Structural evolution in ZrNxOy thin films as a function of temperature

• Autor(a) principal: Cunha, L.
• Data de Publicação: 2006
• Outros Autores: Vaz, F., Moura, C., Rebouta, L., Carvalho, P., Alves, E., Cavaleiro, A., Goudeau, Ph., Rivière, J. P.
• Tipo de documento: Artigo
• Idioma: eng
• Título da fonte: Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
• Texto Completo: http://hdl.handle.net/10316/4230; https://doi.org/10.1016/j.surfcoat.2004.09.030
• topic: Zirconium oxynitride; PVD coatings; Decorative coatings; Heat treatment

Single-layered zirconium oxynitride (ZrNxOy) thin films have been deposited on steel substrates, at a constant temperature of 300 °C, by radiofrequency (rf) reactive magnetron sputtering of a pure Zr target in an argon-oxygen-nitrogen atmosphere. The variation of the flow rate of the reactive gases enabled changes in the composition and structure of the films. X-ray diffraction (XRD) and glancing incidence X-ray diffraction (GIXRD) were used to study the as-deposited films and their structural changes during or after heat treatment, from 400 to 900 °C, in controlled atmosphere and in vacuum.