Electron irradiation effects on the nucleation and growth of Au nanoparticles in silicon nitride membranes

Detalhes bibliográficos
Autor(a) principal: Timm, Mariana de Mello
Data de Publicação: 2017
Outros Autores: Fabrim, Zacarias Eduardo, Marin, Cristiane, Baptista, Daniel Lorscheitter, Fichtner, Paulo Fernando Papaleo
Tipo de documento: Artigo
Idioma: eng
Título da fonte: Repositório Institucional da UFRGS
Texto Completo: http://hdl.handle.net/10183/184304
Resumo: The formation of Au nanoparticles (NPs) in Auþ ion-implanted silicon nitride thin films and membranes was investigated as a function of post-implantation thermal treatments or room temperature electron irradiation at energies of 80, 120, 160, and 200 keV. The samples were characterized by Rutherford Backscattering Spectrometry and Transmission Electron Microscopy. High-temperature thermal annealing (1100 C, 1 h) resulted in the formation of Au particles with a mean diameter of 1.3 nm. In comparison, room-temperature electron irradiation at energies from 80 to 200 keV caused the formation of larger Au particles according to two growth regimes. The first regime is characterized by a slow growth rate and occurs inside the silicon nitride membrane. The second regime presents a fast growth rate and starts when Au atoms become exposed to the back free surface of the membrane. Realistic binary electron-atom elastic collision cross-sections were used to analyze the observed nanoparticle growth and membrane sputtering phenomena. The results obtained demonstrate that binary electron-atom elastic collisions can account for the microstructure modifications if the critical displacement energies for the sputtering of N and Si atoms are around 1463 eV, and the displacement energy for surface located Au atoms is approximately 1.2560.2 eV. Irradiation experiments using focused electron probes demonstrate that the process provides fine control of nanoparticle formation, resulting in well-defined sizes and locations. Published by AIP Publishing.
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spelling Timm, Mariana de MelloFabrim, Zacarias EduardoMarin, CristianeBaptista, Daniel LorscheitterFichtner, Paulo Fernando Papaleo2018-11-01T02:49:49Z20170021-8979http://hdl.handle.net/10183/184304001072426The formation of Au nanoparticles (NPs) in Auþ ion-implanted silicon nitride thin films and membranes was investigated as a function of post-implantation thermal treatments or room temperature electron irradiation at energies of 80, 120, 160, and 200 keV. The samples were characterized by Rutherford Backscattering Spectrometry and Transmission Electron Microscopy. High-temperature thermal annealing (1100 C, 1 h) resulted in the formation of Au particles with a mean diameter of 1.3 nm. In comparison, room-temperature electron irradiation at energies from 80 to 200 keV caused the formation of larger Au particles according to two growth regimes. The first regime is characterized by a slow growth rate and occurs inside the silicon nitride membrane. The second regime presents a fast growth rate and starts when Au atoms become exposed to the back free surface of the membrane. Realistic binary electron-atom elastic collision cross-sections were used to analyze the observed nanoparticle growth and membrane sputtering phenomena. The results obtained demonstrate that binary electron-atom elastic collisions can account for the microstructure modifications if the critical displacement energies for the sputtering of N and Si atoms are around 1463 eV, and the displacement energy for surface located Au atoms is approximately 1.2560.2 eV. Irradiation experiments using focused electron probes demonstrate that the process provides fine control of nanoparticle formation, resulting in well-defined sizes and locations. Published by AIP Publishing.application/pdfengJournal of applied physics. New York. Vol. 122, no. 16 (Oct. 2017), 165301, 9 p.Nanopartículas de ouroImplantacao ionicaTratamento térmicoEspectrometria de retroespalhamento rutherfordMicroscopia eletrônica de transmissãoElectron irradiation effects on the nucleation and growth of Au nanoparticles in silicon nitride membranesEstrangeiroinfo:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/openAccessreponame:Repositório Institucional da UFRGSinstname:Universidade Federal do Rio Grande do Sul (UFRGS)instacron:UFRGSTEXT001072426.pdf.txt001072426.pdf.txtExtracted Texttext/plain42856http://www.lume.ufrgs.br/bitstream/10183/184304/2/001072426.pdf.txta6bfea0d7f215bab44c5d53ef6264bbcMD52ORIGINAL001072426.pdfTexto completo (inglês)application/pdf4153354http://www.lume.ufrgs.br/bitstream/10183/184304/1/001072426.pdf96fcf125c39650d55bb42e3a0a2f5d4aMD5110183/1843042023-07-29 03:36:45.432888oai:www.lume.ufrgs.br:10183/184304Repositório de PublicaçõesPUBhttps://lume.ufrgs.br/oai/requestopendoar:2023-07-29T06:36:45Repositório Institucional da UFRGS - Universidade Federal do Rio Grande do Sul (UFRGS)false
dc.title.pt_BR.fl_str_mv Electron irradiation effects on the nucleation and growth of Au nanoparticles in silicon nitride membranes
title Electron irradiation effects on the nucleation and growth of Au nanoparticles in silicon nitride membranes
spellingShingle Electron irradiation effects on the nucleation and growth of Au nanoparticles in silicon nitride membranes
Timm, Mariana de Mello
Nanopartículas de ouro
Implantacao ionica
Tratamento térmico
Espectrometria de retroespalhamento rutherford
Microscopia eletrônica de transmissão
title_short Electron irradiation effects on the nucleation and growth of Au nanoparticles in silicon nitride membranes
title_full Electron irradiation effects on the nucleation and growth of Au nanoparticles in silicon nitride membranes
title_fullStr Electron irradiation effects on the nucleation and growth of Au nanoparticles in silicon nitride membranes
title_full_unstemmed Electron irradiation effects on the nucleation and growth of Au nanoparticles in silicon nitride membranes
title_sort Electron irradiation effects on the nucleation and growth of Au nanoparticles in silicon nitride membranes
author Timm, Mariana de Mello
author_facet Timm, Mariana de Mello
Fabrim, Zacarias Eduardo
Marin, Cristiane
Baptista, Daniel Lorscheitter
Fichtner, Paulo Fernando Papaleo
author_role author
author2 Fabrim, Zacarias Eduardo
Marin, Cristiane
Baptista, Daniel Lorscheitter
Fichtner, Paulo Fernando Papaleo
author2_role author
author
author
author
dc.contributor.author.fl_str_mv Timm, Mariana de Mello
Fabrim, Zacarias Eduardo
Marin, Cristiane
Baptista, Daniel Lorscheitter
Fichtner, Paulo Fernando Papaleo
dc.subject.por.fl_str_mv Nanopartículas de ouro
Implantacao ionica
Tratamento térmico
Espectrometria de retroespalhamento rutherford
Microscopia eletrônica de transmissão
topic Nanopartículas de ouro
Implantacao ionica
Tratamento térmico
Espectrometria de retroespalhamento rutherford
Microscopia eletrônica de transmissão
description The formation of Au nanoparticles (NPs) in Auþ ion-implanted silicon nitride thin films and membranes was investigated as a function of post-implantation thermal treatments or room temperature electron irradiation at energies of 80, 120, 160, and 200 keV. The samples were characterized by Rutherford Backscattering Spectrometry and Transmission Electron Microscopy. High-temperature thermal annealing (1100 C, 1 h) resulted in the formation of Au particles with a mean diameter of 1.3 nm. In comparison, room-temperature electron irradiation at energies from 80 to 200 keV caused the formation of larger Au particles according to two growth regimes. The first regime is characterized by a slow growth rate and occurs inside the silicon nitride membrane. The second regime presents a fast growth rate and starts when Au atoms become exposed to the back free surface of the membrane. Realistic binary electron-atom elastic collision cross-sections were used to analyze the observed nanoparticle growth and membrane sputtering phenomena. The results obtained demonstrate that binary electron-atom elastic collisions can account for the microstructure modifications if the critical displacement energies for the sputtering of N and Si atoms are around 1463 eV, and the displacement energy for surface located Au atoms is approximately 1.2560.2 eV. Irradiation experiments using focused electron probes demonstrate that the process provides fine control of nanoparticle formation, resulting in well-defined sizes and locations. Published by AIP Publishing.
publishDate 2017
dc.date.issued.fl_str_mv 2017
dc.date.accessioned.fl_str_mv 2018-11-01T02:49:49Z
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dc.relation.ispartof.pt_BR.fl_str_mv Journal of applied physics. New York. Vol. 122, no. 16 (Oct. 2017), 165301, 9 p.
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