Optimized SU-8 processing for low-cost microstructures fabrication without cleanroom facilities

• Autor(a) principal: Pinto, V. C.
• Data de Publicação: 2014
• Outros Autores: Sousa, Paulo J., Cardoso, Vanessa Fernandes, Minas, Graça
• Tipo de documento: Artigo
• Idioma: eng
• Título da fonte: Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
• Texto Completo: http://hdl.handle.net/1822/30823
• topic: SU-8; UV photolithography; Low-cost microfabrication; Without cleanroom facility; Microfluidic; MEMS; Science & Technology

The study and optimization of epoxy-based negative photoresist (SU-8) microstructures through a low-cost process and without the need for cleanroom facility is presented in this paper. It is demonstrated that the Ultraviolet Rays (UV) exposure equipment, commonly used in the Printed Circuit Board (PCB) industry, can replace the more expensive and less available equipment, as the Mask Aligner that has been used in the last 15 years for SU-8 patterning. Moreover, high transparency masks, printed in a photomask, are used, instead of expensive chromium masks. The fabrication of well-defined SU-8 microstructures with aspect ratios more than 20 is successfully demonstrated with those facilities. The viability of using the gray-scale technology in the photomasks for the fabrication of 3D microstructures is also reported. Moreover, SU-8 microstructures for different applications are shown throughout the paper.