Is Poly(Methyl Methacrylate) (PMMA) a suitable substrate for ALD?: A review
Autor(a) principal: | |
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Data de Publicação: | 2021 |
Outros Autores: | , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
Texto Completo: | http://hdl.handle.net/1822/72372 |
Resumo: | Poly (methyl methacrylate) (PMMA) is a thermoplastic synthetic polymer, which displays superior characteristics such as transparency, good tensile strength, and processability. Its performance can be improved by surface engineering via the use of functionalized thin film coatings, resulting in its versatility across a host of applications including, energy harvesting, dielectric layers and water purification. Modification of the PMMA surface can be achieved by atomic layer deposition (ALD), a vapor-phase, chemical deposition technique, which permits atomic-level control. However, PMMA presents a challenge for ALD due to its lack of active surface sites, necessary for gas precursor reaction, nucleation, and subsequent growth. The purpose of this review is to discuss the research related to the employment of PMMA as either a substrate, support, or masking layer over a range of ALD thin film growth techniques, namely, thermal, plasma-enhanced, and area-selective atomic layer deposition. It also highlights applications in the selected fields of flexible electronics, biomaterials, sensing, and photocatalysis, and underscores relevant characterization techniques. Further, it concludes with a prospective view of the role of ALD in PMMA processing. |
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Is Poly(Methyl Methacrylate) (PMMA) a suitable substrate for ALD?: A reviewpoly (methyl methacrylate) (PMMA)Atomic layer deposition (ALD)Polymeric substrateMetal oxideThin filmsPolymeric substrate; metal oxide; thin filmsCiências Naturais::Ciências FísicasScience & TechnologyPoly (methyl methacrylate) (PMMA) is a thermoplastic synthetic polymer, which displays superior characteristics such as transparency, good tensile strength, and processability. Its performance can be improved by surface engineering via the use of functionalized thin film coatings, resulting in its versatility across a host of applications including, energy harvesting, dielectric layers and water purification. Modification of the PMMA surface can be achieved by atomic layer deposition (ALD), a vapor-phase, chemical deposition technique, which permits atomic-level control. However, PMMA presents a challenge for ALD due to its lack of active surface sites, necessary for gas precursor reaction, nucleation, and subsequent growth. The purpose of this review is to discuss the research related to the employment of PMMA as either a substrate, support, or masking layer over a range of ALD thin film growth techniques, namely, thermal, plasma-enhanced, and area-selective atomic layer deposition. It also highlights applications in the selected fields of flexible electronics, biomaterials, sensing, and photocatalysis, and underscores relevant characterization techniques. Further, it concludes with a prospective view of the role of ALD in PMMA processing.e Fundação para a Ciência e Tecnologia (FCT, Portugal)/PIDDAC through the Strategic Funds project reference UIDB/04650/2020-2023. This work was developed within the scope of the project CICECO-Aveiro Institute of Materials, UIDB/50011/2020 and UIDP/50011/2020, financed by national funds through the Portuguese Foundation for Science and Technology/MCTESMDPIUniversidade do MinhoForte, MartaSilva, RicardoTavares, C. J.Silva, Rui20212021-01-01T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleapplication/pdfhttp://hdl.handle.net/1822/72372engForte, M. A., Silva, R. M., & Tavares, C. J. (2021). Is Poly (methyl methacrylate)(PMMA) a Suitable Substrate for ALD?: A Review. Polymers, 13(8), 1346cv-prod-25257612073-436010.3390/polym13081346https://www.mdpi.com/2073-4360/13/8/1346info:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2023-07-21T12:20:48Zoai:repositorium.sdum.uminho.pt:1822/72372Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireopendoar:71602024-03-19T19:13:57.497101Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse |
dc.title.none.fl_str_mv |
Is Poly(Methyl Methacrylate) (PMMA) a suitable substrate for ALD?: A review |
title |
Is Poly(Methyl Methacrylate) (PMMA) a suitable substrate for ALD?: A review |
spellingShingle |
Is Poly(Methyl Methacrylate) (PMMA) a suitable substrate for ALD?: A review Forte, Marta poly (methyl methacrylate) (PMMA) Atomic layer deposition (ALD) Polymeric substrate Metal oxide Thin films Polymeric substrate; metal oxide; thin films Ciências Naturais::Ciências Físicas Science & Technology |
title_short |
Is Poly(Methyl Methacrylate) (PMMA) a suitable substrate for ALD?: A review |
title_full |
Is Poly(Methyl Methacrylate) (PMMA) a suitable substrate for ALD?: A review |
title_fullStr |
Is Poly(Methyl Methacrylate) (PMMA) a suitable substrate for ALD?: A review |
title_full_unstemmed |
Is Poly(Methyl Methacrylate) (PMMA) a suitable substrate for ALD?: A review |
title_sort |
Is Poly(Methyl Methacrylate) (PMMA) a suitable substrate for ALD?: A review |
author |
Forte, Marta |
author_facet |
Forte, Marta Silva, Ricardo Tavares, C. J. Silva, Rui |
author_role |
author |
author2 |
Silva, Ricardo Tavares, C. J. Silva, Rui |
author2_role |
author author author |
dc.contributor.none.fl_str_mv |
Universidade do Minho |
dc.contributor.author.fl_str_mv |
Forte, Marta Silva, Ricardo Tavares, C. J. Silva, Rui |
dc.subject.por.fl_str_mv |
poly (methyl methacrylate) (PMMA) Atomic layer deposition (ALD) Polymeric substrate Metal oxide Thin films Polymeric substrate; metal oxide; thin films Ciências Naturais::Ciências Físicas Science & Technology |
topic |
poly (methyl methacrylate) (PMMA) Atomic layer deposition (ALD) Polymeric substrate Metal oxide Thin films Polymeric substrate; metal oxide; thin films Ciências Naturais::Ciências Físicas Science & Technology |
description |
Poly (methyl methacrylate) (PMMA) is a thermoplastic synthetic polymer, which displays superior characteristics such as transparency, good tensile strength, and processability. Its performance can be improved by surface engineering via the use of functionalized thin film coatings, resulting in its versatility across a host of applications including, energy harvesting, dielectric layers and water purification. Modification of the PMMA surface can be achieved by atomic layer deposition (ALD), a vapor-phase, chemical deposition technique, which permits atomic-level control. However, PMMA presents a challenge for ALD due to its lack of active surface sites, necessary for gas precursor reaction, nucleation, and subsequent growth. The purpose of this review is to discuss the research related to the employment of PMMA as either a substrate, support, or masking layer over a range of ALD thin film growth techniques, namely, thermal, plasma-enhanced, and area-selective atomic layer deposition. It also highlights applications in the selected fields of flexible electronics, biomaterials, sensing, and photocatalysis, and underscores relevant characterization techniques. Further, it concludes with a prospective view of the role of ALD in PMMA processing. |
publishDate |
2021 |
dc.date.none.fl_str_mv |
2021 2021-01-01T00:00:00Z |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://hdl.handle.net/1822/72372 |
url |
http://hdl.handle.net/1822/72372 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
Forte, M. A., Silva, R. M., & Tavares, C. J. (2021). Is Poly (methyl methacrylate)(PMMA) a Suitable Substrate for ALD?: A Review. Polymers, 13(8), 1346 cv-prod-2525761 2073-4360 10.3390/polym13081346 https://www.mdpi.com/2073-4360/13/8/1346 |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
application/pdf |
dc.publisher.none.fl_str_mv |
MDPI |
publisher.none.fl_str_mv |
MDPI |
dc.source.none.fl_str_mv |
reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação instacron:RCAAP |
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Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
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RCAAP |
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RCAAP |
reponame_str |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
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Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
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Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
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