Strain-inducing photochemical chlorination of graphene nanoribbons on SiC (0001)
Autor(a) principal: | |
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Data de Publicação: | 2021 |
Outros Autores: | , , , , , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Institucional da UFRGS |
Texto Completo: | http://hdl.handle.net/10183/219698 |
Resumo: | As different low-dimensional materials are sought to be incorporated into microelectronic devices, graphene integration is dependent on the development of band gap opening strategies. Amidst the different methods currently investigated, application of strain and use of electronic quantum confinement have shown promising results. In the present work, epitaxial graphene nanoribbons (GNR), formed by surface graphitization of SiC (0001) on crystalline step edges, were submitted to photochemical chlorination. The incorporation of Cl into the buffer layer underlying graphene increased the compressive uniaxial strain in the ribbons. Such method is a promising tool for tuning the band gap of GNRs. |
id |
UFRGS-2_97f0e1442bf6d42f98b33cc6dc0389cb |
---|---|
oai_identifier_str |
oai:www.lume.ufrgs.br:10183/219698 |
network_acronym_str |
UFRGS-2 |
network_name_str |
Repositório Institucional da UFRGS |
repository_id_str |
|
spelling |
Copetti, GabrielaNunes, Eduardo HorbachFeijó, Tais OrestesGalves, Lauren AranhaHeilmann, MartinSoares, Gabriel VieiraLopes, J. M. J.Radtke, Claudio2021-04-09T04:24:48Z20210957-4484http://hdl.handle.net/10183/219698001124020As different low-dimensional materials are sought to be incorporated into microelectronic devices, graphene integration is dependent on the development of band gap opening strategies. Amidst the different methods currently investigated, application of strain and use of electronic quantum confinement have shown promising results. In the present work, epitaxial graphene nanoribbons (GNR), formed by surface graphitization of SiC (0001) on crystalline step edges, were submitted to photochemical chlorination. The incorporation of Cl into the buffer layer underlying graphene increased the compressive uniaxial strain in the ribbons. Such method is a promising tool for tuning the band gap of GNRs.application/pdfengNanotechnology. Bristol. Vol. 32, no. 14 (Apr. 2021), 145707, 6 p.GrafenoCloração fotoquímicaNanofitasGrapheneNanoribbonsSiCStrainChlorineXPSRamanStrain-inducing photochemical chlorination of graphene nanoribbons on SiC (0001)Estrangeiroinfo:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/openAccessreponame:Repositório Institucional da UFRGSinstname:Universidade Federal do Rio Grande do Sul (UFRGS)instacron:UFRGSTEXT001124020.pdf.txt001124020.pdf.txtExtracted Texttext/plain24124http://www.lume.ufrgs.br/bitstream/10183/219698/2/001124020.pdf.txt270ca4f27fbee33e2114c3ee093a51c9MD52ORIGINAL001124020.pdfTexto completo (inglês)application/pdf1366693http://www.lume.ufrgs.br/bitstream/10183/219698/1/001124020.pdf3256dfac99067cd5dbb938007e2e3e0aMD5110183/2196982021-05-07 04:52:15.134957oai:www.lume.ufrgs.br:10183/219698Repositório de PublicaçõesPUBhttps://lume.ufrgs.br/oai/requestopendoar:2021-05-07T07:52:15Repositório Institucional da UFRGS - Universidade Federal do Rio Grande do Sul (UFRGS)false |
dc.title.pt_BR.fl_str_mv |
Strain-inducing photochemical chlorination of graphene nanoribbons on SiC (0001) |
title |
Strain-inducing photochemical chlorination of graphene nanoribbons on SiC (0001) |
spellingShingle |
Strain-inducing photochemical chlorination of graphene nanoribbons on SiC (0001) Copetti, Gabriela Grafeno Cloração fotoquímica Nanofitas Graphene Nanoribbons SiC Strain Chlorine XPS Raman |
title_short |
Strain-inducing photochemical chlorination of graphene nanoribbons on SiC (0001) |
title_full |
Strain-inducing photochemical chlorination of graphene nanoribbons on SiC (0001) |
title_fullStr |
Strain-inducing photochemical chlorination of graphene nanoribbons on SiC (0001) |
title_full_unstemmed |
Strain-inducing photochemical chlorination of graphene nanoribbons on SiC (0001) |
title_sort |
Strain-inducing photochemical chlorination of graphene nanoribbons on SiC (0001) |
author |
Copetti, Gabriela |
author_facet |
Copetti, Gabriela Nunes, Eduardo Horbach Feijó, Tais Orestes Galves, Lauren Aranha Heilmann, Martin Soares, Gabriel Vieira Lopes, J. M. J. Radtke, Claudio |
author_role |
author |
author2 |
Nunes, Eduardo Horbach Feijó, Tais Orestes Galves, Lauren Aranha Heilmann, Martin Soares, Gabriel Vieira Lopes, J. M. J. Radtke, Claudio |
author2_role |
author author author author author author author |
dc.contributor.author.fl_str_mv |
Copetti, Gabriela Nunes, Eduardo Horbach Feijó, Tais Orestes Galves, Lauren Aranha Heilmann, Martin Soares, Gabriel Vieira Lopes, J. M. J. Radtke, Claudio |
dc.subject.por.fl_str_mv |
Grafeno Cloração fotoquímica Nanofitas |
topic |
Grafeno Cloração fotoquímica Nanofitas Graphene Nanoribbons SiC Strain Chlorine XPS Raman |
dc.subject.eng.fl_str_mv |
Graphene Nanoribbons SiC Strain Chlorine XPS Raman |
description |
As different low-dimensional materials are sought to be incorporated into microelectronic devices, graphene integration is dependent on the development of band gap opening strategies. Amidst the different methods currently investigated, application of strain and use of electronic quantum confinement have shown promising results. In the present work, epitaxial graphene nanoribbons (GNR), formed by surface graphitization of SiC (0001) on crystalline step edges, were submitted to photochemical chlorination. The incorporation of Cl into the buffer layer underlying graphene increased the compressive uniaxial strain in the ribbons. Such method is a promising tool for tuning the band gap of GNRs. |
publishDate |
2021 |
dc.date.accessioned.fl_str_mv |
2021-04-09T04:24:48Z |
dc.date.issued.fl_str_mv |
2021 |
dc.type.driver.fl_str_mv |
Estrangeiro info:eu-repo/semantics/article |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://hdl.handle.net/10183/219698 |
dc.identifier.issn.pt_BR.fl_str_mv |
0957-4484 |
dc.identifier.nrb.pt_BR.fl_str_mv |
001124020 |
identifier_str_mv |
0957-4484 001124020 |
url |
http://hdl.handle.net/10183/219698 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.ispartof.pt_BR.fl_str_mv |
Nanotechnology. Bristol. Vol. 32, no. 14 (Apr. 2021), 145707, 6 p. |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
application/pdf |
dc.source.none.fl_str_mv |
reponame:Repositório Institucional da UFRGS instname:Universidade Federal do Rio Grande do Sul (UFRGS) instacron:UFRGS |
instname_str |
Universidade Federal do Rio Grande do Sul (UFRGS) |
instacron_str |
UFRGS |
institution |
UFRGS |
reponame_str |
Repositório Institucional da UFRGS |
collection |
Repositório Institucional da UFRGS |
bitstream.url.fl_str_mv |
http://www.lume.ufrgs.br/bitstream/10183/219698/2/001124020.pdf.txt http://www.lume.ufrgs.br/bitstream/10183/219698/1/001124020.pdf |
bitstream.checksum.fl_str_mv |
270ca4f27fbee33e2114c3ee093a51c9 3256dfac99067cd5dbb938007e2e3e0a |
bitstream.checksumAlgorithm.fl_str_mv |
MD5 MD5 |
repository.name.fl_str_mv |
Repositório Institucional da UFRGS - Universidade Federal do Rio Grande do Sul (UFRGS) |
repository.mail.fl_str_mv |
|
_version_ |
1801225013144059904 |