Active layers of high-performance lead zirconate titanate at temperatures compatible with silicon nano- and microelecronic devices
Autor(a) principal: | |
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Data de Publicação: | 2016 |
Outros Autores: | , , , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
Texto Completo: | http://hdl.handle.net/10773/19743 |
Resumo: | Applications of ferroelectric materials in modern microelectronics will be greatly encouraged if the thermal incompatibility between inorganic ferroelectrics and semiconductor devices is overcome. Here, solution-processable layers of the most commercial ferroelectric compound - morphotrophic phase boundary lead zirconate titanate, namely Pb(Zr0.52Ti0.48)O-3 (PZT) - are grown on silicon substrates at temperatures well below the standard CMOS process of semiconductor technology. The method, potentially transferable to a broader range of Zr:Ti ratios, is based on the addition of crystalline nanoseeds to photosensitive solutions of PZT resulting in perovskite crystallization from only 350 degrees C after the enhanced decomposition of metal precursors in the films by UV irradiation. A remanent polarization of 10.0 mu C cm(-2) is obtained for these films that is in the order of the switching charge densities demanded for FeRAM devices. Also, a dielectric constant of similar to 90 is measured at zero voltage which exceeds that of current single-oxide candidates for capacitance applications. The multifunctionality of the films is additionally demonstrated by their pyroelectric and piezoelectric performance. The potential integration of PZT layers at such low fabrication temperatures may redefine the concept design of classical microelectronic devices, besides allowing inorganic ferroelectrics to enter the scene of the emerging large-area, flexible electronics. |
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Active layers of high-performance lead zirconate titanate at temperatures compatible with silicon nano- and microelecronic devicesSOL-GEL METHODFIELD-EFFECT TRANSISTORSPBTIO3 THIN-FILMSFERROELECTRIC OXIDESFLEXIBLE ELECTRONICSEXCIMER-LASERCRYSTALLIZATIONPRECURSORSTECHNOLOGYDEPOSITIONApplications of ferroelectric materials in modern microelectronics will be greatly encouraged if the thermal incompatibility between inorganic ferroelectrics and semiconductor devices is overcome. Here, solution-processable layers of the most commercial ferroelectric compound - morphotrophic phase boundary lead zirconate titanate, namely Pb(Zr0.52Ti0.48)O-3 (PZT) - are grown on silicon substrates at temperatures well below the standard CMOS process of semiconductor technology. The method, potentially transferable to a broader range of Zr:Ti ratios, is based on the addition of crystalline nanoseeds to photosensitive solutions of PZT resulting in perovskite crystallization from only 350 degrees C after the enhanced decomposition of metal precursors in the films by UV irradiation. A remanent polarization of 10.0 mu C cm(-2) is obtained for these films that is in the order of the switching charge densities demanded for FeRAM devices. Also, a dielectric constant of similar to 90 is measured at zero voltage which exceeds that of current single-oxide candidates for capacitance applications. The multifunctionality of the films is additionally demonstrated by their pyroelectric and piezoelectric performance. The potential integration of PZT layers at such low fabrication temperatures may redefine the concept design of classical microelectronic devices, besides allowing inorganic ferroelectrics to enter the scene of the emerging large-area, flexible electronics.NATURE PUBLISHING GROUP2017-12-07T19:23:21Z2016-01-01T00:00:00Z2016info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleapplication/pdfhttp://hdl.handle.net/10773/19743eng2045-232210.1038/srep20143Bretos, InigoJimenez, RicardoTomczyk, MonikaRodriguez-Castellon, EnriqueVilarinho, Paula M.Lourdes Calzada, M.info:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2024-02-22T11:38:27Zoai:ria.ua.pt:10773/19743Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireopendoar:71602024-03-20T02:54:29.379829Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse |
dc.title.none.fl_str_mv |
Active layers of high-performance lead zirconate titanate at temperatures compatible with silicon nano- and microelecronic devices |
title |
Active layers of high-performance lead zirconate titanate at temperatures compatible with silicon nano- and microelecronic devices |
spellingShingle |
Active layers of high-performance lead zirconate titanate at temperatures compatible with silicon nano- and microelecronic devices Bretos, Inigo SOL-GEL METHOD FIELD-EFFECT TRANSISTORS PBTIO3 THIN-FILMS FERROELECTRIC OXIDES FLEXIBLE ELECTRONICS EXCIMER-LASER CRYSTALLIZATION PRECURSORS TECHNOLOGY DEPOSITION |
title_short |
Active layers of high-performance lead zirconate titanate at temperatures compatible with silicon nano- and microelecronic devices |
title_full |
Active layers of high-performance lead zirconate titanate at temperatures compatible with silicon nano- and microelecronic devices |
title_fullStr |
Active layers of high-performance lead zirconate titanate at temperatures compatible with silicon nano- and microelecronic devices |
title_full_unstemmed |
Active layers of high-performance lead zirconate titanate at temperatures compatible with silicon nano- and microelecronic devices |
title_sort |
Active layers of high-performance lead zirconate titanate at temperatures compatible with silicon nano- and microelecronic devices |
author |
Bretos, Inigo |
author_facet |
Bretos, Inigo Jimenez, Ricardo Tomczyk, Monika Rodriguez-Castellon, Enrique Vilarinho, Paula M. Lourdes Calzada, M. |
author_role |
author |
author2 |
Jimenez, Ricardo Tomczyk, Monika Rodriguez-Castellon, Enrique Vilarinho, Paula M. Lourdes Calzada, M. |
author2_role |
author author author author author |
dc.contributor.author.fl_str_mv |
Bretos, Inigo Jimenez, Ricardo Tomczyk, Monika Rodriguez-Castellon, Enrique Vilarinho, Paula M. Lourdes Calzada, M. |
dc.subject.por.fl_str_mv |
SOL-GEL METHOD FIELD-EFFECT TRANSISTORS PBTIO3 THIN-FILMS FERROELECTRIC OXIDES FLEXIBLE ELECTRONICS EXCIMER-LASER CRYSTALLIZATION PRECURSORS TECHNOLOGY DEPOSITION |
topic |
SOL-GEL METHOD FIELD-EFFECT TRANSISTORS PBTIO3 THIN-FILMS FERROELECTRIC OXIDES FLEXIBLE ELECTRONICS EXCIMER-LASER CRYSTALLIZATION PRECURSORS TECHNOLOGY DEPOSITION |
description |
Applications of ferroelectric materials in modern microelectronics will be greatly encouraged if the thermal incompatibility between inorganic ferroelectrics and semiconductor devices is overcome. Here, solution-processable layers of the most commercial ferroelectric compound - morphotrophic phase boundary lead zirconate titanate, namely Pb(Zr0.52Ti0.48)O-3 (PZT) - are grown on silicon substrates at temperatures well below the standard CMOS process of semiconductor technology. The method, potentially transferable to a broader range of Zr:Ti ratios, is based on the addition of crystalline nanoseeds to photosensitive solutions of PZT resulting in perovskite crystallization from only 350 degrees C after the enhanced decomposition of metal precursors in the films by UV irradiation. A remanent polarization of 10.0 mu C cm(-2) is obtained for these films that is in the order of the switching charge densities demanded for FeRAM devices. Also, a dielectric constant of similar to 90 is measured at zero voltage which exceeds that of current single-oxide candidates for capacitance applications. The multifunctionality of the films is additionally demonstrated by their pyroelectric and piezoelectric performance. The potential integration of PZT layers at such low fabrication temperatures may redefine the concept design of classical microelectronic devices, besides allowing inorganic ferroelectrics to enter the scene of the emerging large-area, flexible electronics. |
publishDate |
2016 |
dc.date.none.fl_str_mv |
2016-01-01T00:00:00Z 2016 2017-12-07T19:23:21Z |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://hdl.handle.net/10773/19743 |
url |
http://hdl.handle.net/10773/19743 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
2045-2322 10.1038/srep20143 |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
application/pdf |
dc.publisher.none.fl_str_mv |
NATURE PUBLISHING GROUP |
publisher.none.fl_str_mv |
NATURE PUBLISHING GROUP |
dc.source.none.fl_str_mv |
reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação instacron:RCAAP |
instname_str |
Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
instacron_str |
RCAAP |
institution |
RCAAP |
reponame_str |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
collection |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) |
repository.name.fl_str_mv |
Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação |
repository.mail.fl_str_mv |
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1799137597621010432 |