Effect of the Substrate Biasing on the Structure and Properties of Tantalum Coatings Deposited Using HiPIMS in Deep Oscillations Magnetron Sputtering Mode
Autor(a) principal: | |
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Data de Publicação: | 2020 |
Outros Autores: | , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
Texto Completo: | http://hdl.handle.net/10316/106439 https://doi.org/10.3390/met10121618 |
Resumo: | The influence of energetic ion bombardment on the properties of tantalum coatings was studied. To achieve such energetic ion bombardment during the deposition process of tantalum coatings, a combination of deep oscillation magnetron sputtering (DOMS), an ionized physical vapour deposition technique, with substrate biasing was used. The substrate biasing was varied between 0 and 120 V. In this work, the structure (XRD), microstructure (SEM), surface morphology (AFM) and hardness, and Young’s modulus (nanoindentation) of the coatings were characterized. The results show with the use of such conditions it was possible to deposit a pure -Ta (the most desired at industrial level) with improved mechanical properties (hardness equal to 22.4 GPa and Young’s modulus equal to 235 GPa). The roughness of the Ta coatings decreases up to values of about 1 nm with an increase of substrate biasing. It was possible to deposit very dense Ta coatings with 2 m of thickness. Therefore, these results are significantly di erent than in previous works, o ering Ta coatings with a combination of very interesting properties. |
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Effect of the Substrate Biasing on the Structure and Properties of Tantalum Coatings Deposited Using HiPIMS in Deep Oscillations Magnetron Sputtering ModeHiPIMSdeep oscillation magnetron sputtering (DOMS)TabiasThe influence of energetic ion bombardment on the properties of tantalum coatings was studied. To achieve such energetic ion bombardment during the deposition process of tantalum coatings, a combination of deep oscillation magnetron sputtering (DOMS), an ionized physical vapour deposition technique, with substrate biasing was used. The substrate biasing was varied between 0 and 120 V. In this work, the structure (XRD), microstructure (SEM), surface morphology (AFM) and hardness, and Young’s modulus (nanoindentation) of the coatings were characterized. The results show with the use of such conditions it was possible to deposit a pure -Ta (the most desired at industrial level) with improved mechanical properties (hardness equal to 22.4 GPa and Young’s modulus equal to 235 GPa). The roughness of the Ta coatings decreases up to values of about 1 nm with an increase of substrate biasing. It was possible to deposit very dense Ta coatings with 2 m of thickness. Therefore, these results are significantly di erent than in previous works, o ering Ta coatings with a combination of very interesting properties.MDPI2020info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articlehttp://hdl.handle.net/10316/106439http://hdl.handle.net/10316/106439https://doi.org/10.3390/met10121618eng2075-4701Ferreira, FábioCavaleiro, AlbanoOliveira, Joãoinfo:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2023-04-03T20:36:13Zoai:estudogeral.uc.pt:10316/106439Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireopendoar:71602024-03-19T21:22:53.667712Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse |
dc.title.none.fl_str_mv |
Effect of the Substrate Biasing on the Structure and Properties of Tantalum Coatings Deposited Using HiPIMS in Deep Oscillations Magnetron Sputtering Mode |
title |
Effect of the Substrate Biasing on the Structure and Properties of Tantalum Coatings Deposited Using HiPIMS in Deep Oscillations Magnetron Sputtering Mode |
spellingShingle |
Effect of the Substrate Biasing on the Structure and Properties of Tantalum Coatings Deposited Using HiPIMS in Deep Oscillations Magnetron Sputtering Mode Ferreira, Fábio HiPIMS deep oscillation magnetron sputtering (DOMS) Ta bias |
title_short |
Effect of the Substrate Biasing on the Structure and Properties of Tantalum Coatings Deposited Using HiPIMS in Deep Oscillations Magnetron Sputtering Mode |
title_full |
Effect of the Substrate Biasing on the Structure and Properties of Tantalum Coatings Deposited Using HiPIMS in Deep Oscillations Magnetron Sputtering Mode |
title_fullStr |
Effect of the Substrate Biasing on the Structure and Properties of Tantalum Coatings Deposited Using HiPIMS in Deep Oscillations Magnetron Sputtering Mode |
title_full_unstemmed |
Effect of the Substrate Biasing on the Structure and Properties of Tantalum Coatings Deposited Using HiPIMS in Deep Oscillations Magnetron Sputtering Mode |
title_sort |
Effect of the Substrate Biasing on the Structure and Properties of Tantalum Coatings Deposited Using HiPIMS in Deep Oscillations Magnetron Sputtering Mode |
author |
Ferreira, Fábio |
author_facet |
Ferreira, Fábio Cavaleiro, Albano Oliveira, João |
author_role |
author |
author2 |
Cavaleiro, Albano Oliveira, João |
author2_role |
author author |
dc.contributor.author.fl_str_mv |
Ferreira, Fábio Cavaleiro, Albano Oliveira, João |
dc.subject.por.fl_str_mv |
HiPIMS deep oscillation magnetron sputtering (DOMS) Ta bias |
topic |
HiPIMS deep oscillation magnetron sputtering (DOMS) Ta bias |
description |
The influence of energetic ion bombardment on the properties of tantalum coatings was studied. To achieve such energetic ion bombardment during the deposition process of tantalum coatings, a combination of deep oscillation magnetron sputtering (DOMS), an ionized physical vapour deposition technique, with substrate biasing was used. The substrate biasing was varied between 0 and 120 V. In this work, the structure (XRD), microstructure (SEM), surface morphology (AFM) and hardness, and Young’s modulus (nanoindentation) of the coatings were characterized. The results show with the use of such conditions it was possible to deposit a pure -Ta (the most desired at industrial level) with improved mechanical properties (hardness equal to 22.4 GPa and Young’s modulus equal to 235 GPa). The roughness of the Ta coatings decreases up to values of about 1 nm with an increase of substrate biasing. It was possible to deposit very dense Ta coatings with 2 m of thickness. Therefore, these results are significantly di erent than in previous works, o ering Ta coatings with a combination of very interesting properties. |
publishDate |
2020 |
dc.date.none.fl_str_mv |
2020 |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://hdl.handle.net/10316/106439 http://hdl.handle.net/10316/106439 https://doi.org/10.3390/met10121618 |
url |
http://hdl.handle.net/10316/106439 https://doi.org/10.3390/met10121618 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
2075-4701 |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.publisher.none.fl_str_mv |
MDPI |
publisher.none.fl_str_mv |
MDPI |
dc.source.none.fl_str_mv |
reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação instacron:RCAAP |
instname_str |
Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
instacron_str |
RCAAP |
institution |
RCAAP |
reponame_str |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
collection |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
repository.name.fl_str_mv |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
repository.mail.fl_str_mv |
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1799134117234737152 |