Constrained titanohematite formation at BTO/Fe interfaces deposited by RF-sputtering

• Autor(a) principal: Amorim, C.O.
• Data de Publicação: 2020
• Outros Autores: Sloyan, K., Correia, M. R., Lourenço, A. A.C.S., Dahlem, M.S., Amaral, V. S.
• Tipo de documento: Artigo
• Idioma: eng
• Título da fonte: Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
• Texto Completo: http://hdl.handle.net/10773/36959
• topic: Titanohematite; Magnetoelectric coupling; Multiferroics; Interfaces; RF-sputtering

The usage of heterostructures of ferromagnetic and ferroelectric materials, as a means of achieving magnetoelectric multiferroic coupling, is a widely used approach which has been showing promising results. Along this line of thought, the deposition of BaTiO3 and Fe multilayers on LaAlO3, MgO, Al2O3 and SrTiO3 substrates using RF-magnetron sputtering was carried out to study its viability to produce magnetoelectric heterostructures. It is shown that each substrate constrains the growth of the deposited thin films, even for the same deposition conditions. This is clearly seen through the magnetic properties of the thin film, mainly after performing a 900 °C thermal annealing in air. The thermal annealing results in the creation of iron oxides specific of each one of the substrates where the deposition took place.