Impedance measurements for electroless nickel plating process

Detalhes bibliográficos
Autor(a) principal: Karthikeyan,S.
Data de Publicação: 2006
Outros Autores: Srinivasan,K.N., Vasudevan,T., John,S.
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
Texto Completo: http://scielo.pt/scielo.php?script=sci_arttext&pid=S0872-19042006000400003
Resumo: Electroless nickel (EN) process is the controlled auto catalytic reduction of nickel ions using suitable reducing agent such as sodium hypophosphite on certain catalytic surfaces, which results in the production of sound, coherent coatings for a number of applications. Frequently the rate of deposition of EN with hypophosphite as reducing agent is below 20 microns per hour. Hence the deposition of the electroless nickel with hypophosphite solution in the presence of small concentration of thiourea and its derivatives as accelerators is investigated. The mechanism of accelerated deposition is studied by impedance measurements. The performance of various additives during the plating process is being evaluated by increased Constant Phase Element (CPE) and decreased charge transfer resistance values. A model is proposed for the adsorptive behavior of additives.
id RCAP_c2e760e1dac8784bdb7bef0a9979a505
oai_identifier_str oai:scielo:S0872-19042006000400003
network_acronym_str RCAP
network_name_str Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
repository_id_str 7160
spelling Impedance measurements for electroless nickel plating processelectroless nickelimpedance studiesacceleratorsthiourea and its derivativesElectroless nickel (EN) process is the controlled auto catalytic reduction of nickel ions using suitable reducing agent such as sodium hypophosphite on certain catalytic surfaces, which results in the production of sound, coherent coatings for a number of applications. Frequently the rate of deposition of EN with hypophosphite as reducing agent is below 20 microns per hour. Hence the deposition of the electroless nickel with hypophosphite solution in the presence of small concentration of thiourea and its derivatives as accelerators is investigated. The mechanism of accelerated deposition is studied by impedance measurements. The performance of various additives during the plating process is being evaluated by increased Constant Phase Element (CPE) and decreased charge transfer resistance values. A model is proposed for the adsorptive behavior of additives.Sociedade Portuguesa de Electroquímica2006-01-01info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articletext/htmlhttp://scielo.pt/scielo.php?script=sci_arttext&pid=S0872-19042006000400003Portugaliae Electrochimica Acta v.24 n.4 2006reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAPenghttp://scielo.pt/scielo.php?script=sci_arttext&pid=S0872-19042006000400003Karthikeyan,S.Srinivasan,K.N.Vasudevan,T.John,S.info:eu-repo/semantics/openAccess2024-02-06T17:06:50Zoai:scielo:S0872-19042006000400003Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireopendoar:71602024-03-20T02:20:01.415080Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse
dc.title.none.fl_str_mv Impedance measurements for electroless nickel plating process
title Impedance measurements for electroless nickel plating process
spellingShingle Impedance measurements for electroless nickel plating process
Karthikeyan,S.
electroless nickel
impedance studies
accelerators
thiourea and its derivatives
title_short Impedance measurements for electroless nickel plating process
title_full Impedance measurements for electroless nickel plating process
title_fullStr Impedance measurements for electroless nickel plating process
title_full_unstemmed Impedance measurements for electroless nickel plating process
title_sort Impedance measurements for electroless nickel plating process
author Karthikeyan,S.
author_facet Karthikeyan,S.
Srinivasan,K.N.
Vasudevan,T.
John,S.
author_role author
author2 Srinivasan,K.N.
Vasudevan,T.
John,S.
author2_role author
author
author
dc.contributor.author.fl_str_mv Karthikeyan,S.
Srinivasan,K.N.
Vasudevan,T.
John,S.
dc.subject.por.fl_str_mv electroless nickel
impedance studies
accelerators
thiourea and its derivatives
topic electroless nickel
impedance studies
accelerators
thiourea and its derivatives
description Electroless nickel (EN) process is the controlled auto catalytic reduction of nickel ions using suitable reducing agent such as sodium hypophosphite on certain catalytic surfaces, which results in the production of sound, coherent coatings for a number of applications. Frequently the rate of deposition of EN with hypophosphite as reducing agent is below 20 microns per hour. Hence the deposition of the electroless nickel with hypophosphite solution in the presence of small concentration of thiourea and its derivatives as accelerators is investigated. The mechanism of accelerated deposition is studied by impedance measurements. The performance of various additives during the plating process is being evaluated by increased Constant Phase Element (CPE) and decreased charge transfer resistance values. A model is proposed for the adsorptive behavior of additives.
publishDate 2006
dc.date.none.fl_str_mv 2006-01-01
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://scielo.pt/scielo.php?script=sci_arttext&pid=S0872-19042006000400003
url http://scielo.pt/scielo.php?script=sci_arttext&pid=S0872-19042006000400003
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv http://scielo.pt/scielo.php?script=sci_arttext&pid=S0872-19042006000400003
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv text/html
dc.publisher.none.fl_str_mv Sociedade Portuguesa de Electroquímica
publisher.none.fl_str_mv Sociedade Portuguesa de Electroquímica
dc.source.none.fl_str_mv Portugaliae Electrochimica Acta v.24 n.4 2006
reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron:RCAAP
instname_str Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron_str RCAAP
institution RCAAP
reponame_str Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
collection Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
repository.name.fl_str_mv Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
repository.mail.fl_str_mv
_version_ 1799137289445572608

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