Filme fino de ZrO2 enxertado sobre a superfície de sílica gel: preparação e propriedade de adsorção de Cr(VI)

• Autor(a) principal: Lazarin,Angélica M.
• Data de Publicação: 2002
• Outros Autores: Borgo,Claudemir A., Gushikem,Yoshitaka
• Tipo de documento: Artigo
• Idioma: por
• Título da fonte: Química Nova (Online)
• Texto Completo: http://old.scielo.br/scielo.php?script=sci_arttext&pid=S0100-40422002000300025
• topic: silica gel; zirconium(IV) oxide; chromium(VI)

The present experiment describes an easy procedure for obtaining SiO2/ZrO2 by reacting ZrOCl2 with SiO2 with the following characteristics: S BET = 500 m² g-1 and an average pore diameter of 6 nm. The material obtained presented 1.3 wt% ZrO2 content corresponding to 140 mumol g-1. The average density of ZrO2 onto SiO2/ZrO2 matrix is 2.8x10-11 mol cm-2. The adsorption isotherm for Cr(VI) showed a maximum of adsorption value (200 mumol g-1) at pH 2. The adsorption can be described by the reaction: =Zr(OH)2 + 2HCrO4- + 2H+ <IMG SRC="http:/img/fbpe/qn/v25n3/9346fr1.gif">[(=Zr(OH2+)2) (HCrO4-)2]. Above the zero point of charge, i.e. pH > 5.5 due to the surface charge inversion, desorption of Cr(VI) occurs according to the reaction: [(=Zr(OH2+)2) (HCrO4-)2] + 6OH- <IMG SRC="http:/img/fbpe/qn/v25n3/9346fr1.gif">(=ZrO2)2- + 6H2O + 2CrO4(2-).