Active layers of high-performance lead zirconate titanate at temperatures compatible with silicon nano- and microelecronic devices

Detalhes bibliográficos
Autor(a) principal: Bretos, Inigo
Data de Publicação: 2016
Outros Autores: Jimenez, Ricardo, Tomczyk, Monika, Rodriguez-Castellon, Enrique, Vilarinho, Paula M., Lourdes Calzada, M.
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
Texto Completo: http://hdl.handle.net/10773/19743
Resumo: Applications of ferroelectric materials in modern microelectronics will be greatly encouraged if the thermal incompatibility between inorganic ferroelectrics and semiconductor devices is overcome. Here, solution-processable layers of the most commercial ferroelectric compound - morphotrophic phase boundary lead zirconate titanate, namely Pb(Zr0.52Ti0.48)O-3 (PZT) - are grown on silicon substrates at temperatures well below the standard CMOS process of semiconductor technology. The method, potentially transferable to a broader range of Zr:Ti ratios, is based on the addition of crystalline nanoseeds to photosensitive solutions of PZT resulting in perovskite crystallization from only 350 degrees C after the enhanced decomposition of metal precursors in the films by UV irradiation. A remanent polarization of 10.0 mu C cm(-2) is obtained for these films that is in the order of the switching charge densities demanded for FeRAM devices. Also, a dielectric constant of similar to 90 is measured at zero voltage which exceeds that of current single-oxide candidates for capacitance applications. The multifunctionality of the films is additionally demonstrated by their pyroelectric and piezoelectric performance. The potential integration of PZT layers at such low fabrication temperatures may redefine the concept design of classical microelectronic devices, besides allowing inorganic ferroelectrics to enter the scene of the emerging large-area, flexible electronics.
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spelling Active layers of high-performance lead zirconate titanate at temperatures compatible with silicon nano- and microelecronic devicesSOL-GEL METHODFIELD-EFFECT TRANSISTORSPBTIO3 THIN-FILMSFERROELECTRIC OXIDESFLEXIBLE ELECTRONICSEXCIMER-LASERCRYSTALLIZATIONPRECURSORSTECHNOLOGYDEPOSITIONApplications of ferroelectric materials in modern microelectronics will be greatly encouraged if the thermal incompatibility between inorganic ferroelectrics and semiconductor devices is overcome. Here, solution-processable layers of the most commercial ferroelectric compound - morphotrophic phase boundary lead zirconate titanate, namely Pb(Zr0.52Ti0.48)O-3 (PZT) - are grown on silicon substrates at temperatures well below the standard CMOS process of semiconductor technology. The method, potentially transferable to a broader range of Zr:Ti ratios, is based on the addition of crystalline nanoseeds to photosensitive solutions of PZT resulting in perovskite crystallization from only 350 degrees C after the enhanced decomposition of metal precursors in the films by UV irradiation. A remanent polarization of 10.0 mu C cm(-2) is obtained for these films that is in the order of the switching charge densities demanded for FeRAM devices. Also, a dielectric constant of similar to 90 is measured at zero voltage which exceeds that of current single-oxide candidates for capacitance applications. The multifunctionality of the films is additionally demonstrated by their pyroelectric and piezoelectric performance. The potential integration of PZT layers at such low fabrication temperatures may redefine the concept design of classical microelectronic devices, besides allowing inorganic ferroelectrics to enter the scene of the emerging large-area, flexible electronics.NATURE PUBLISHING GROUP2017-12-07T19:23:21Z2016-01-01T00:00:00Z2016info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleapplication/pdfhttp://hdl.handle.net/10773/19743eng2045-232210.1038/srep20143Bretos, InigoJimenez, RicardoTomczyk, MonikaRodriguez-Castellon, EnriqueVilarinho, Paula M.Lourdes Calzada, M.info:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2024-02-22T11:38:27Zoai:ria.ua.pt:10773/19743Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireopendoar:71602024-03-20T02:54:29.379829Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse
dc.title.none.fl_str_mv Active layers of high-performance lead zirconate titanate at temperatures compatible with silicon nano- and microelecronic devices
title Active layers of high-performance lead zirconate titanate at temperatures compatible with silicon nano- and microelecronic devices
spellingShingle Active layers of high-performance lead zirconate titanate at temperatures compatible with silicon nano- and microelecronic devices
Bretos, Inigo
SOL-GEL METHOD
FIELD-EFFECT TRANSISTORS
PBTIO3 THIN-FILMS
FERROELECTRIC OXIDES
FLEXIBLE ELECTRONICS
EXCIMER-LASER
CRYSTALLIZATION
PRECURSORS
TECHNOLOGY
DEPOSITION
title_short Active layers of high-performance lead zirconate titanate at temperatures compatible with silicon nano- and microelecronic devices
title_full Active layers of high-performance lead zirconate titanate at temperatures compatible with silicon nano- and microelecronic devices
title_fullStr Active layers of high-performance lead zirconate titanate at temperatures compatible with silicon nano- and microelecronic devices
title_full_unstemmed Active layers of high-performance lead zirconate titanate at temperatures compatible with silicon nano- and microelecronic devices
title_sort Active layers of high-performance lead zirconate titanate at temperatures compatible with silicon nano- and microelecronic devices
author Bretos, Inigo
author_facet Bretos, Inigo
Jimenez, Ricardo
Tomczyk, Monika
Rodriguez-Castellon, Enrique
Vilarinho, Paula M.
Lourdes Calzada, M.
author_role author
author2 Jimenez, Ricardo
Tomczyk, Monika
Rodriguez-Castellon, Enrique
Vilarinho, Paula M.
Lourdes Calzada, M.
author2_role author
author
author
author
author
dc.contributor.author.fl_str_mv Bretos, Inigo
Jimenez, Ricardo
Tomczyk, Monika
Rodriguez-Castellon, Enrique
Vilarinho, Paula M.
Lourdes Calzada, M.
dc.subject.por.fl_str_mv SOL-GEL METHOD
FIELD-EFFECT TRANSISTORS
PBTIO3 THIN-FILMS
FERROELECTRIC OXIDES
FLEXIBLE ELECTRONICS
EXCIMER-LASER
CRYSTALLIZATION
PRECURSORS
TECHNOLOGY
DEPOSITION
topic SOL-GEL METHOD
FIELD-EFFECT TRANSISTORS
PBTIO3 THIN-FILMS
FERROELECTRIC OXIDES
FLEXIBLE ELECTRONICS
EXCIMER-LASER
CRYSTALLIZATION
PRECURSORS
TECHNOLOGY
DEPOSITION
description Applications of ferroelectric materials in modern microelectronics will be greatly encouraged if the thermal incompatibility between inorganic ferroelectrics and semiconductor devices is overcome. Here, solution-processable layers of the most commercial ferroelectric compound - morphotrophic phase boundary lead zirconate titanate, namely Pb(Zr0.52Ti0.48)O-3 (PZT) - are grown on silicon substrates at temperatures well below the standard CMOS process of semiconductor technology. The method, potentially transferable to a broader range of Zr:Ti ratios, is based on the addition of crystalline nanoseeds to photosensitive solutions of PZT resulting in perovskite crystallization from only 350 degrees C after the enhanced decomposition of metal precursors in the films by UV irradiation. A remanent polarization of 10.0 mu C cm(-2) is obtained for these films that is in the order of the switching charge densities demanded for FeRAM devices. Also, a dielectric constant of similar to 90 is measured at zero voltage which exceeds that of current single-oxide candidates for capacitance applications. The multifunctionality of the films is additionally demonstrated by their pyroelectric and piezoelectric performance. The potential integration of PZT layers at such low fabrication temperatures may redefine the concept design of classical microelectronic devices, besides allowing inorganic ferroelectrics to enter the scene of the emerging large-area, flexible electronics.
publishDate 2016
dc.date.none.fl_str_mv 2016-01-01T00:00:00Z
2016
2017-12-07T19:23:21Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://hdl.handle.net/10773/19743
url http://hdl.handle.net/10773/19743
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv 2045-2322
10.1038/srep20143
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv application/pdf
dc.publisher.none.fl_str_mv NATURE PUBLISHING GROUP
publisher.none.fl_str_mv NATURE PUBLISHING GROUP
dc.source.none.fl_str_mv reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron:RCAAP
instname_str Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron_str RCAAP
institution RCAAP
reponame_str Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
collection Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
repository.name.fl_str_mv Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
repository.mail.fl_str_mv
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