Chemical vapour deposition of hexagonal boron nitride for two dimensional electronics

Detalhes bibliográficos
Autor(a) principal: Sompalle, Balaji
Data de Publicação: 2017
Outros Autores: Borme, Jérôme, Cerqueira, Fátima, Sun, Tangyou, Campos, Rui, Alpuim, P.
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
Texto Completo: http://hdl.handle.net/1822/48549
Resumo: Hexagonal boron nitride (h-BN) has potential applications in protective coatings, single photon emitters and as substrate for graphene electronics. In this paper, we report on the growth of h-BN by chemical vapor deposition (CVD) using ammonia borane as the precursor. Use of CVD allows controlled synthesis over large areas defined by process parameters, e.g. temperature, time, process chamber pressure and gas partial pressures. Furthermore, independently grown graphene and h-BN layers are put together to realize enhancement in electronic properties of graphene.
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spelling Chemical vapour deposition of hexagonal boron nitride for two dimensional electronicsHexagonal Boron NitrideChemical Vapor DepositionAmmonia boraneGraphene electronicsCiências Naturais::Ciências FísicasEngenharia e Tecnologia::Engenharia dos MateriaisEngenharia e Tecnologia::NanotecnologiaHexagonal boron nitride (h-BN) has potential applications in protective coatings, single photon emitters and as substrate for graphene electronics. In this paper, we report on the growth of h-BN by chemical vapor deposition (CVD) using ammonia borane as the precursor. Use of CVD allows controlled synthesis over large areas defined by process parameters, e.g. temperature, time, process chamber pressure and gas partial pressures. Furthermore, independently grown graphene and h-BN layers are put together to realize enhancement in electronic properties of graphene.info:eu-repo/semantics/publishedVersionUniversidade do Porto. Faculdade de Engenharia (FEUP)Universidade do MinhoSompalle, BalajiBorme, JérômeCerqueira, FátimaSun, TangyouCampos, RuiAlpuim, P.2017-11-242017-11-24T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleapplication/pdfhttp://hdl.handle.net/1822/48549eng2183-64932183-649310.24840/2183-6493.003.003.0003https://journalengineering.fe.up.pt/article/view/429info:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2023-07-21T12:02:49Zoai:repositorium.sdum.uminho.pt:1822/48549Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireopendoar:71602024-03-19T18:52:52.974774Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse
dc.title.none.fl_str_mv Chemical vapour deposition of hexagonal boron nitride for two dimensional electronics
title Chemical vapour deposition of hexagonal boron nitride for two dimensional electronics
spellingShingle Chemical vapour deposition of hexagonal boron nitride for two dimensional electronics
Sompalle, Balaji
Hexagonal Boron Nitride
Chemical Vapor Deposition
Ammonia borane
Graphene electronics
Ciências Naturais::Ciências Físicas
Engenharia e Tecnologia::Engenharia dos Materiais
Engenharia e Tecnologia::Nanotecnologia
title_short Chemical vapour deposition of hexagonal boron nitride for two dimensional electronics
title_full Chemical vapour deposition of hexagonal boron nitride for two dimensional electronics
title_fullStr Chemical vapour deposition of hexagonal boron nitride for two dimensional electronics
title_full_unstemmed Chemical vapour deposition of hexagonal boron nitride for two dimensional electronics
title_sort Chemical vapour deposition of hexagonal boron nitride for two dimensional electronics
author Sompalle, Balaji
author_facet Sompalle, Balaji
Borme, Jérôme
Cerqueira, Fátima
Sun, Tangyou
Campos, Rui
Alpuim, P.
author_role author
author2 Borme, Jérôme
Cerqueira, Fátima
Sun, Tangyou
Campos, Rui
Alpuim, P.
author2_role author
author
author
author
author
dc.contributor.none.fl_str_mv Universidade do Minho
dc.contributor.author.fl_str_mv Sompalle, Balaji
Borme, Jérôme
Cerqueira, Fátima
Sun, Tangyou
Campos, Rui
Alpuim, P.
dc.subject.por.fl_str_mv Hexagonal Boron Nitride
Chemical Vapor Deposition
Ammonia borane
Graphene electronics
Ciências Naturais::Ciências Físicas
Engenharia e Tecnologia::Engenharia dos Materiais
Engenharia e Tecnologia::Nanotecnologia
topic Hexagonal Boron Nitride
Chemical Vapor Deposition
Ammonia borane
Graphene electronics
Ciências Naturais::Ciências Físicas
Engenharia e Tecnologia::Engenharia dos Materiais
Engenharia e Tecnologia::Nanotecnologia
description Hexagonal boron nitride (h-BN) has potential applications in protective coatings, single photon emitters and as substrate for graphene electronics. In this paper, we report on the growth of h-BN by chemical vapor deposition (CVD) using ammonia borane as the precursor. Use of CVD allows controlled synthesis over large areas defined by process parameters, e.g. temperature, time, process chamber pressure and gas partial pressures. Furthermore, independently grown graphene and h-BN layers are put together to realize enhancement in electronic properties of graphene.
publishDate 2017
dc.date.none.fl_str_mv 2017-11-24
2017-11-24T00:00:00Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://hdl.handle.net/1822/48549
url http://hdl.handle.net/1822/48549
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv 2183-6493
2183-6493
10.24840/2183-6493.003.003.0003
https://journalengineering.fe.up.pt/article/view/429
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv application/pdf
dc.publisher.none.fl_str_mv Universidade do Porto. Faculdade de Engenharia (FEUP)
publisher.none.fl_str_mv Universidade do Porto. Faculdade de Engenharia (FEUP)
dc.source.none.fl_str_mv reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
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