Boosting the Photocurrent of the WO3/BiVO4 Heterojunction by Photoelectrodeposition of the Oxy-Hydroxide-Phosphates Based on Co, Fe, or Ni

• Autor(a) principal: Coelho,Dyovani
• Data de Publicação: 2022
• Outros Autores: Gaudêncio,João Pedro R. S., Mascaro,Lucia H.
• Tipo de documento: Artigo
• Idioma: eng
• Título da fonte: Journal of the Brazilian Chemical Society (Online)
• Texto Completo: http://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-50532022000700743
• topic: BiVO4; WO3; oxygen-evolving catalyst; water splitting; oxy-hydroxides metals

Here we investigated the photoelectrodeposition of oxygen-evolving catalysts (OECs) based on oxy-hydroxides-phosphates of Co, Fe, or Ni (CoPi, FePi, and NiPi) on the WO3/BiVO4 heterojunction and their activity in water oxidation. The OECs were deposited by cycles of (i) open-circuit potential (OCP) and (ii) applying a potential positive enough to oxidize the metallic precursor on the WO3/BiVO4. The crystalline and optical properties of the photoanodes were not significantly affected by the OECs deposition. However, there was a remarkable increase in the photocurrent densities (jpc) to water oxidation, where the modification with FePi showed the best result, achieving 2.12 mA cm-2, which corresponds to 2.83 times higher than the heterojunction without the OECs. Furthermore, the OECs deposition changed the morphology of the heterojunction with the deposition of a thin film on its surface. In addition, during the FePi deposition, the BiVO4 layer seems to partially dissolve. Our study shows a facile methodology to boost the activity of photoanodes to the water oxidation by photoelectrodeposition of OECs.