Computer simulation study about the dependence of amorphous silicon photonic waveguides efficiency on the material quality

Detalhes bibliográficos
Autor(a) principal: Fantoni, Alessandro
Data de Publicação: 2020
Outros Autores: Costa, João, Lourenço, Paulo, Vieira, Manuela
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
Texto Completo: http://hdl.handle.net/10400.21/12032
Resumo: Este trabalho foi financiado pelo Concurso Anual para Projetos de Investigação, Desenvolvimento, Inovação e Criação Artística (IDI&CA) 2016 do Instituto Politécnico de Lisboa. Código de referência IPL/2018/aSiPhoto_ISEL
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spelling Computer simulation study about the dependence of amorphous silicon photonic waveguides efficiency on the material qualityAmorphous siliconSimulation analysisLithography imperfectionsDeposition processEste trabalho foi financiado pelo Concurso Anual para Projetos de Investigação, Desenvolvimento, Inovação e Criação Artística (IDI&CA) 2016 do Instituto Politécnico de Lisboa. Código de referência IPL/2018/aSiPhoto_ISELAmorphous silicon PECVD photonic integrated devices are promising candidates for low cost sensing applications. This manuscript reports a simulation analysis about the impact on the overall efficiency caused by the lithography imperfections in the deposition process. The tolerance to the fabrication defects of a photonic sensor based on surface plasmonic resonance is analysed. The simulations are performed with FDTD and BPM algorithms. The device is a plasmonic interferometer composed by an a-Si:H waveguide covered by a thin gold layer. The sensing analysis is performed by equally splitting the input light into two arms, allowing the sensor to be calibrated by its reference arm. Two different 1 × 2 power splitter configurations are presented: a directional coupler and a multimode interference splitter. The waveguide sidewall roughness is considered as the major negative effect caused by deposition imperfections. The simulation results show that plasmonic effects can be excited in the interferometric waveguide structure, allowing a sensing device with enough sensitivity to support the functioning of a bio sensor for high throughput screening. In addition, the good tolerance to the waveguide wall roughness, points out the PECVD deposition technique as reliable method for the overall sensor system to be produced in a low-cost system. The large area deposition of photonics structures, allowed by the PECVD method, can be explored to design a multiplexed system for analysis of multiple biomarkers to further increase the tolerance to fabrication defects.EDP SciencesRCIPLFantoni, AlessandroCosta, JoãoLourenço, PauloVieira, Manuela2020-07-10T14:32:48Z2020-07-072020-07-07T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleapplication/pdfhttp://hdl.handle.net/10400.21/12032engFANTONI, Alessandro; [et al] – Computer simulation study about the dependence of amorphous silicon photonic waveguides efficiency on the material quality. European Physical Journal Applied Physics. ISSN 1286-0042. Vol. 90, N.º 3 (2020), pp. 30502-p1-30502-p101286-004210.1051/epjap/2020190250metadata only accessinfo:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2023-08-03T10:04:11Zoai:repositorio.ipl.pt:10400.21/12032Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireopendoar:71602024-03-19T20:20:12.086208Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse
dc.title.none.fl_str_mv Computer simulation study about the dependence of amorphous silicon photonic waveguides efficiency on the material quality
title Computer simulation study about the dependence of amorphous silicon photonic waveguides efficiency on the material quality
spellingShingle Computer simulation study about the dependence of amorphous silicon photonic waveguides efficiency on the material quality
Fantoni, Alessandro
Amorphous silicon
Simulation analysis
Lithography imperfections
Deposition process
title_short Computer simulation study about the dependence of amorphous silicon photonic waveguides efficiency on the material quality
title_full Computer simulation study about the dependence of amorphous silicon photonic waveguides efficiency on the material quality
title_fullStr Computer simulation study about the dependence of amorphous silicon photonic waveguides efficiency on the material quality
title_full_unstemmed Computer simulation study about the dependence of amorphous silicon photonic waveguides efficiency on the material quality
title_sort Computer simulation study about the dependence of amorphous silicon photonic waveguides efficiency on the material quality
author Fantoni, Alessandro
author_facet Fantoni, Alessandro
Costa, João
Lourenço, Paulo
Vieira, Manuela
author_role author
author2 Costa, João
Lourenço, Paulo
Vieira, Manuela
author2_role author
author
author
dc.contributor.none.fl_str_mv RCIPL
dc.contributor.author.fl_str_mv Fantoni, Alessandro
Costa, João
Lourenço, Paulo
Vieira, Manuela
dc.subject.por.fl_str_mv Amorphous silicon
Simulation analysis
Lithography imperfections
Deposition process
topic Amorphous silicon
Simulation analysis
Lithography imperfections
Deposition process
description Este trabalho foi financiado pelo Concurso Anual para Projetos de Investigação, Desenvolvimento, Inovação e Criação Artística (IDI&CA) 2016 do Instituto Politécnico de Lisboa. Código de referência IPL/2018/aSiPhoto_ISEL
publishDate 2020
dc.date.none.fl_str_mv 2020-07-10T14:32:48Z
2020-07-07
2020-07-07T00:00:00Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://hdl.handle.net/10400.21/12032
url http://hdl.handle.net/10400.21/12032
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv FANTONI, Alessandro; [et al] – Computer simulation study about the dependence of amorphous silicon photonic waveguides efficiency on the material quality. European Physical Journal Applied Physics. ISSN 1286-0042. Vol. 90, N.º 3 (2020), pp. 30502-p1-30502-p10
1286-0042
10.1051/epjap/2020190250
dc.rights.driver.fl_str_mv metadata only access
info:eu-repo/semantics/openAccess
rights_invalid_str_mv metadata only access
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv application/pdf
dc.publisher.none.fl_str_mv EDP Sciences
publisher.none.fl_str_mv EDP Sciences
dc.source.none.fl_str_mv reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron:RCAAP
instname_str Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron_str RCAAP
institution RCAAP
reponame_str Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
collection Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
repository.name.fl_str_mv Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
repository.mail.fl_str_mv
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