Physical properties of CdS/ITO thin films growth by CBD technique with substrate oscillating agitation
Autor(a) principal: | |
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Data de Publicação: | 2006 |
Outros Autores: | , , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Brazilian Journal of Physics |
Texto Completo: | http://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97332006000600069 |
Resumo: | Cadmium sulphide (CdS) thin films deposited on indium tin oxide (ITO) substrates were prepared by chemical bath deposition technique by using different conditions to agitate the bath and the substrate. For substrate, an oscillating device working at 37 Hz was adapted to support each ITO substrate in order to agitate the substrate during deposition, meanwhile the chemical solution is heated and/not agitated. The deposited films were characterized on their morphology, on the band gap energy, and on thickness. The implemented novel technique for substrate oscillation has shown to improve the films quality, by the chemical bath without colloidal precipitates and by the clean film surfaces obtained. CdS films with variable deposition time can be achieved depending on the agitating technique. The mean band gap energy obtained around 2.41 eV is similar to the typical value reported in the literature for this material. In addition, by oscillating only the substrate during deposition is possible to obtain clean films and avoid the formation of colloidal precipitates on the chemical bath, normally presented when it is magnetically or ultrasonically agitated. |
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Brazilian Journal of Physics |
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Physical properties of CdS/ITO thin films growth by CBD technique with substrate oscillating agitationCadmium sulphideChemical bath depositionOscillating agitationCadmium sulphide (CdS) thin films deposited on indium tin oxide (ITO) substrates were prepared by chemical bath deposition technique by using different conditions to agitate the bath and the substrate. For substrate, an oscillating device working at 37 Hz was adapted to support each ITO substrate in order to agitate the substrate during deposition, meanwhile the chemical solution is heated and/not agitated. The deposited films were characterized on their morphology, on the band gap energy, and on thickness. The implemented novel technique for substrate oscillation has shown to improve the films quality, by the chemical bath without colloidal precipitates and by the clean film surfaces obtained. CdS films with variable deposition time can be achieved depending on the agitating technique. The mean band gap energy obtained around 2.41 eV is similar to the typical value reported in the literature for this material. In addition, by oscillating only the substrate during deposition is possible to obtain clean films and avoid the formation of colloidal precipitates on the chemical bath, normally presented when it is magnetically or ultrasonically agitated.Sociedade Brasileira de Física2006-09-01info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersiontext/htmlhttp://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97332006000600069Brazilian Journal of Physics v.36 n.3b 2006reponame:Brazilian Journal of Physicsinstname:Sociedade Brasileira de Física (SBF)instacron:SBF10.1590/S0103-97332006000600069info:eu-repo/semantics/openAccessSalazar,Y. A.Patiño,R.Peña,J. L.Cauich,W.Oliva,A.I.eng2006-11-29T00:00:00Zoai:scielo:S0103-97332006000600069Revistahttp://www.sbfisica.org.br/v1/home/index.php/pt/ONGhttps://old.scielo.br/oai/scielo-oai.phpsbfisica@sbfisica.org.br||sbfisica@sbfisica.org.br1678-44480103-9733opendoar:2006-11-29T00:00Brazilian Journal of Physics - Sociedade Brasileira de Física (SBF)false |
dc.title.none.fl_str_mv |
Physical properties of CdS/ITO thin films growth by CBD technique with substrate oscillating agitation |
title |
Physical properties of CdS/ITO thin films growth by CBD technique with substrate oscillating agitation |
spellingShingle |
Physical properties of CdS/ITO thin films growth by CBD technique with substrate oscillating agitation Salazar,Y. A. Cadmium sulphide Chemical bath deposition Oscillating agitation |
title_short |
Physical properties of CdS/ITO thin films growth by CBD technique with substrate oscillating agitation |
title_full |
Physical properties of CdS/ITO thin films growth by CBD technique with substrate oscillating agitation |
title_fullStr |
Physical properties of CdS/ITO thin films growth by CBD technique with substrate oscillating agitation |
title_full_unstemmed |
Physical properties of CdS/ITO thin films growth by CBD technique with substrate oscillating agitation |
title_sort |
Physical properties of CdS/ITO thin films growth by CBD technique with substrate oscillating agitation |
author |
Salazar,Y. A. |
author_facet |
Salazar,Y. A. Patiño,R. Peña,J. L. Cauich,W. Oliva,A.I. |
author_role |
author |
author2 |
Patiño,R. Peña,J. L. Cauich,W. Oliva,A.I. |
author2_role |
author author author author |
dc.contributor.author.fl_str_mv |
Salazar,Y. A. Patiño,R. Peña,J. L. Cauich,W. Oliva,A.I. |
dc.subject.por.fl_str_mv |
Cadmium sulphide Chemical bath deposition Oscillating agitation |
topic |
Cadmium sulphide Chemical bath deposition Oscillating agitation |
description |
Cadmium sulphide (CdS) thin films deposited on indium tin oxide (ITO) substrates were prepared by chemical bath deposition technique by using different conditions to agitate the bath and the substrate. For substrate, an oscillating device working at 37 Hz was adapted to support each ITO substrate in order to agitate the substrate during deposition, meanwhile the chemical solution is heated and/not agitated. The deposited films were characterized on their morphology, on the band gap energy, and on thickness. The implemented novel technique for substrate oscillation has shown to improve the films quality, by the chemical bath without colloidal precipitates and by the clean film surfaces obtained. CdS films with variable deposition time can be achieved depending on the agitating technique. The mean band gap energy obtained around 2.41 eV is similar to the typical value reported in the literature for this material. In addition, by oscillating only the substrate during deposition is possible to obtain clean films and avoid the formation of colloidal precipitates on the chemical bath, normally presented when it is magnetically or ultrasonically agitated. |
publishDate |
2006 |
dc.date.none.fl_str_mv |
2006-09-01 |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97332006000600069 |
url |
http://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97332006000600069 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
10.1590/S0103-97332006000600069 |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
text/html |
dc.publisher.none.fl_str_mv |
Sociedade Brasileira de Física |
publisher.none.fl_str_mv |
Sociedade Brasileira de Física |
dc.source.none.fl_str_mv |
Brazilian Journal of Physics v.36 n.3b 2006 reponame:Brazilian Journal of Physics instname:Sociedade Brasileira de Física (SBF) instacron:SBF |
instname_str |
Sociedade Brasileira de Física (SBF) |
instacron_str |
SBF |
institution |
SBF |
reponame_str |
Brazilian Journal of Physics |
collection |
Brazilian Journal of Physics |
repository.name.fl_str_mv |
Brazilian Journal of Physics - Sociedade Brasileira de Física (SBF) |
repository.mail.fl_str_mv |
sbfisica@sbfisica.org.br||sbfisica@sbfisica.org.br |
_version_ |
1754734863391391744 |