Hardness evaluation, stoichiometry and grain size of titanium nitride obtained with plasma nitriding on Ti-6AI-4V samples

Detalhes bibliográficos
Autor(a) principal: Vasconcellos, Marcos Antonio Zen
Data de Publicação: 2010
Outros Autores: Lima, Saulo Cordeiro, Hinrichs, Ruth
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Institucional da UFRGS
Texto Completo: http://hdl.handle.net/10183/29434
Resumo: Titanium nitride films were formed on the surface of Ti-6Al-4V discs by plasma nitriding (glow discharge) in different N2:H2 atmospheres at several substrate temperatures. In this study the influence of the process parameters on dynamic micro-hardness were investigated. Grain sizes of the nitride films, determined with X-Ray Diffraction, were related to the nitriding parameters. TiNx stoichiometry was determined with Nuclear Reaction Analysis and showed a correlation to substrate temperature during the nitriding process. Micro-hardness measurements were taken on the nitrided surfaces. Grain sizes increased for a particular gas composition of 60%N2+40%H2 where hardness was lowest.
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spelling Vasconcellos, Marcos Antonio ZenLima, Saulo CordeiroHinrichs, Ruth2011-06-08T06:00:10Z20101517-7076http://hdl.handle.net/10183/29434000761324Titanium nitride films were formed on the surface of Ti-6Al-4V discs by plasma nitriding (glow discharge) in different N2:H2 atmospheres at several substrate temperatures. In this study the influence of the process parameters on dynamic micro-hardness were investigated. Grain sizes of the nitride films, determined with X-Ray Diffraction, were related to the nitriding parameters. TiNx stoichiometry was determined with Nuclear Reaction Analysis and showed a correlation to substrate temperature during the nitriding process. Micro-hardness measurements were taken on the nitrided surfaces. Grain sizes increased for a particular gas composition of 60%N2+40%H2 where hardness was lowest.application/pdfengRevista Matéria. Rio de Janeiro: Coppe/UFRJ, 2010. Vol. 15, n. 2 (jun. 2010), p. 299-302Ciência dos materiaisTitânioDifração de raios XGlow dischargeNitrideHardnessHardness evaluation, stoichiometry and grain size of titanium nitride obtained with plasma nitriding on Ti-6AI-4V samplesinfo:eu-repo/semantics/articleinfo:eu-repo/semantics/otherinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/openAccessreponame:Repositório Institucional da UFRGSinstname:Universidade Federal do Rio Grande do Sul (UFRGS)instacron:UFRGSTEXT000761324.pdf.txt000761324.pdf.txtExtracted Texttext/plain9460http://www.lume.ufrgs.br/bitstream/10183/29434/2/000761324.pdf.txtaa6b26cace0411f33a9a4c18676a4006MD52ORIGINAL000761324.pdf000761324.pdfTexto completo (inglês)application/pdf149333http://www.lume.ufrgs.br/bitstream/10183/29434/1/000761324.pdff78e037a7be1f49b0c9ff8b673cb5091MD51THUMBNAIL000761324.pdf.jpg000761324.pdf.jpgGenerated Thumbnailimage/jpeg2028http://www.lume.ufrgs.br/bitstream/10183/29434/3/000761324.pdf.jpgd8400177fd075b71600596e85cb58ce1MD5310183/294342021-07-09 04:37:34.689282oai:www.lume.ufrgs.br:10183/29434Repositório de PublicaçõesPUBhttps://lume.ufrgs.br/oai/requestopendoar:2021-07-09T07:37:34Repositório Institucional da UFRGS - Universidade Federal do Rio Grande do Sul (UFRGS)false
dc.title.pt_BR.fl_str_mv Hardness evaluation, stoichiometry and grain size of titanium nitride obtained with plasma nitriding on Ti-6AI-4V samples
title Hardness evaluation, stoichiometry and grain size of titanium nitride obtained with plasma nitriding on Ti-6AI-4V samples
spellingShingle Hardness evaluation, stoichiometry and grain size of titanium nitride obtained with plasma nitriding on Ti-6AI-4V samples
Vasconcellos, Marcos Antonio Zen
Ciência dos materiais
Titânio
Difração de raios X
Glow discharge
Nitride
Hardness
title_short Hardness evaluation, stoichiometry and grain size of titanium nitride obtained with plasma nitriding on Ti-6AI-4V samples
title_full Hardness evaluation, stoichiometry and grain size of titanium nitride obtained with plasma nitriding on Ti-6AI-4V samples
title_fullStr Hardness evaluation, stoichiometry and grain size of titanium nitride obtained with plasma nitriding on Ti-6AI-4V samples
title_full_unstemmed Hardness evaluation, stoichiometry and grain size of titanium nitride obtained with plasma nitriding on Ti-6AI-4V samples
title_sort Hardness evaluation, stoichiometry and grain size of titanium nitride obtained with plasma nitriding on Ti-6AI-4V samples
author Vasconcellos, Marcos Antonio Zen
author_facet Vasconcellos, Marcos Antonio Zen
Lima, Saulo Cordeiro
Hinrichs, Ruth
author_role author
author2 Lima, Saulo Cordeiro
Hinrichs, Ruth
author2_role author
author
dc.contributor.author.fl_str_mv Vasconcellos, Marcos Antonio Zen
Lima, Saulo Cordeiro
Hinrichs, Ruth
dc.subject.por.fl_str_mv Ciência dos materiais
Titânio
Difração de raios X
topic Ciência dos materiais
Titânio
Difração de raios X
Glow discharge
Nitride
Hardness
dc.subject.eng.fl_str_mv Glow discharge
Nitride
Hardness
description Titanium nitride films were formed on the surface of Ti-6Al-4V discs by plasma nitriding (glow discharge) in different N2:H2 atmospheres at several substrate temperatures. In this study the influence of the process parameters on dynamic micro-hardness were investigated. Grain sizes of the nitride films, determined with X-Ray Diffraction, were related to the nitriding parameters. TiNx stoichiometry was determined with Nuclear Reaction Analysis and showed a correlation to substrate temperature during the nitriding process. Micro-hardness measurements were taken on the nitrided surfaces. Grain sizes increased for a particular gas composition of 60%N2+40%H2 where hardness was lowest.
publishDate 2010
dc.date.issued.fl_str_mv 2010
dc.date.accessioned.fl_str_mv 2011-06-08T06:00:10Z
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dc.identifier.uri.fl_str_mv http://hdl.handle.net/10183/29434
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dc.relation.ispartof.pt_BR.fl_str_mv Revista Matéria. Rio de Janeiro: Coppe/UFRJ, 2010. Vol. 15, n. 2 (jun. 2010), p. 299-302
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