Application of ultrasonic sprayed zirconium oxide dielectric in zinc tin oxide-based thin film transistor

Detalhes bibliográficos
Autor(a) principal: Oluwabi, Abayomi T.
Data de Publicação: 2020
Outros Autores: Katerski, Atanas, Carlos, Emanuel, Branquinho, Rita, Mere, Arvo, Krunks, Malle, Fortunato, Elvira, Pereira, Luis, Oja Acik, Ilona
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
Texto Completo: http://hdl.handle.net/10362/93930
Resumo: project IUT194 UID/CTM/50025/2019 project TK141 Grant Agreement 17161 SFRH/BD/116047/2016
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spelling Application of ultrasonic sprayed zirconium oxide dielectric in zinc tin oxide-based thin film transistorproject IUT194 UID/CTM/50025/2019 project TK141 Grant Agreement 17161 SFRH/BD/116047/2016Solution processing of metal oxides has been the focal point of interest for many researchers mainly because of the cost effectiveness and improved properties of metal oxides. However, achieving uniform and high-quality film deposition has been a recurring challenge using various wet-chemical techniques. Herein, we report a fully solution-based fabrication process exploiting both the ultrasonic spray pyrolysis (USP) and spin coating techniques owing to their simplicity, high degree of freedom for mixing metal oxide precursor salt, and larger area deposition. An amorphous zirconium oxide (ZrOx) dielectric and zinc tin oxide (ZTO) semiconductor were deposited, respectively. The dielectric characteristics of the ZrOx thin films were accessed by fabricating MIS-devices for the samples deposited at 200 °C and 400 °C, which exhibited a capacitance of 0.35 and 0.67 μF cm−2 at 100 kHz and relative permittivity of 8.5 and 22.7, respectively. The ZrOx thin film was then integrated as the gate dielectric layer in ZTO solution-processed thin film transistors, exhibiting a high electrical performance with low hysteresis (−0.18 V), high on/off current ratio of 106 orders of magnitude, saturation mobility of 4.6 cm2 V s−1, subthreshold slope of 0.25 V dec−1, and operating at a low voltage window of 3 V. Based on these results, the as-fabricated ZTO/ZrOx TFT opens the potential application of solution-processed transistors for low-cost electronic devices.DCM - Departamento de Ciência dos MateriaisCENIMAT-i3N - Centro de Investigação de Materiais (Lab. Associado I3N)UNINOVA-Instituto de Desenvolvimento de Novas TecnologiasRUNOluwabi, Abayomi T.Katerski, AtanasCarlos, EmanuelBranquinho, RitaMere, ArvoKrunks, MalleFortunato, ElviraPereira, LuisOja Acik, Ilona2020-03-06T23:32:10Z2020-03-212020-03-21T00:00:00Zinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleapplication/pdfhttp://hdl.handle.net/10362/93930eng2050-7526PURE: 17083954https://doi.org/10.1039/C9TC05127Ainfo:eu-repo/semantics/openAccessreponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãoinstacron:RCAAP2024-03-11T04:42:08Zoai:run.unl.pt:10362/93930Portal AgregadorONGhttps://www.rcaap.pt/oai/openaireopendoar:71602024-03-20T03:37:52.635700Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informaçãofalse
dc.title.none.fl_str_mv Application of ultrasonic sprayed zirconium oxide dielectric in zinc tin oxide-based thin film transistor
title Application of ultrasonic sprayed zirconium oxide dielectric in zinc tin oxide-based thin film transistor
spellingShingle Application of ultrasonic sprayed zirconium oxide dielectric in zinc tin oxide-based thin film transistor
Oluwabi, Abayomi T.
title_short Application of ultrasonic sprayed zirconium oxide dielectric in zinc tin oxide-based thin film transistor
title_full Application of ultrasonic sprayed zirconium oxide dielectric in zinc tin oxide-based thin film transistor
title_fullStr Application of ultrasonic sprayed zirconium oxide dielectric in zinc tin oxide-based thin film transistor
title_full_unstemmed Application of ultrasonic sprayed zirconium oxide dielectric in zinc tin oxide-based thin film transistor
title_sort Application of ultrasonic sprayed zirconium oxide dielectric in zinc tin oxide-based thin film transistor
author Oluwabi, Abayomi T.
author_facet Oluwabi, Abayomi T.
Katerski, Atanas
Carlos, Emanuel
Branquinho, Rita
Mere, Arvo
Krunks, Malle
Fortunato, Elvira
Pereira, Luis
Oja Acik, Ilona
author_role author
author2 Katerski, Atanas
Carlos, Emanuel
Branquinho, Rita
Mere, Arvo
Krunks, Malle
Fortunato, Elvira
Pereira, Luis
Oja Acik, Ilona
author2_role author
author
author
author
author
author
author
author
dc.contributor.none.fl_str_mv DCM - Departamento de Ciência dos Materiais
CENIMAT-i3N - Centro de Investigação de Materiais (Lab. Associado I3N)
UNINOVA-Instituto de Desenvolvimento de Novas Tecnologias
RUN
dc.contributor.author.fl_str_mv Oluwabi, Abayomi T.
Katerski, Atanas
Carlos, Emanuel
Branquinho, Rita
Mere, Arvo
Krunks, Malle
Fortunato, Elvira
Pereira, Luis
Oja Acik, Ilona
description project IUT194 UID/CTM/50025/2019 project TK141 Grant Agreement 17161 SFRH/BD/116047/2016
publishDate 2020
dc.date.none.fl_str_mv 2020-03-06T23:32:10Z
2020-03-21
2020-03-21T00:00:00Z
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://hdl.handle.net/10362/93930
url http://hdl.handle.net/10362/93930
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv 2050-7526
PURE: 17083954
https://doi.org/10.1039/C9TC05127A
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv application/pdf
dc.source.none.fl_str_mv reponame:Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
instname:Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron:RCAAP
instname_str Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
instacron_str RCAAP
institution RCAAP
reponame_str Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
collection Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos)
repository.name.fl_str_mv Repositório Científico de Acesso Aberto de Portugal (Repositórios Cientìficos) - Agência para a Sociedade do Conhecimento (UMIC) - FCT - Sociedade da Informação
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