Sub-micron structuring of silicon using femtosecond laser interferometry

Detalhes bibliográficos
Autor(a) principal: Oliveira, Vitor
Data de Publicação: 2013
Outros Autores: Vilar, R., Serra, R., Oliveira, J.C., Polushkin, N.I., Conde, O.
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
Texto Completo: http://hdl.handle.net/10400.21/5267
Resumo: We report the fabrication of planar sub-micron gratings in silicon with a period of 720 nm using a modified Michelson interferometer and femtosecond laser radiation. The gratings consist of alternated stripes of laser ablated and unmodified material. Ablated stripes are bordered by parallel ridges which protrude above the unmodified material. In the regions where ridges are formed, the laser radiation intensity is not sufficient to cause ablation. Nevertheless, melting and a significant temperature increase are expected, and ridges may be formed due to expansion of silicon during resolidification or silicon oxidation. These conclusions are consistent with the evolution of the stripes morphology as a function of the distance from the center of the grating.
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spelling Sub-micron structuring of silicon using femtosecond laser interferometrySilicon PatterningFemtosecond LaserMichelson InterferometerWe report the fabrication of planar sub-micron gratings in silicon with a period of 720 nm using a modified Michelson interferometer and femtosecond laser radiation. The gratings consist of alternated stripes of laser ablated and unmodified material. Ablated stripes are bordered by parallel ridges which protrude above the unmodified material. In the regions where ridges are formed, the laser radiation intensity is not sufficient to cause ablation. Nevertheless, melting and a significant temperature increase are expected, and ridges may be formed due to expansion of silicon during resolidification or silicon oxidation. These conclusions are consistent with the evolution of the stripes morphology as a function of the distance from the center of the grating.ElsevierRCIPLOliveira, VitorVilar, R.Serra, R.Oliveira, J.C.Polushkin, N.I.Conde, O.2015-10-09T17:38:41Z2013-122013-12-01T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleapplication/pdfhttp://hdl.handle.net/10400.21/5267engOLIVEIRA, V.; [et al] – Sub-Micron structuring of silicon using femtosecond laser interferometry. Optics & Laser Technology. ISSN: 0030-3992. Vol. 54 (2013), pp. 428-4310030-399210.1016/j.optlastec.2013.06.031metadata only accessinfo:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2023-08-03T09:48:25Zoai:repositorio.ipl.pt:10400.21/5267Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireopendoar:71602024-03-19T20:14:33.874644Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse
dc.title.none.fl_str_mv Sub-micron structuring of silicon using femtosecond laser interferometry
title Sub-micron structuring of silicon using femtosecond laser interferometry
spellingShingle Sub-micron structuring of silicon using femtosecond laser interferometry
Oliveira, Vitor
Silicon Patterning
Femtosecond Laser
Michelson Interferometer
title_short Sub-micron structuring of silicon using femtosecond laser interferometry
title_full Sub-micron structuring of silicon using femtosecond laser interferometry
title_fullStr Sub-micron structuring of silicon using femtosecond laser interferometry
title_full_unstemmed Sub-micron structuring of silicon using femtosecond laser interferometry
title_sort Sub-micron structuring of silicon using femtosecond laser interferometry
author Oliveira, Vitor
author_facet Oliveira, Vitor
Vilar, R.
Serra, R.
Oliveira, J.C.
Polushkin, N.I.
Conde, O.
author_role author
author2 Vilar, R.
Serra, R.
Oliveira, J.C.
Polushkin, N.I.
Conde, O.
author2_role author
author
author
author
author
dc.contributor.none.fl_str_mv RCIPL
dc.contributor.author.fl_str_mv Oliveira, Vitor
Vilar, R.
Serra, R.
Oliveira, J.C.
Polushkin, N.I.
Conde, O.
dc.subject.por.fl_str_mv Silicon Patterning
Femtosecond Laser
Michelson Interferometer
topic Silicon Patterning
Femtosecond Laser
Michelson Interferometer
description We report the fabrication of planar sub-micron gratings in silicon with a period of 720 nm using a modified Michelson interferometer and femtosecond laser radiation. The gratings consist of alternated stripes of laser ablated and unmodified material. Ablated stripes are bordered by parallel ridges which protrude above the unmodified material. In the regions where ridges are formed, the laser radiation intensity is not sufficient to cause ablation. Nevertheless, melting and a significant temperature increase are expected, and ridges may be formed due to expansion of silicon during resolidification or silicon oxidation. These conclusions are consistent with the evolution of the stripes morphology as a function of the distance from the center of the grating.
publishDate 2013
dc.date.none.fl_str_mv 2013-12
2013-12-01T00:00:00Z
2015-10-09T17:38:41Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://hdl.handle.net/10400.21/5267
url http://hdl.handle.net/10400.21/5267
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv OLIVEIRA, V.; [et al] – Sub-Micron structuring of silicon using femtosecond laser interferometry. Optics & Laser Technology. ISSN: 0030-3992. Vol. 54 (2013), pp. 428-431
0030-3992
10.1016/j.optlastec.2013.06.031
dc.rights.driver.fl_str_mv metadata only access
info:eu-repo/semantics/openAccess
rights_invalid_str_mv metadata only access
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv application/pdf
dc.publisher.none.fl_str_mv Elsevier
publisher.none.fl_str_mv Elsevier
dc.source.none.fl_str_mv reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron:RCAAP
instname_str Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron_str RCAAP
institution RCAAP
reponame_str Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
collection Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
repository.name.fl_str_mv Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
repository.mail.fl_str_mv
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