Use of thin films obtained by plasma polymerization for grain protection and germination enhancement

• Autor(a) principal: Carvalho,Rodrigo A. M.
• Data de Publicação: 2005
• Outros Autores: Carvalho,Alexsander T., Silva,Maria Lúcia P. da, Demarquette,Nicole R., Assis,Odílio B. G.
• Tipo de documento: Artigo
• Idioma: eng
• Título da fonte: Química Nova (Online)
• Texto Completo: http://old.scielo.br/scielo.php?script=sci_arttext&pid=S0100-40422005000600014
• topic: germination enhancement; plasma polymerization; TEOS

In this work, preliminary results of the use of hydrophobic thin films obtained by plasma deposition to protect grains and seeds are presented: grains coated by the films did not present biological degradation when stored in a saturated water vapor environment, but had their germination accelerated in the presence of water. A model that explains the difference of behavior of the films when exposed to water in vapor form or in liquid form, based on the formation of microchannels within the film that lead to water uptake in seeds, is presented. The model was successfully tested using quartz crystal measurements, which showed that the microchannels within the films can favor the adsorption and permeation of water when the films are immersed in water.