

Detalhes bibliográficos
Autor(a) principal: Gomes-Silva,Jaciara Miranda
Data de Publicação: 2008
Outros Autores: Torres,Carolina Paes, Contente,Marta Maria Martins Giamatei, Oliveira,Maria Angélica Hueb de Menezes, Palma-Dibb,Regina Guenka, Borsatto,Maria Cristina
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Brazilian Dental Journal
Texto Completo: http://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-64402008000400010
Resumo: This study evaluated in vitro the shear bond strength (SBS) of a resin-based pit-and-fissure sealant [Fluroshield (F), Dentsply/Caulk] associated with either an etch-and-rinse [Adper Single Bond 2 (SB), 3M/ESPE] or a self-etching adhesive system [Clearfil S3 Bond (S3), Kuraray Co., Ltd.] to saliva-contaminated enamel, comparing two curing protocols: individual light curing of the adhesive system and the sealant or simultaneous curing of both materials. Mesial and distal enamel surfaces from 45 sound third molars were randomly assigned to 6 groups (n=15), according to the bonding technique: I - F was applied to 37% phosphoric acid etched enamel. The other groups were contaminated with fresh human saliva (0.01 mL; 10 s) after acid etching: II - SB and F were light cured separately; III - SB and F were light cured together; IV - S3 and F were light cured separately; V - S3 and F were light cured simultaneously; VI - F was applied to saliva-contaminated, acid-etched enamel without an intermediate bonding agent layer. SBS was tested to failure in a universal testing machine at 0.5 mm/min. Data were analyzed by one-way ANOVA and Fisher's test (α=0.05).The debonded specimens were examined with a stereomicroscope to assess the failure modes. Three representative specimens from each group were observed under scanning electron microscopy for a qualitative analysis. Mean SBS in MPa were: I-12.28 (±4.29); II-8.57 (±3.19); III-7.97 (±2.16); IV-12.56 (±3.11); V-11.45 (±3.77); and VI-7.47 (±1.99). In conclusion, individual or simultaneous curing of the intermediate bonding agent layer and the resin sealant did not seem to affect bond strength to saliva-contaminated enamel. S3/F presented significantly higher SBS than the that of the groups treated with SB etch-and-rinse adhesive system and similar SBS to that of the control group, in which the sealant was applied under ideal dry, noncontaminated conditions.
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spelling Bond strength of a pit-and-fissure sealant associated to etch-and-rinse and self-etching adhesive systems to saliva-contaminated enamel: individual vs. simultaneous light curingpit-and-fissure sealantshear bond strengthsalivary contaminationadhesive systemlight curingThis study evaluated in vitro the shear bond strength (SBS) of a resin-based pit-and-fissure sealant [Fluroshield (F), Dentsply/Caulk] associated with either an etch-and-rinse [Adper Single Bond 2 (SB), 3M/ESPE] or a self-etching adhesive system [Clearfil S3 Bond (S3), Kuraray Co., Ltd.] to saliva-contaminated enamel, comparing two curing protocols: individual light curing of the adhesive system and the sealant or simultaneous curing of both materials. Mesial and distal enamel surfaces from 45 sound third molars were randomly assigned to 6 groups (n=15), according to the bonding technique: I - F was applied to 37% phosphoric acid etched enamel. The other groups were contaminated with fresh human saliva (0.01 mL; 10 s) after acid etching: II - SB and F were light cured separately; III - SB and F were light cured together; IV - S3 and F were light cured separately; V - S3 and F were light cured simultaneously; VI - F was applied to saliva-contaminated, acid-etched enamel without an intermediate bonding agent layer. SBS was tested to failure in a universal testing machine at 0.5 mm/min. Data were analyzed by one-way ANOVA and Fisher's test (α=0.05).The debonded specimens were examined with a stereomicroscope to assess the failure modes. Three representative specimens from each group were observed under scanning electron microscopy for a qualitative analysis. Mean SBS in MPa were: I-12.28 (±4.29); II-8.57 (±3.19); III-7.97 (±2.16); IV-12.56 (±3.11); V-11.45 (±3.77); and VI-7.47 (±1.99). In conclusion, individual or simultaneous curing of the intermediate bonding agent layer and the resin sealant did not seem to affect bond strength to saliva-contaminated enamel. S3/F presented significantly higher SBS than the that of the groups treated with SB etch-and-rinse adhesive system and similar SBS to that of the control group, in which the sealant was applied under ideal dry, noncontaminated conditions.Fundação Odontológica de Ribeirão Preto2008-01-01info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersiontext/htmlhttp://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-64402008000400010Brazilian Dental Journal v.19 n.4 2008reponame:Brazilian Dental Journalinstname:Fundação Odontológica de Ribeirão Preto (FUNORP)instacron:FUNORP10.1590/S0103-64402008000400010info:eu-repo/semantics/openAccessGomes-Silva,Jaciara MirandaTorres,Carolina PaesContente,Marta Maria Martins GiamateiOliveira,Maria Angélica Hueb de MenezesPalma-Dibb,Regina GuenkaBorsatto,Maria Cristinaeng2009-01-26T00:00:00Zoai:scielo:S0103-64402008000400010Revistahttps://www.scielo.br/j/bdj/https://old.scielo.br/oai/scielo-oai.phpbdj@forp.usp.br||sergio@fosjc.unesp.br1806-47600103-6440opendoar:2009-01-26T00:00Brazilian Dental Journal - Fundação Odontológica de Ribeirão Preto (FUNORP)false
dc.title.none.fl_str_mv Bond strength of a pit-and-fissure sealant associated to etch-and-rinse and self-etching adhesive systems to saliva-contaminated enamel: individual vs. simultaneous light curing
title Bond strength of a pit-and-fissure sealant associated to etch-and-rinse and self-etching adhesive systems to saliva-contaminated enamel: individual vs. simultaneous light curing
spellingShingle Bond strength of a pit-and-fissure sealant associated to etch-and-rinse and self-etching adhesive systems to saliva-contaminated enamel: individual vs. simultaneous light curing
Gomes-Silva,Jaciara Miranda
pit-and-fissure sealant
shear bond strength
salivary contamination
adhesive system
light curing
title_short Bond strength of a pit-and-fissure sealant associated to etch-and-rinse and self-etching adhesive systems to saliva-contaminated enamel: individual vs. simultaneous light curing
title_full Bond strength of a pit-and-fissure sealant associated to etch-and-rinse and self-etching adhesive systems to saliva-contaminated enamel: individual vs. simultaneous light curing
title_fullStr Bond strength of a pit-and-fissure sealant associated to etch-and-rinse and self-etching adhesive systems to saliva-contaminated enamel: individual vs. simultaneous light curing
title_full_unstemmed Bond strength of a pit-and-fissure sealant associated to etch-and-rinse and self-etching adhesive systems to saliva-contaminated enamel: individual vs. simultaneous light curing
title_sort Bond strength of a pit-and-fissure sealant associated to etch-and-rinse and self-etching adhesive systems to saliva-contaminated enamel: individual vs. simultaneous light curing
author Gomes-Silva,Jaciara Miranda
author_facet Gomes-Silva,Jaciara Miranda
Torres,Carolina Paes
Contente,Marta Maria Martins Giamatei
Oliveira,Maria Angélica Hueb de Menezes
Palma-Dibb,Regina Guenka
Borsatto,Maria Cristina
author_role author
author2 Torres,Carolina Paes
Contente,Marta Maria Martins Giamatei
Oliveira,Maria Angélica Hueb de Menezes
Palma-Dibb,Regina Guenka
Borsatto,Maria Cristina
author2_role author
author
author
author
author
dc.contributor.author.fl_str_mv Gomes-Silva,Jaciara Miranda
Torres,Carolina Paes
Contente,Marta Maria Martins Giamatei
Oliveira,Maria Angélica Hueb de Menezes
Palma-Dibb,Regina Guenka
Borsatto,Maria Cristina
dc.subject.por.fl_str_mv pit-and-fissure sealant
shear bond strength
salivary contamination
adhesive system
light curing
topic pit-and-fissure sealant
shear bond strength
salivary contamination
adhesive system
light curing
description This study evaluated in vitro the shear bond strength (SBS) of a resin-based pit-and-fissure sealant [Fluroshield (F), Dentsply/Caulk] associated with either an etch-and-rinse [Adper Single Bond 2 (SB), 3M/ESPE] or a self-etching adhesive system [Clearfil S3 Bond (S3), Kuraray Co., Ltd.] to saliva-contaminated enamel, comparing two curing protocols: individual light curing of the adhesive system and the sealant or simultaneous curing of both materials. Mesial and distal enamel surfaces from 45 sound third molars were randomly assigned to 6 groups (n=15), according to the bonding technique: I - F was applied to 37% phosphoric acid etched enamel. The other groups were contaminated with fresh human saliva (0.01 mL; 10 s) after acid etching: II - SB and F were light cured separately; III - SB and F were light cured together; IV - S3 and F were light cured separately; V - S3 and F were light cured simultaneously; VI - F was applied to saliva-contaminated, acid-etched enamel without an intermediate bonding agent layer. SBS was tested to failure in a universal testing machine at 0.5 mm/min. Data were analyzed by one-way ANOVA and Fisher's test (α=0.05).The debonded specimens were examined with a stereomicroscope to assess the failure modes. Three representative specimens from each group were observed under scanning electron microscopy for a qualitative analysis. Mean SBS in MPa were: I-12.28 (±4.29); II-8.57 (±3.19); III-7.97 (±2.16); IV-12.56 (±3.11); V-11.45 (±3.77); and VI-7.47 (±1.99). In conclusion, individual or simultaneous curing of the intermediate bonding agent layer and the resin sealant did not seem to affect bond strength to saliva-contaminated enamel. S3/F presented significantly higher SBS than the that of the groups treated with SB etch-and-rinse adhesive system and similar SBS to that of the control group, in which the sealant was applied under ideal dry, noncontaminated conditions.
publishDate 2008
dc.date.none.fl_str_mv 2008-01-01
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-64402008000400010
url http://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-64402008000400010
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv 10.1590/S0103-64402008000400010
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv text/html
dc.publisher.none.fl_str_mv Fundação Odontológica de Ribeirão Preto
publisher.none.fl_str_mv Fundação Odontológica de Ribeirão Preto
dc.source.none.fl_str_mv Brazilian Dental Journal v.19 n.4 2008
reponame:Brazilian Dental Journal
instname:Fundação Odontológica de Ribeirão Preto (FUNORP)
instacron:FUNORP
instname_str Fundação Odontológica de Ribeirão Preto (FUNORP)
instacron_str FUNORP
institution FUNORP
reponame_str Brazilian Dental Journal
collection Brazilian Dental Journal
repository.name.fl_str_mv Brazilian Dental Journal - Fundação Odontológica de Ribeirão Preto (FUNORP)
repository.mail.fl_str_mv bdj@forp.usp.br||sergio@fosjc.unesp.br
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