Lithographic mask defects mitigation on a multimode interference structure

Detalhes bibliográficos
Autor(a) principal: Lourenço, Paulo
Data de Publicação: 2020
Outros Autores: Fantoni, Alessandro, Costa, João, Vieira, M.
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
Texto Completo: http://hdl.handle.net/10362/121307
Resumo: LISBOA-01-0145-FEDER-031311 SFRH/BD/144833/2019 PTDC/NAN-OPT/31311/2017 IPL/2019/BioPlas-ISEL IPL/2019/MO-TFT-ISEL.
id RCAP_7ed6f8d025a32efff913d8c5473a1631
oai_identifier_str oai:run.unl.pt:10362/121307
network_acronym_str RCAP
network_name_str Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
repository_id_str 7160
spelling Lithographic mask defects mitigation on a multimode interference structureBeam propagation methodchemical potentialfinite differences time domaingraphenelithographic resolutionmultimode interferenceElectronic, Optical and Magnetic MaterialsAtomic and Molecular Physics, and OpticsEngineering (miscellaneous)Mechanical EngineeringLISBOA-01-0145-FEDER-031311 SFRH/BD/144833/2019 PTDC/NAN-OPT/31311/2017 IPL/2019/BioPlas-ISEL IPL/2019/MO-TFT-ISEL.Over the last decades, the lithographic technology has greatly contributed for the confirmation of Moore's law in the semiconductor industry. Key developments in lithography such as the operational wavelength decreasing, together with a performance increase in lens and imaging technology, enabled the reduction of cost per function in integrated circuits technology. In this work, the impact of lithographic defects introduced by the manufacturing process is analyzed through simulations and two mitigation techniques are presented. These perturbations are a consequence of the limited lithographic mask resolution reflected on deviations from the geometry of the ideal device. For this purpose, the Beam Propagation and Finite Differences Time Domain methods have been used to simulate a multi-mode interference structure based on silicon nitride. The structure is affected by random perturbations and the obtained results revealed a strong dependence between mask resolution, and imbalance and power loss. Two strategies have been followed concerning the mitigation of power loss and imbalance: - Access waveguides tapering and adjustable power splitting ratios through the electro-optic effect. Both strategies revealed results that indicate an improvement on device’s performance. However, once built, the former is a static design that favors indiscriminately all propagating modes in the multimode section. In the latter, finer tuning capabilities targeting different propagating modes may be enabled by dynamic compensation of power loss and imbalance, when in a closed loop control architecture. Such a control architecture may operate by sampling the output waveguides, extracting the error signal and, finally, negatively feeding it back to the electro-optic effect system, hence improving imbalance and power loss.CTS - Centro de Tecnologia e SistemasUNINOVA-Instituto de Desenvolvimento de Novas TecnologiasDEE - Departamento de Engenharia Electrotécnica e de ComputadoresDEE2010-A2 ElectrónicaRUNLourenço, PauloFantoni, AlessandroCosta, JoãoVieira, M.2021-07-19T22:18:07Z2020-092020-09-01T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/article11application/pdfhttp://hdl.handle.net/10362/121307eng0030-3917PURE: 32651533https://doi.org/10.7149/OPA.53.3.51042info:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2024-03-11T05:03:34Zoai:run.unl.pt:10362/121307Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireopendoar:71602024-03-20T03:44:33.739885Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse
dc.title.none.fl_str_mv Lithographic mask defects mitigation on a multimode interference structure
title Lithographic mask defects mitigation on a multimode interference structure
spellingShingle Lithographic mask defects mitigation on a multimode interference structure
Lourenço, Paulo
Beam propagation method
chemical potential
finite differences time domain
graphene
lithographic resolution
multimode interference
Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Engineering (miscellaneous)
Mechanical Engineering
title_short Lithographic mask defects mitigation on a multimode interference structure
title_full Lithographic mask defects mitigation on a multimode interference structure
title_fullStr Lithographic mask defects mitigation on a multimode interference structure
title_full_unstemmed Lithographic mask defects mitigation on a multimode interference structure
title_sort Lithographic mask defects mitigation on a multimode interference structure
author Lourenço, Paulo
author_facet Lourenço, Paulo
Fantoni, Alessandro
Costa, João
Vieira, M.
author_role author
author2 Fantoni, Alessandro
Costa, João
Vieira, M.
author2_role author
author
author
dc.contributor.none.fl_str_mv CTS - Centro de Tecnologia e Sistemas
UNINOVA-Instituto de Desenvolvimento de Novas Tecnologias
DEE - Departamento de Engenharia Electrotécnica e de Computadores
DEE2010-A2 Electrónica
RUN
dc.contributor.author.fl_str_mv Lourenço, Paulo
Fantoni, Alessandro
Costa, João
Vieira, M.
dc.subject.por.fl_str_mv Beam propagation method
chemical potential
finite differences time domain
graphene
lithographic resolution
multimode interference
Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Engineering (miscellaneous)
Mechanical Engineering
topic Beam propagation method
chemical potential
finite differences time domain
graphene
lithographic resolution
multimode interference
Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Engineering (miscellaneous)
Mechanical Engineering
description LISBOA-01-0145-FEDER-031311 SFRH/BD/144833/2019 PTDC/NAN-OPT/31311/2017 IPL/2019/BioPlas-ISEL IPL/2019/MO-TFT-ISEL.
publishDate 2020
dc.date.none.fl_str_mv 2020-09
2020-09-01T00:00:00Z
2021-07-19T22:18:07Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://hdl.handle.net/10362/121307
url http://hdl.handle.net/10362/121307
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv 0030-3917
PURE: 32651533
https://doi.org/10.7149/OPA.53.3.51042
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv 11
application/pdf
dc.source.none.fl_str_mv reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron:RCAAP
instname_str Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron_str RCAAP
institution RCAAP
reponame_str Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
collection Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
repository.name.fl_str_mv Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
repository.mail.fl_str_mv
_version_ 1799138053269225472

Registros relacionados