Synthesis of Al-Doped ZnO films assisted with hollow-cathode glow discharge and their characterization
Autor(a) principal: | |
---|---|
Data de Publicação: | 2021 |
Outros Autores: | , , , , , , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Institucional da UFRN |
Texto Completo: | https://repositorio.ufrn.br/handle/123456789/45394 |
Resumo: | Transparent conductive oxides, such as aluminum-doped zinc oxide (AZO), are of substantial importance for use in a broad range of applications because of their excellent optical and electrical properties. AZO film can be deposited by using several conventional techniques, although they suffer from limitations such as long deposition time, high cost, and the requirement for complex deposition equipment. Here, we used hollow-cathode glow discharge, which produces a high-density plasma and achieves high deposition efficiency. Remarkably, instead of metallic target materials, we used Al2O3 and ZnO powders filled in the hollow cathode as a target, thus avoiding the need for specifically designed targets in this technique. The films were deposited using mixtures of argon and oxygen at various ratios (0% to 50% oxygen), to improve the film characteristics. The films deposited under all conditions exhibited hexagonal wurtzite ZnO structure, while the grain size increased with increasing oxygen content. The film was thick and porous when using low oxygen content, but became thin and dense with increasing oxygen content. The optical transmittance was found to be strongly dependent on the processing gases used, with the highest transmittance of 84% being attained when using 25% oxygen gas. The bandgap of the films lay between 3.27 eV and 3.33 eV. The highest carrier concentration and mobility were attained when using 25% oxygen, and the Hall resistivity decreased with increasing oxygen content. Besides the excellent transmittance and electrical properties of the deposited films, it is expected that the results of this study will be useful for solar cells and optoelectronic applications due to the relatively low cost of this technique and the lack of specific target requirements |
id |
UFRN_7675fefb81770dcb40a72b9bdf1fa59d |
---|---|
oai_identifier_str |
oai:https://repositorio.ufrn.br:123456789/45394 |
network_acronym_str |
UFRN |
network_name_str |
Repositório Institucional da UFRN |
repository_id_str |
|
spelling |
Feitor, Michelle CequeiraQueiroz, José César Augusto deNaeem, MuhammadAzevedo Filho, João BatistaLiborio, Maxwell SantanaSantos, E. J. C.Sousa, R. R. M.Costa, Thércio Henrique de CarvalhoKhan, Naveed H.2021-12-16T14:49:59Z2021-12-16T14:49:59Z2021-02-19QUEIROZ, J.C.A.; NAEEM, M.; A. AZEVEDO FILHO, J.B.; LIBÓRIO, M.S.; SANTOS, E.J.C.; FEITOR, M.C.; SOUSA, R.R.M.; COSTA, T.H.C.; KHAN, K.H.. Synthesis of Al-Doped ZnO Films Assisted with Hollow-Cathode Glow Discharge and Their Characterization. Journal of Electronic Materials, [S.l.], v. 50, n. 5, p. 2687-2698, 19 fev. 2021. Disponível em: https://link.springer.com/article/10.1007%2Fs11664-021-08802-1. Acesso em: 14 abr. 2021. http://dx.doi.org/10.1007/s11664-021-08802-1.0361-52351543-186Xhttps://repositorio.ufrn.br/handle/123456789/4539410.1007/s11664-021-08802-1Journal of Electronic MaterialsAttribution 3.0 Brazilhttp://creativecommons.org/licenses/by/3.0/br/info:eu-repo/semantics/openAccessHollow-cathode glow dischargeAluminum-doped zinc oxideTransmittanceResistivityBandgapSynthesis of Al-Doped ZnO films assisted with hollow-cathode glow discharge and their characterizationinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleTransparent conductive oxides, such as aluminum-doped zinc oxide (AZO), are of substantial importance for use in a broad range of applications because of their excellent optical and electrical properties. AZO film can be deposited by using several conventional techniques, although they suffer from limitations such as long deposition time, high cost, and the requirement for complex deposition equipment. Here, we used hollow-cathode glow discharge, which produces a high-density plasma and achieves high deposition efficiency. Remarkably, instead of metallic target materials, we used Al2O3 and ZnO powders filled in the hollow cathode as a target, thus avoiding the need for specifically designed targets in this technique. The films were deposited using mixtures of argon and oxygen at various ratios (0% to 50% oxygen), to improve the film characteristics. The films deposited under all conditions exhibited hexagonal wurtzite ZnO structure, while the grain size increased with increasing oxygen content. The film was thick and porous when using low oxygen content, but became thin and dense with increasing oxygen content. The optical transmittance was found to be strongly dependent on the processing gases used, with the highest transmittance of 84% being attained when using 25% oxygen gas. The bandgap of the films lay between 3.27 eV and 3.33 eV. The highest carrier concentration and mobility were attained when using 25% oxygen, and the Hall resistivity decreased with increasing oxygen content. Besides the excellent transmittance and electrical properties of the deposited films, it is expected that the results of this study will be useful for solar cells and optoelectronic applications due to the relatively low cost of this technique and the lack of specific target requirementsengreponame:Repositório Institucional da UFRNinstname:Universidade Federal do Rio Grande do Norte (UFRN)instacron:UFRNORIGINALSynthesisOfAl-DopedZn_FEITOR_2021.pdfSynthesisOfAl-DopedZn_FEITOR_2021.pdfapplication/pdf6393881https://repositorio.ufrn.br/bitstream/123456789/45394/1/SynthesisOfAl-DopedZn_FEITOR_2021.pdf70b60687ad6ab6c6c52fa2e6ee698543MD51CC-LICENSElicense_rdflicense_rdfapplication/rdf+xml; charset=utf-8914https://repositorio.ufrn.br/bitstream/123456789/45394/2/license_rdf4d2950bda3d176f570a9f8b328dfbbefMD52LICENSElicense.txtlicense.txttext/plain; charset=utf-81484https://repositorio.ufrn.br/bitstream/123456789/45394/3/license.txte9597aa2854d128fd968be5edc8a28d9MD53123456789/453942021-12-16 11:54:56.28oai:https://repositorio.ufrn.br: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Repositório de PublicaçõesPUBhttp://repositorio.ufrn.br/oai/opendoar:2021-12-16T14:54:56Repositório Institucional da UFRN - Universidade Federal do Rio Grande do Norte (UFRN)false |
dc.title.pt_BR.fl_str_mv |
Synthesis of Al-Doped ZnO films assisted with hollow-cathode glow discharge and their characterization |
title |
Synthesis of Al-Doped ZnO films assisted with hollow-cathode glow discharge and their characterization |
spellingShingle |
Synthesis of Al-Doped ZnO films assisted with hollow-cathode glow discharge and their characterization Feitor, Michelle Cequeira Hollow-cathode glow discharge Aluminum-doped zinc oxide Transmittance Resistivity Bandgap |
title_short |
Synthesis of Al-Doped ZnO films assisted with hollow-cathode glow discharge and their characterization |
title_full |
Synthesis of Al-Doped ZnO films assisted with hollow-cathode glow discharge and their characterization |
title_fullStr |
Synthesis of Al-Doped ZnO films assisted with hollow-cathode glow discharge and their characterization |
title_full_unstemmed |
Synthesis of Al-Doped ZnO films assisted with hollow-cathode glow discharge and their characterization |
title_sort |
Synthesis of Al-Doped ZnO films assisted with hollow-cathode glow discharge and their characterization |
author |
Feitor, Michelle Cequeira |
author_facet |
Feitor, Michelle Cequeira Queiroz, José César Augusto de Naeem, Muhammad Azevedo Filho, João Batista Liborio, Maxwell Santana Santos, E. J. C. Sousa, R. R. M. Costa, Thércio Henrique de Carvalho Khan, Naveed H. |
author_role |
author |
author2 |
Queiroz, José César Augusto de Naeem, Muhammad Azevedo Filho, João Batista Liborio, Maxwell Santana Santos, E. J. C. Sousa, R. R. M. Costa, Thércio Henrique de Carvalho Khan, Naveed H. |
author2_role |
author author author author author author author author |
dc.contributor.author.fl_str_mv |
Feitor, Michelle Cequeira Queiroz, José César Augusto de Naeem, Muhammad Azevedo Filho, João Batista Liborio, Maxwell Santana Santos, E. J. C. Sousa, R. R. M. Costa, Thércio Henrique de Carvalho Khan, Naveed H. |
dc.subject.por.fl_str_mv |
Hollow-cathode glow discharge Aluminum-doped zinc oxide Transmittance Resistivity Bandgap |
topic |
Hollow-cathode glow discharge Aluminum-doped zinc oxide Transmittance Resistivity Bandgap |
description |
Transparent conductive oxides, such as aluminum-doped zinc oxide (AZO), are of substantial importance for use in a broad range of applications because of their excellent optical and electrical properties. AZO film can be deposited by using several conventional techniques, although they suffer from limitations such as long deposition time, high cost, and the requirement for complex deposition equipment. Here, we used hollow-cathode glow discharge, which produces a high-density plasma and achieves high deposition efficiency. Remarkably, instead of metallic target materials, we used Al2O3 and ZnO powders filled in the hollow cathode as a target, thus avoiding the need for specifically designed targets in this technique. The films were deposited using mixtures of argon and oxygen at various ratios (0% to 50% oxygen), to improve the film characteristics. The films deposited under all conditions exhibited hexagonal wurtzite ZnO structure, while the grain size increased with increasing oxygen content. The film was thick and porous when using low oxygen content, but became thin and dense with increasing oxygen content. The optical transmittance was found to be strongly dependent on the processing gases used, with the highest transmittance of 84% being attained when using 25% oxygen gas. The bandgap of the films lay between 3.27 eV and 3.33 eV. The highest carrier concentration and mobility were attained when using 25% oxygen, and the Hall resistivity decreased with increasing oxygen content. Besides the excellent transmittance and electrical properties of the deposited films, it is expected that the results of this study will be useful for solar cells and optoelectronic applications due to the relatively low cost of this technique and the lack of specific target requirements |
publishDate |
2021 |
dc.date.accessioned.fl_str_mv |
2021-12-16T14:49:59Z |
dc.date.available.fl_str_mv |
2021-12-16T14:49:59Z |
dc.date.issued.fl_str_mv |
2021-02-19 |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
format |
article |
status_str |
publishedVersion |
dc.identifier.citation.fl_str_mv |
QUEIROZ, J.C.A.; NAEEM, M.; A. AZEVEDO FILHO, J.B.; LIBÓRIO, M.S.; SANTOS, E.J.C.; FEITOR, M.C.; SOUSA, R.R.M.; COSTA, T.H.C.; KHAN, K.H.. Synthesis of Al-Doped ZnO Films Assisted with Hollow-Cathode Glow Discharge and Their Characterization. Journal of Electronic Materials, [S.l.], v. 50, n. 5, p. 2687-2698, 19 fev. 2021. Disponível em: https://link.springer.com/article/10.1007%2Fs11664-021-08802-1. Acesso em: 14 abr. 2021. http://dx.doi.org/10.1007/s11664-021-08802-1. |
dc.identifier.uri.fl_str_mv |
https://repositorio.ufrn.br/handle/123456789/45394 |
dc.identifier.issn.none.fl_str_mv |
0361-5235 1543-186X |
dc.identifier.doi.none.fl_str_mv |
10.1007/s11664-021-08802-1 |
identifier_str_mv |
QUEIROZ, J.C.A.; NAEEM, M.; A. AZEVEDO FILHO, J.B.; LIBÓRIO, M.S.; SANTOS, E.J.C.; FEITOR, M.C.; SOUSA, R.R.M.; COSTA, T.H.C.; KHAN, K.H.. Synthesis of Al-Doped ZnO Films Assisted with Hollow-Cathode Glow Discharge and Their Characterization. Journal of Electronic Materials, [S.l.], v. 50, n. 5, p. 2687-2698, 19 fev. 2021. Disponível em: https://link.springer.com/article/10.1007%2Fs11664-021-08802-1. Acesso em: 14 abr. 2021. http://dx.doi.org/10.1007/s11664-021-08802-1. 0361-5235 1543-186X 10.1007/s11664-021-08802-1 |
url |
https://repositorio.ufrn.br/handle/123456789/45394 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.rights.driver.fl_str_mv |
Attribution 3.0 Brazil http://creativecommons.org/licenses/by/3.0/br/ info:eu-repo/semantics/openAccess |
rights_invalid_str_mv |
Attribution 3.0 Brazil http://creativecommons.org/licenses/by/3.0/br/ |
eu_rights_str_mv |
openAccess |
dc.publisher.none.fl_str_mv |
Journal of Electronic Materials |
publisher.none.fl_str_mv |
Journal of Electronic Materials |
dc.source.none.fl_str_mv |
reponame:Repositório Institucional da UFRN instname:Universidade Federal do Rio Grande do Norte (UFRN) instacron:UFRN |
instname_str |
Universidade Federal do Rio Grande do Norte (UFRN) |
instacron_str |
UFRN |
institution |
UFRN |
reponame_str |
Repositório Institucional da UFRN |
collection |
Repositório Institucional da UFRN |
bitstream.url.fl_str_mv |
https://repositorio.ufrn.br/bitstream/123456789/45394/1/SynthesisOfAl-DopedZn_FEITOR_2021.pdf https://repositorio.ufrn.br/bitstream/123456789/45394/2/license_rdf https://repositorio.ufrn.br/bitstream/123456789/45394/3/license.txt |
bitstream.checksum.fl_str_mv |
70b60687ad6ab6c6c52fa2e6ee698543 4d2950bda3d176f570a9f8b328dfbbef e9597aa2854d128fd968be5edc8a28d9 |
bitstream.checksumAlgorithm.fl_str_mv |
MD5 MD5 MD5 |
repository.name.fl_str_mv |
Repositório Institucional da UFRN - Universidade Federal do Rio Grande do Norte (UFRN) |
repository.mail.fl_str_mv |
|
_version_ |
1814832729532923904 |