Structural and electrical properties of Al doped ZnO thin films deposited at room temperature on poly(vinilidene fluoride) substrates

• Autor(a) principal: Oliveira, C.
• Data de Publicação: 2009
• Outros Autores: Rebouta, L., de Lacerda-Arôso, T., Lanceros-Méndez, S., Viseu, T. M. R., Tavares, C. J., Tovar, J., Ferdov, S., Alves, E.
• Tipo de documento: Artigo
• Idioma: eng
• Título da fonte: Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
• Texto Completo: http://hdl.handle.net/1822/61373
• topic: AZOY; Reactive magnetron sputtering; Electroactive polymers; Electrical properties; Ciências Naturais::Ciências Físicas; Science & Technology

Transparent, conducting, Al-doped ZnO films have been deposited, by dc and pulsed dc magnetron sputtering, on glass and electroactive polymer (poly(vinylidene fluoride)-PVDF) substrates. Samples have been prepared at room temperature varying the argon sputtering pressure, after optimizing other processing conditions. All ZnO:Al films are polycrystalline and preferentially oriented along the [002] axis. Electrical resistivity around 3.3 x 10(-3) Omega cm and optical transmittance of similar to 85% at 550 nm have been obtained for AZOY films deposited on glass, while a resistivity of 1.7 x 10(-2) Omega cm and transmittance of similar to 70% at 550 nm have been attained in similar coatings on PVDF. One of the main parameters affecting film resistivity seems to be the roughness of the substrate.