Surface modification of Ti implants by plasma oxidation in hollow cathode discharge

• Autor(a) principal: Silva, M. A. M.
• Data de Publicação: 2006
• Outros Autores: Martinelli, Antonio Eduardo, Alves Júnior, Clodomiro, Nascimento, Rubens Maribondo do, Távora, Michele Portela, Vilar, Carlos da Silva
• Tipo de documento: Artigo
• Idioma: eng
• Título da fonte: Repositório Institucional da UFRN
• DOI: 10.1016/j.surfcoat.2004.12.027
• Texto Completo: https://repositorio.ufrn.br/handle/123456789/31299
• topic: Plasma; Surface modification; Titanium; Titanium oxide; Roughness

As a result of superior biocompatibility and mechanical adequacy, titanium has been widely used in the manufacture of dental implants. On the downside, relatively long periods are normally required to fully integration of the bone into the implant. Surface modification techniques have the potential to shorten the osseointegration time of implants significantly contributing to patient comfort. In this work, plasma discharge in oxidizing atmospheres was used to modify the surface of Ti implants by the production of rough surfaces that consists of a mixture of Ti-oxides. The results showed that considerable improvement on surface roughness and mechanical stability of the oxidized layers could be achieved by confining the effect of the plasma discharge by shielding the cathodic region of the reactor. Processing parameters including temperature, time and pressure were optimized and applied to commercially available Ti implants. Improved wetting was obtained, which is potentially associated to shorter osseointegration periods