NO Photorelease from a Ruthenium Complex Assisted by Formation of a Supramolecular Dimer

Detalhes bibliográficos
Autor(a) principal: Mateus,Douglas B. G.
Data de Publicação: 2020
Outros Autores: Batista,Ana Paula L., Rodrigues,Renata L., Nikolaou,Sofia
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Journal of the Brazilian Chemical Society (Online)
Texto Completo: http://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-50532020001102319
Resumo: This work presents the NO release from compound [Ru(biq)2(H2O)(NO)](PF6)3 (biq = 2,2’-biquinoline) with visible light irradiation (λirrad = 660 nm), assisted by the low-absorbing photosensitizer [Ru(biq)2Cl2]. The structure of both compounds were characterized by means of ESI-MS (electrospray ionization mass spectrometry). The NO+ stretching, ν(NO) = 1995 cm-1, is atypically shifted to higher energy. This observation, along with the E1/2 = 0.49 V (vs. Ag/AgCl) assigned to the Ru2+/3+ redox pair observed for compound [Ru(biq)2Cl2] and its photoreactivity in solution suggest that the RuII ion, when coordinated to two biquinolines, behaves as a hard Pearson acid. Molecular modelling results confirmed the typical geometry distortion of ruthenium-polypyridine complexes bearing sterically hindered ligands. They also suggest the formation of a supramolecular dimer, assembled by weak interaction between biquinoline ligands from each compound, that is claimed to be responsible for the high efficiency of the NO photorelease bimolecular sensitization.
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spelling NO Photorelease from a Ruthenium Complex Assisted by Formation of a Supramolecular DimerNO photoreleaseruthenium biquinoline complexesbimolecular photosensitizationsupramolecular dimermolecular modellingThis work presents the NO release from compound [Ru(biq)2(H2O)(NO)](PF6)3 (biq = 2,2’-biquinoline) with visible light irradiation (λirrad = 660 nm), assisted by the low-absorbing photosensitizer [Ru(biq)2Cl2]. The structure of both compounds were characterized by means of ESI-MS (electrospray ionization mass spectrometry). The NO+ stretching, ν(NO) = 1995 cm-1, is atypically shifted to higher energy. This observation, along with the E1/2 = 0.49 V (vs. Ag/AgCl) assigned to the Ru2+/3+ redox pair observed for compound [Ru(biq)2Cl2] and its photoreactivity in solution suggest that the RuII ion, when coordinated to two biquinolines, behaves as a hard Pearson acid. Molecular modelling results confirmed the typical geometry distortion of ruthenium-polypyridine complexes bearing sterically hindered ligands. They also suggest the formation of a supramolecular dimer, assembled by weak interaction between biquinoline ligands from each compound, that is claimed to be responsible for the high efficiency of the NO photorelease bimolecular sensitization.Sociedade Brasileira de Química2020-11-01info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersiontext/htmlhttp://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-50532020001102319Journal of the Brazilian Chemical Society v.31 n.11 2020reponame:Journal of the Brazilian Chemical Society (Online)instname:Sociedade Brasileira de Química (SBQ)instacron:SBQ10.21577/0103-5053.20200090info:eu-repo/semantics/openAccessMateus,Douglas B. G.Batista,Ana Paula L.Rodrigues,Renata L.Nikolaou,Sofiaeng2020-10-27T00:00:00Zoai:scielo:S0103-50532020001102319Revistahttp://jbcs.sbq.org.brONGhttps://old.scielo.br/oai/scielo-oai.php||office@jbcs.sbq.org.br1678-47900103-5053opendoar:2020-10-27T00:00Journal of the Brazilian Chemical Society (Online) - Sociedade Brasileira de Química (SBQ)false
dc.title.none.fl_str_mv NO Photorelease from a Ruthenium Complex Assisted by Formation of a Supramolecular Dimer
title NO Photorelease from a Ruthenium Complex Assisted by Formation of a Supramolecular Dimer
spellingShingle NO Photorelease from a Ruthenium Complex Assisted by Formation of a Supramolecular Dimer
Mateus,Douglas B. G.
NO photorelease
ruthenium biquinoline complexes
bimolecular photosensitization
supramolecular dimer
molecular modelling
title_short NO Photorelease from a Ruthenium Complex Assisted by Formation of a Supramolecular Dimer
title_full NO Photorelease from a Ruthenium Complex Assisted by Formation of a Supramolecular Dimer
title_fullStr NO Photorelease from a Ruthenium Complex Assisted by Formation of a Supramolecular Dimer
title_full_unstemmed NO Photorelease from a Ruthenium Complex Assisted by Formation of a Supramolecular Dimer
title_sort NO Photorelease from a Ruthenium Complex Assisted by Formation of a Supramolecular Dimer
author Mateus,Douglas B. G.
author_facet Mateus,Douglas B. G.
Batista,Ana Paula L.
Rodrigues,Renata L.
Nikolaou,Sofia
author_role author
author2 Batista,Ana Paula L.
Rodrigues,Renata L.
Nikolaou,Sofia
author2_role author
author
author
dc.contributor.author.fl_str_mv Mateus,Douglas B. G.
Batista,Ana Paula L.
Rodrigues,Renata L.
Nikolaou,Sofia
dc.subject.por.fl_str_mv NO photorelease
ruthenium biquinoline complexes
bimolecular photosensitization
supramolecular dimer
molecular modelling
topic NO photorelease
ruthenium biquinoline complexes
bimolecular photosensitization
supramolecular dimer
molecular modelling
description This work presents the NO release from compound [Ru(biq)2(H2O)(NO)](PF6)3 (biq = 2,2’-biquinoline) with visible light irradiation (λirrad = 660 nm), assisted by the low-absorbing photosensitizer [Ru(biq)2Cl2]. The structure of both compounds were characterized by means of ESI-MS (electrospray ionization mass spectrometry). The NO+ stretching, ν(NO) = 1995 cm-1, is atypically shifted to higher energy. This observation, along with the E1/2 = 0.49 V (vs. Ag/AgCl) assigned to the Ru2+/3+ redox pair observed for compound [Ru(biq)2Cl2] and its photoreactivity in solution suggest that the RuII ion, when coordinated to two biquinolines, behaves as a hard Pearson acid. Molecular modelling results confirmed the typical geometry distortion of ruthenium-polypyridine complexes bearing sterically hindered ligands. They also suggest the formation of a supramolecular dimer, assembled by weak interaction between biquinoline ligands from each compound, that is claimed to be responsible for the high efficiency of the NO photorelease bimolecular sensitization.
publishDate 2020
dc.date.none.fl_str_mv 2020-11-01
dc.type.driver.fl_str_mv info:eu-repo/semantics/article
dc.type.status.fl_str_mv info:eu-repo/semantics/publishedVersion
format article
status_str publishedVersion
dc.identifier.uri.fl_str_mv http://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-50532020001102319
url http://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-50532020001102319
dc.language.iso.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv 10.21577/0103-5053.20200090
dc.rights.driver.fl_str_mv info:eu-repo/semantics/openAccess
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv text/html
dc.publisher.none.fl_str_mv Sociedade Brasileira de Química
publisher.none.fl_str_mv Sociedade Brasileira de Química
dc.source.none.fl_str_mv Journal of the Brazilian Chemical Society v.31 n.11 2020
reponame:Journal of the Brazilian Chemical Society (Online)
instname:Sociedade Brasileira de Química (SBQ)
instacron:SBQ
instname_str Sociedade Brasileira de Química (SBQ)
instacron_str SBQ
institution SBQ
reponame_str Journal of the Brazilian Chemical Society (Online)
collection Journal of the Brazilian Chemical Society (Online)
repository.name.fl_str_mv Journal of the Brazilian Chemical Society (Online) - Sociedade Brasileira de Química (SBQ)
repository.mail.fl_str_mv ||office@jbcs.sbq.org.br
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