Electrochemical Deposition of the Single Phase Tlx Cu3 - x Se2 Thin Films

• Autor(a) principal: Lucas,Francisco W. S.
• Data de Publicação: 2018
• Outros Autores: Mascaro,Lucia H.
• Tipo de documento: Artigo
• Idioma: eng
• Título da fonte: Journal of the Brazilian Chemical Society (Online)
• Texto Completo: http://old.scielo.br/scielo.php?script=sci_arttext&pid=S0103-50532018001202449
• topic: Cu2 TlSe2; thallium copper selenide; electrodeposition; texturization; chalcogenide

In spite of selenide semiconductors having a wide application area, TlCu2 Se2 (TCSe) is poorly studied and its synthesis by non-vacuum or thermic methodology in film form is non-existent. Generally, the main problems of applying these TCSe compounds are related to complicated single phase growth, and the great time consuming and non-scalable fabrication method. In this work, the facile, fast, scalable and new electrochemical deposition of this material was proposed as a workaround for these main problems and obtaining single phase thin film. Thus, the electrodeposited Tlx Cu3 - x Se2 films were characterized by scanning electron microscopy, X-ray diffraction (with Rietveld refinement) and energy dispersive X-ray spectroscopy. They showed interesting variation of composition (x =1.1, 1.2, and 1.25) and morphology as function of the electrodeposition potential, electrolytic bath temperature and thermal treatment.