A Study about Schottky Barrier Height and Ideality Factor in Thin Film Transistors with Metal/Zinc Oxide Nanoparticles Structures Aiming Flexible Electronics Application
Autor(a) principal: | |
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Data de Publicação: | 2021 |
Outros Autores: | , , , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Institucional da UFRGS |
Texto Completo: | http://hdl.handle.net/10183/230912 |
Resumo: | Zinc oxide nanoparticles (ZnO NP) used for the channel region in inverted coplanar setup in Thin Film Transistors (TFT) were the focus of this study. The regions between the source electrode and the ZnO NP and the drain electrode were under investigation as they produce a Schottky barrier in metal-semiconductor interfaces. A more general Thermionic emission theory must be evaluated: one that considers both metal/semiconductor interfaces (MSM structures). Aluminum, gold, and nickel were used as metallization layers for source and drain electrodes. An organic-inorganic nanocomposite was used as a gate dielectric. The TFTs transfer and output characteristics curves were extracted, and a numerical computational program was used for fitting the data; hence information about Schottky Barrier Height (SBH) and ideality factors for each TFT could be estimated. The nickel metallization appears with the lowest SBH among the metals investigated. For this metal and for higher drain-to-source voltages, the SBH tended to converge to some value around 0.3 eV. The developed fitting method showed good fitting accuracy even when the metallization produced different SBH in each metal-semiconductor interface, as was the case for gold metallization. The Schottky effect is also present and was studied when the drain-to-source voltages and/or the gate voltage were increased. |
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Kaufmann, Ivan RodrigoZerey, OnurMeyers, ThorstenReker, JuliaVidor, Fábio FedrizziHilleringmann, Ulrich2021-10-19T04:23:32Z20212079-4991http://hdl.handle.net/10183/230912001131909Zinc oxide nanoparticles (ZnO NP) used for the channel region in inverted coplanar setup in Thin Film Transistors (TFT) were the focus of this study. The regions between the source electrode and the ZnO NP and the drain electrode were under investigation as they produce a Schottky barrier in metal-semiconductor interfaces. A more general Thermionic emission theory must be evaluated: one that considers both metal/semiconductor interfaces (MSM structures). Aluminum, gold, and nickel were used as metallization layers for source and drain electrodes. An organic-inorganic nanocomposite was used as a gate dielectric. The TFTs transfer and output characteristics curves were extracted, and a numerical computational program was used for fitting the data; hence information about Schottky Barrier Height (SBH) and ideality factors for each TFT could be estimated. The nickel metallization appears with the lowest SBH among the metals investigated. For this metal and for higher drain-to-source voltages, the SBH tended to converge to some value around 0.3 eV. The developed fitting method showed good fitting accuracy even when the metallization produced different SBH in each metal-semiconductor interface, as was the case for gold metallization. The Schottky effect is also present and was studied when the drain-to-source voltages and/or the gate voltage were increased.application/pdfengNanomaterials [recurso eletrônico]. Basel, Switzerland : MDPI, 2021. Vol. 11, n. 5 (2021), e1188, 11 p.Transistores de filmes finosEletrônica flexívelNanopartículas de óxido de zincoThin film transistorsFlexible electronicsZinc oxide nanoparticlesMetal-semiconductor metalA Study about Schottky Barrier Height and Ideality Factor in Thin Film Transistors with Metal/Zinc Oxide Nanoparticles Structures Aiming Flexible Electronics ApplicationEstrangeiroinfo:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/openAccessreponame:Repositório Institucional da UFRGSinstname:Universidade Federal do Rio Grande do Sul (UFRGS)instacron:UFRGSTEXT001131909.pdf.txt001131909.pdf.txtExtracted Texttext/plain41700http://www.lume.ufrgs.br/bitstream/10183/230912/2/001131909.pdf.txta0b74f05d835cf5d9eb197169dda242cMD52ORIGINAL001131909.pdfTexto completo (inglês)application/pdf1179672http://www.lume.ufrgs.br/bitstream/10183/230912/1/001131909.pdff0829309286d5eb753e5c236bdf53ae5MD5110183/2309122021-11-20 06:18:25.173397oai:www.lume.ufrgs.br:10183/230912Repositório de PublicaçõesPUBhttps://lume.ufrgs.br/oai/requestopendoar:2021-11-20T08:18:25Repositório Institucional da UFRGS - Universidade Federal do Rio Grande do Sul (UFRGS)false |
dc.title.pt_BR.fl_str_mv |
A Study about Schottky Barrier Height and Ideality Factor in Thin Film Transistors with Metal/Zinc Oxide Nanoparticles Structures Aiming Flexible Electronics Application |
title |
A Study about Schottky Barrier Height and Ideality Factor in Thin Film Transistors with Metal/Zinc Oxide Nanoparticles Structures Aiming Flexible Electronics Application |
spellingShingle |
A Study about Schottky Barrier Height and Ideality Factor in Thin Film Transistors with Metal/Zinc Oxide Nanoparticles Structures Aiming Flexible Electronics Application Kaufmann, Ivan Rodrigo Transistores de filmes finos Eletrônica flexível Nanopartículas de óxido de zinco Thin film transistors Flexible electronics Zinc oxide nanoparticles Metal-semiconductor metal |
title_short |
A Study about Schottky Barrier Height and Ideality Factor in Thin Film Transistors with Metal/Zinc Oxide Nanoparticles Structures Aiming Flexible Electronics Application |
title_full |
A Study about Schottky Barrier Height and Ideality Factor in Thin Film Transistors with Metal/Zinc Oxide Nanoparticles Structures Aiming Flexible Electronics Application |
title_fullStr |
A Study about Schottky Barrier Height and Ideality Factor in Thin Film Transistors with Metal/Zinc Oxide Nanoparticles Structures Aiming Flexible Electronics Application |
title_full_unstemmed |
A Study about Schottky Barrier Height and Ideality Factor in Thin Film Transistors with Metal/Zinc Oxide Nanoparticles Structures Aiming Flexible Electronics Application |
title_sort |
A Study about Schottky Barrier Height and Ideality Factor in Thin Film Transistors with Metal/Zinc Oxide Nanoparticles Structures Aiming Flexible Electronics Application |
author |
Kaufmann, Ivan Rodrigo |
author_facet |
Kaufmann, Ivan Rodrigo Zerey, Onur Meyers, Thorsten Reker, Julia Vidor, Fábio Fedrizzi Hilleringmann, Ulrich |
author_role |
author |
author2 |
Zerey, Onur Meyers, Thorsten Reker, Julia Vidor, Fábio Fedrizzi Hilleringmann, Ulrich |
author2_role |
author author author author author |
dc.contributor.author.fl_str_mv |
Kaufmann, Ivan Rodrigo Zerey, Onur Meyers, Thorsten Reker, Julia Vidor, Fábio Fedrizzi Hilleringmann, Ulrich |
dc.subject.por.fl_str_mv |
Transistores de filmes finos Eletrônica flexível Nanopartículas de óxido de zinco |
topic |
Transistores de filmes finos Eletrônica flexível Nanopartículas de óxido de zinco Thin film transistors Flexible electronics Zinc oxide nanoparticles Metal-semiconductor metal |
dc.subject.eng.fl_str_mv |
Thin film transistors Flexible electronics Zinc oxide nanoparticles Metal-semiconductor metal |
description |
Zinc oxide nanoparticles (ZnO NP) used for the channel region in inverted coplanar setup in Thin Film Transistors (TFT) were the focus of this study. The regions between the source electrode and the ZnO NP and the drain electrode were under investigation as they produce a Schottky barrier in metal-semiconductor interfaces. A more general Thermionic emission theory must be evaluated: one that considers both metal/semiconductor interfaces (MSM structures). Aluminum, gold, and nickel were used as metallization layers for source and drain electrodes. An organic-inorganic nanocomposite was used as a gate dielectric. The TFTs transfer and output characteristics curves were extracted, and a numerical computational program was used for fitting the data; hence information about Schottky Barrier Height (SBH) and ideality factors for each TFT could be estimated. The nickel metallization appears with the lowest SBH among the metals investigated. For this metal and for higher drain-to-source voltages, the SBH tended to converge to some value around 0.3 eV. The developed fitting method showed good fitting accuracy even when the metallization produced different SBH in each metal-semiconductor interface, as was the case for gold metallization. The Schottky effect is also present and was studied when the drain-to-source voltages and/or the gate voltage were increased. |
publishDate |
2021 |
dc.date.accessioned.fl_str_mv |
2021-10-19T04:23:32Z |
dc.date.issued.fl_str_mv |
2021 |
dc.type.driver.fl_str_mv |
Estrangeiro info:eu-repo/semantics/article |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
format |
article |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
http://hdl.handle.net/10183/230912 |
dc.identifier.issn.pt_BR.fl_str_mv |
2079-4991 |
dc.identifier.nrb.pt_BR.fl_str_mv |
001131909 |
identifier_str_mv |
2079-4991 001131909 |
url |
http://hdl.handle.net/10183/230912 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.ispartof.pt_BR.fl_str_mv |
Nanomaterials [recurso eletrônico]. Basel, Switzerland : MDPI, 2021. Vol. 11, n. 5 (2021), e1188, 11 p. |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
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application/pdf |
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Repositório Institucional da UFRGS |
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