Otimização de parâmetros de processo para a obstentação de monocamadas de grafeno e estruturas grafite/grafeno-like

Detalhes bibliográficos
Autor(a) principal: Barin, Gabriela Borin
Data de Publicação: 2014
Tipo de documento: Tese
Idioma: por
Título da fonte: Repositório Institucional da UFS
Texto Completo: https://ri.ufs.br/handle/riufs/3524
Resumo: Nowadays, a lot of studies are concentrate on graphene and graphene-like preparation, due to the broad application area of these materials. Preparation of high quality graphene with less impurities and defects is essential for graphene performance on electric, optics and bio-devices. The first study developed in this thesis contribute for high quality CVD graphene growth with continuous surface and impurities-free. Therefore, it was proposed an optimization on PMMA-based transfer process. Results showed that adding a second PMMA layer properly diluted (15% in anisole, which resulted in a 1.35% PMMA layer) produces higher quality graphene with fewer PMMA residues, non-cracked surface and lower sheet resistance. In the second study we reported investigations regarding ALD and spray technique deposition of Al2O3 to produce patterned graphene through area-selective CVD growth. ALD deposition was carried out using 120 and 200 cycles with 30 and 45 seconds of purging time. Al2O3 layers deposited with 200 cycles were stable and higher quality when compared with Al2O3 layers deposited with 120 cycles. Higher quality graphene was grown on copper substrate patterned using 45 seconds of purging time. It was observed that lower purging time lead to copper contamination by by-products which contaminated graphene during growth step. Results regarding AlCl3 spraying in order to deposit Al2O3 layers indicated that precursor concentration and deposition time had great influence on graphene and passivation layer final properties. The optimum concentration was found at 5mg/mL; lower concentration led to deposition of incomplete Al2O3 layers and higher concentration led to solid formation which hindered the precursor solution adhesion on copper foil. High quality graphene was grown on passivated copper using lower deposition times. Finally graphite and graphene-like structures were synthesized from double process which consisted of prior hydrothermal carbonization at 250 .C with subsequent pyrolysis at 500-1500.C. Results showed the determinant role of hydrothermal carbonization on graphitic structures formation with onion-like and graphene- like morphology. Direct pyrolysis of coconut coir dust led to an amorphous carbon material independently of pyrolysis temperature.
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spelling Barin, Gabriela Borinhttp://lattes.cnpq.br/3104369029830651Barreto, Ledjane Silva2017-09-26T12:02:04Z2017-09-26T12:02:04Z2014-12-01https://ri.ufs.br/handle/riufs/3524Nowadays, a lot of studies are concentrate on graphene and graphene-like preparation, due to the broad application area of these materials. Preparation of high quality graphene with less impurities and defects is essential for graphene performance on electric, optics and bio-devices. The first study developed in this thesis contribute for high quality CVD graphene growth with continuous surface and impurities-free. Therefore, it was proposed an optimization on PMMA-based transfer process. Results showed that adding a second PMMA layer properly diluted (15% in anisole, which resulted in a 1.35% PMMA layer) produces higher quality graphene with fewer PMMA residues, non-cracked surface and lower sheet resistance. In the second study we reported investigations regarding ALD and spray technique deposition of Al2O3 to produce patterned graphene through area-selective CVD growth. ALD deposition was carried out using 120 and 200 cycles with 30 and 45 seconds of purging time. Al2O3 layers deposited with 200 cycles were stable and higher quality when compared with Al2O3 layers deposited with 120 cycles. Higher quality graphene was grown on copper substrate patterned using 45 seconds of purging time. It was observed that lower purging time lead to copper contamination by by-products which contaminated graphene during growth step. Results regarding AlCl3 spraying in order to deposit Al2O3 layers indicated that precursor concentration and deposition time had great influence on graphene and passivation layer final properties. The optimum concentration was found at 5mg/mL; lower concentration led to deposition of incomplete Al2O3 layers and higher concentration led to solid formation which hindered the precursor solution adhesion on copper foil. High quality graphene was grown on passivated copper using lower deposition times. Finally graphite and graphene-like structures were synthesized from double process which consisted of prior hydrothermal carbonization at 250 .C with subsequent pyrolysis at 500-1500.C. Results showed the determinant role of hydrothermal carbonization on graphitic structures formation with onion-like and graphene- like morphology. Direct pyrolysis of coconut coir dust led to an amorphous carbon material independently of pyrolysis temperature.Atualmente muitos estudos se concentram na obtenção de grafenos e materiais grafeno-like devido a vasta área de aplicação destes materiais. A preparação de grafenos de melhor qualidade, com menor presença de impurezas e defeitos é crucial para que estes materiais tenham bom desempenho em dispositivos elétricos, ópticos e bio-dispositivos. O primeiro estudo desenvolvido nesta tese pretende contribuir para a obtenção, por deposição química em fase vapor (CVD), de grafenos com superfície contínua livre de trincas e impurezas e melhores propriedades elétricas. Por isso, foi proposto a otimização da rota de transferência baseada em PMMA, via adição de uma segunda camada do polímero diluído em 15% em anisol, o que resultou em uma camada de PMMA 1.35%. Observamos que a adição de uma segunda camada corretamente diluída resultou em um filme de grafeno com maior continuidade, menos impurezas proveninentes do polímero e menor resistência da folha. No segundo estudo reportamos o crescimento de grafeno CVD em substrato de cobre pré-passivado por deposição de camada atômica (ALD) e técnica de spray. Para a técnica de ALD foram feitas deposições com 120 e 200 ciclos com 30 e 45 segundos de purga. As camadas de Al2O3 depositadas com 200 ciclos foram de maior qualidade e resistiram ao processo de transferência. Já o grafeno de maior qualidade foi obtido em substrato no qual o tempo de purga foi realizado com 45 segundos. Observamos que com tempo de purga menor (30segundos) o substrato de cobre sofreu contaminação durante o processo de deposição o que levou a contaminação do grafeno. Pela técnica de spray os resultados indicaram que a concentração da solução do precursor e o tempo de desposicao foram determinantes na qualidade da camada passivante e do grafeno. A concentracao otima encontrada foi de 5mg/mL; concentracoes menores levaram a deposicao de camadas de Al2O3 incompletas e concentracoes maiores levaram a formacao de solido prejudicando a adesao da solucao no substrato. Os grafenos crescidos nos substratos passivados com menor tempo de deposicao apresentaram maior qualidade. Por fim estudamos a obtencao de estruturas grafite/grafeno-like a partir de um processo que consistiu de carbonizacao hidrotermica a 250.C com posterior pirolise de 500-1500.C. Os resultados mostraram o papel determinante da carbonizacao hidrotermica na obtencao de estruturas grafiticas com morfologia onion-like e grafeno-like pirolisadas a 1500.C enquanto que a pirolise direta do po de coco levou a formacao de um material predominantemente amorfo independente da temperatura de tratamento.application/pdfporMateriaisGrafenoBiomassaGrafitaMateriais nanoestruturadosCarbonoBiomassGrapheneGraphiteMaterialsNanostructured materialsCNPQ::ENGENHARIAS::ENGENHARIA DE MATERIAIS E METALURGICAOtimização de parâmetros de processo para a obstentação de monocamadas de grafeno e estruturas grafite/grafeno-likeParameters optimization to obtain graphene monolayers and graphite/graphene-like structuresinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/doctoralThesisPós-Graduação em Ciência e Engenharia de Materiaisinfo:eu-repo/semantics/openAccessreponame:Repositório Institucional da UFSinstname:Universidade Federal de Sergipe (UFS)instacron:UFSTEXTGABRIELA_BORIN_BARIN.pdf.txtGABRIELA_BORIN_BARIN.pdf.txtExtracted texttext/plain205114https://ri.ufs.br/jspui/bitstream/riufs/3524/2/GABRIELA_BORIN_BARIN.pdf.txtbf4a6cbce0b8b1c98519395abf64ba4aMD52THUMBNAILGABRIELA_BORIN_BARIN.pdf.jpgGABRIELA_BORIN_BARIN.pdf.jpgGenerated Thumbnailimage/jpeg1240https://ri.ufs.br/jspui/bitstream/riufs/3524/3/GABRIELA_BORIN_BARIN.pdf.jpg880eb6df6acf2b36b69c9211cc5ee289MD53ORIGINALGABRIELA_BORIN_BARIN.pdfapplication/pdf8086710https://ri.ufs.br/jspui/bitstream/riufs/3524/1/GABRIELA_BORIN_BARIN.pdf3eb0255d6eacfc9b669060a0f9234e9bMD51riufs/35242019-07-30 19:01:06.55oai:ufs.br:riufs/3524Repositório InstitucionalPUBhttps://ri.ufs.br/oai/requestrepositorio@academico.ufs.bropendoar:2019-07-30T22:01:06Repositório Institucional da UFS - Universidade Federal de Sergipe (UFS)false
dc.title.por.fl_str_mv Otimização de parâmetros de processo para a obstentação de monocamadas de grafeno e estruturas grafite/grafeno-like
dc.title.alternative.eng.fl_str_mv Parameters optimization to obtain graphene monolayers and graphite/graphene-like structures
title Otimização de parâmetros de processo para a obstentação de monocamadas de grafeno e estruturas grafite/grafeno-like
spellingShingle Otimização de parâmetros de processo para a obstentação de monocamadas de grafeno e estruturas grafite/grafeno-like
Barin, Gabriela Borin
Materiais
Grafeno
Biomassa
Grafita
Materiais nanoestruturados
Carbono
Biomass
Graphene
Graphite
Materials
Nanostructured materials
CNPQ::ENGENHARIAS::ENGENHARIA DE MATERIAIS E METALURGICA
title_short Otimização de parâmetros de processo para a obstentação de monocamadas de grafeno e estruturas grafite/grafeno-like
title_full Otimização de parâmetros de processo para a obstentação de monocamadas de grafeno e estruturas grafite/grafeno-like
title_fullStr Otimização de parâmetros de processo para a obstentação de monocamadas de grafeno e estruturas grafite/grafeno-like
title_full_unstemmed Otimização de parâmetros de processo para a obstentação de monocamadas de grafeno e estruturas grafite/grafeno-like
title_sort Otimização de parâmetros de processo para a obstentação de monocamadas de grafeno e estruturas grafite/grafeno-like
author Barin, Gabriela Borin
author_facet Barin, Gabriela Borin
author_role author
dc.contributor.author.fl_str_mv Barin, Gabriela Borin
dc.contributor.advisor1Lattes.fl_str_mv http://lattes.cnpq.br/3104369029830651
dc.contributor.advisor1.fl_str_mv Barreto, Ledjane Silva
contributor_str_mv Barreto, Ledjane Silva
dc.subject.por.fl_str_mv Materiais
Grafeno
Biomassa
Grafita
Materiais nanoestruturados
Carbono
topic Materiais
Grafeno
Biomassa
Grafita
Materiais nanoestruturados
Carbono
Biomass
Graphene
Graphite
Materials
Nanostructured materials
CNPQ::ENGENHARIAS::ENGENHARIA DE MATERIAIS E METALURGICA
dc.subject.eng.fl_str_mv Biomass
Graphene
Graphite
Materials
Nanostructured materials
dc.subject.cnpq.fl_str_mv CNPQ::ENGENHARIAS::ENGENHARIA DE MATERIAIS E METALURGICA
description Nowadays, a lot of studies are concentrate on graphene and graphene-like preparation, due to the broad application area of these materials. Preparation of high quality graphene with less impurities and defects is essential for graphene performance on electric, optics and bio-devices. The first study developed in this thesis contribute for high quality CVD graphene growth with continuous surface and impurities-free. Therefore, it was proposed an optimization on PMMA-based transfer process. Results showed that adding a second PMMA layer properly diluted (15% in anisole, which resulted in a 1.35% PMMA layer) produces higher quality graphene with fewer PMMA residues, non-cracked surface and lower sheet resistance. In the second study we reported investigations regarding ALD and spray technique deposition of Al2O3 to produce patterned graphene through area-selective CVD growth. ALD deposition was carried out using 120 and 200 cycles with 30 and 45 seconds of purging time. Al2O3 layers deposited with 200 cycles were stable and higher quality when compared with Al2O3 layers deposited with 120 cycles. Higher quality graphene was grown on copper substrate patterned using 45 seconds of purging time. It was observed that lower purging time lead to copper contamination by by-products which contaminated graphene during growth step. Results regarding AlCl3 spraying in order to deposit Al2O3 layers indicated that precursor concentration and deposition time had great influence on graphene and passivation layer final properties. The optimum concentration was found at 5mg/mL; lower concentration led to deposition of incomplete Al2O3 layers and higher concentration led to solid formation which hindered the precursor solution adhesion on copper foil. High quality graphene was grown on passivated copper using lower deposition times. Finally graphite and graphene-like structures were synthesized from double process which consisted of prior hydrothermal carbonization at 250 .C with subsequent pyrolysis at 500-1500.C. Results showed the determinant role of hydrothermal carbonization on graphitic structures formation with onion-like and graphene- like morphology. Direct pyrolysis of coconut coir dust led to an amorphous carbon material independently of pyrolysis temperature.
publishDate 2014
dc.date.issued.fl_str_mv 2014-12-01
dc.date.accessioned.fl_str_mv 2017-09-26T12:02:04Z
dc.date.available.fl_str_mv 2017-09-26T12:02:04Z
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