The oxidation behaviour of mixed tungsten silicon sputtered coatings
Autor(a) principal: | |
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Data de Publicação: | 1999 |
Outros Autores: | |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
Texto Completo: | http://hdl.handle.net/10316/4321 https://doi.org/10.1016/S0040-6090(98)01568-5 |
Resumo: | W-Si-N coatings were deposited by sputtering and their chemical composition, structure, thermal and oxidation behaviour were characterised. Si-containing films are essentially amorphous. W69Si31 film crystallises at 750 °C as [alpha]-W and W5Si3 phases whereas no significant structural transformations were observed for W24Si21N55 film up to 1000 °C, In both cases elemental diffusion (Si and N) for the substrate was detected after thermal annealing. These coatings present much better oxidation resistance than W and W45N55 coatings. |
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The oxidation behaviour of mixed tungsten silicon sputtered coatingsOxidation resistanceSuicidesW-Si-N filmsTungsten silicideSputteringW-Si-N coatings were deposited by sputtering and their chemical composition, structure, thermal and oxidation behaviour were characterised. Si-containing films are essentially amorphous. W69Si31 film crystallises at 750 °C as [alpha]-W and W5Si3 phases whereas no significant structural transformations were observed for W24Si21N55 film up to 1000 °C, In both cases elemental diffusion (Si and N) for the substrate was detected after thermal annealing. These coatings present much better oxidation resistance than W and W45N55 coatings.http://www.sciencedirect.com/science/article/B6TW0-3Y6PSMH-21/1/4bbc4e5d0073b4d83d325b3e19383dd01999info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleaplication/PDFhttp://hdl.handle.net/10316/4321http://hdl.handle.net/10316/4321https://doi.org/10.1016/S0040-6090(98)01568-5engThin Solid Films. 343-344:(1999) 51-56Louro, C.Cavaleiro, A.info:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2022-07-28T13:41:38Zoai:estudogeral.uc.pt:10316/4321Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireopendoar:71602024-03-19T20:58:30.690833Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse |
dc.title.none.fl_str_mv |
The oxidation behaviour of mixed tungsten silicon sputtered coatings |
title |
The oxidation behaviour of mixed tungsten silicon sputtered coatings |
spellingShingle |
The oxidation behaviour of mixed tungsten silicon sputtered coatings Louro, C. Oxidation resistance Suicides W-Si-N films Tungsten silicide Sputtering |
title_short |
The oxidation behaviour of mixed tungsten silicon sputtered coatings |
title_full |
The oxidation behaviour of mixed tungsten silicon sputtered coatings |
title_fullStr |
The oxidation behaviour of mixed tungsten silicon sputtered coatings |
title_full_unstemmed |
The oxidation behaviour of mixed tungsten silicon sputtered coatings |
title_sort |
The oxidation behaviour of mixed tungsten silicon sputtered coatings |
author |
Louro, C. |
author_facet |
Louro, C. Cavaleiro, A. |
author_role |
author |
author2 |
Cavaleiro, A. |
author2_role |
author |
dc.contributor.author.fl_str_mv |
Louro, C. Cavaleiro, A. |
dc.subject.por.fl_str_mv |
Oxidation resistance Suicides W-Si-N films Tungsten silicide Sputtering |
topic |
Oxidation resistance Suicides W-Si-N films Tungsten silicide Sputtering |
description |
W-Si-N coatings were deposited by sputtering and their chemical composition, structure, thermal and oxidation behaviour were characterised. Si-containing films are essentially amorphous. W69Si31 film crystallises at 750 °C as [alpha]-W and W5Si3 phases whereas no significant structural transformations were observed for W24Si21N55 film up to 1000 °C, In both cases elemental diffusion (Si and N) for the substrate was detected after thermal annealing. These coatings present much better oxidation resistance than W and W45N55 coatings. |
publishDate |
1999 |
dc.date.none.fl_str_mv |
1999 |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://hdl.handle.net/10316/4321 http://hdl.handle.net/10316/4321 https://doi.org/10.1016/S0040-6090(98)01568-5 |
url |
http://hdl.handle.net/10316/4321 https://doi.org/10.1016/S0040-6090(98)01568-5 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
Thin Solid Films. 343-344:(1999) 51-56 |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
aplication/PDF |
dc.source.none.fl_str_mv |
reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação instacron:RCAAP |
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Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
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RCAAP |
institution |
RCAAP |
reponame_str |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
collection |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
repository.name.fl_str_mv |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
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1799133876328595456 |