TiO2:(Fe, S) Thin Films Prepared from Complex Precursors by CVD, Physical Chemical Properties, and Photocatalysis

• Autor(a) principal: Bessergenev, V.
• Data de Publicação: 2012
• Outros Autores: Mateus, Maria da Conceição, Vasconcelos, D. A., Mariano, José, do Rego, A. M. Botelho, Lange, R., Burkel, E.
• Tipo de documento: Artigo
• Idioma: eng
• Título da fonte: Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
• Texto Completo: http://hdl.handle.net/10400.1/12068
• topic: Visible-Light Photocatalysis; Doped Titanium-Dioxide; Ion-Implantation; Electronic-Structures; Fe; Deposition; Photodegradation; Degradation; Anatase; Oxides

The TiO2 thin films were prepared using Ti(dpm)(2)(OPri)(2) and Ti(OPri)(4) (dpm = 2,2,6,6-tetramethylheptane-3,5-dione, Pr-i = isopropyl) as the precursors. The volatile compounds Fe[(C2H5)(2)NCS2](3) and [(CH3)C](2)S-2 were used to prepare doped TiO2 films. The synthesis was done in vacuum or in the presence of Ar and O-2. The pressure in the CVD chamber was varied between 1.2 x 10(-4) mbar and 0.1 mbar, with the system working either in the molecular beam or gas flow regime. Physical, chemical, and photocatalytic properties of the (Fe, S)-doped TiO2 films were studied. Those TiO2:(Fe, S) films prepared from the Ti(OPri)(4) precursor show increased photocatalytic activities, very close to those of Degussa P25 powder in UV region.