Innovative low temperature plasma approach for deposition of alumina films
Autor(a) principal: | |
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Data de Publicação: | 2014 |
Outros Autores: | , , , , , |
Tipo de documento: | Artigo |
Idioma: | eng |
Título da fonte: | Repositório Institucional da UNIFESP |
Texto Completo: | http://repositorio.unifesp.br/handle/11600/8667 http://dx.doi.org/10.1590/1516-1439.283514 |
Resumo: | Alumina films were deposited from a new plasma method using aluminum acetylacetonate (AAA) powder as precursor. The AAA was sputtered in argon and oxygen plasma mixtures. It was investigated the effect of the oxygen proportion (O2%) on the properties of the coatings. Deposition rate was derived from the layer height measured by profilometry. The elemental composition and molecular structure of the films were determined by Rutherford backscattering and infrared spectroscopies, respectively. Grazing incidence X-ray diffraction was used to investigate the microstructure of the films while hardness was determined by nanoindentation technique. Inspections on the surface morphology and on the film composition were conducted associating scanning electron microscopy and energy dispersive spectroscopy. Incorporation of oxygen affects the plasma kinetics and consequently the properties of the coatings. As moderated concentrations of oxygen (< 25%) are added, the structure is predominantly organic containing stoichiometric amorphous alumina. On the other hand, as high O2% (> 25%) are incorporated, the structure become rich in metallic aluminum with carbon rising at low proportions. The deposited layer is not homogeneous in thickness once the chemical composition of the precursor is changed by the action of the reactive oxygen plasma. Oxygen ablation on the film surface also contributes to the lack of homogeneity of the structure, especially as high oxygen proportions are imposed. Hardness data (0.5-2.0 GPa) corroborated the idea of an amorphous structure. Based on the results presented here it was possible to identify the oxygen concentration in the plasma atmosphere which mostly removed organics while preserving the stoichiometric alumina precipitation, subject of great relevance as one considers the reduction in the energy necessary for the creation of fully oxide coatings. |
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Battaglin, Felipe Augusto DarribaHosokawa, Ricardo ShindiCruz, Nilson Cristino DaCaseli, Luciano [UNIFESP]Rangel, Elidiane CiprianoSilva, Tiago Fiorini DaTabacniks, Manfredo HarriUniversidade Estadual Paulista (UNESP)Universidade Federal de São Paulo (UNIFESP)Universidade de São Paulo (USP)2015-06-14T13:47:22Z2015-06-14T13:47:22Z2014-12-01Materials Research. ABM, ABC, ABPol, v. 17, n. 6, p. 1410-1419, 2014.1516-1439http://repositorio.unifesp.br/handle/11600/8667http://dx.doi.org/10.1590/1516-1439.283514S1516-14392014000600008.pdfS1516-1439201400060000810.1590/1516-1439.283514Alumina films were deposited from a new plasma method using aluminum acetylacetonate (AAA) powder as precursor. The AAA was sputtered in argon and oxygen plasma mixtures. It was investigated the effect of the oxygen proportion (O2%) on the properties of the coatings. Deposition rate was derived from the layer height measured by profilometry. The elemental composition and molecular structure of the films were determined by Rutherford backscattering and infrared spectroscopies, respectively. Grazing incidence X-ray diffraction was used to investigate the microstructure of the films while hardness was determined by nanoindentation technique. Inspections on the surface morphology and on the film composition were conducted associating scanning electron microscopy and energy dispersive spectroscopy. Incorporation of oxygen affects the plasma kinetics and consequently the properties of the coatings. As moderated concentrations of oxygen (< 25%) are added, the structure is predominantly organic containing stoichiometric amorphous alumina. On the other hand, as high O2% (> 25%) are incorporated, the structure become rich in metallic aluminum with carbon rising at low proportions. The deposited layer is not homogeneous in thickness once the chemical composition of the precursor is changed by the action of the reactive oxygen plasma. Oxygen ablation on the film surface also contributes to the lack of homogeneity of the structure, especially as high oxygen proportions are imposed. Hardness data (0.5-2.0 GPa) corroborated the idea of an amorphous structure. Based on the results presented here it was possible to identify the oxygen concentration in the plasma atmosphere which mostly removed organics while preserving the stoichiometric alumina precipitation, subject of great relevance as one considers the reduction in the energy necessary for the creation of fully oxide coatings.Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)Universidade Estadual Paulista Laboratório de Plasmas TecnológicosUniversidade Federal de São Paulo (UNIFESP) Departamento de Ciências Exatas e da TerraUniversidade de São Paulo Departamento de Física NuclearUniversidade de São Paulo Departamento de Física AplicadaUNIFESP, Depto. de Ciências Exatas e da TerraSciELO1410-1419engABM, ABC, ABPolMaterials Researchaluminaaluminum acetylacetonatereactive plasma sputteringcompositionstructuremorphologyInnovative low temperature plasma approach for deposition of alumina filmsinfo:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/articleinfo:eu-repo/semantics/openAccessreponame:Repositório Institucional da UNIFESPinstname:Universidade Federal de São Paulo (UNIFESP)instacron:UNIFESPORIGINALS1516-14392014000600008.pdfapplication/pdf3911916${dspace.ui.url}/bitstream/11600/8667/1/S1516-14392014000600008.pdf133fcbbef15de3d25d8830025bb9004fMD51open accessTEXTS1516-14392014000600008.pdf.txtS1516-14392014000600008.pdf.txtExtracted texttext/plain37203${dspace.ui.url}/bitstream/11600/8667/9/S1516-14392014000600008.pdf.txt8245bed0d9a4239b633f6285138e8257MD59open accessTHUMBNAILS1516-14392014000600008.pdf.jpgS1516-14392014000600008.pdf.jpgIM Thumbnailimage/jpeg6806${dspace.ui.url}/bitstream/11600/8667/11/S1516-14392014000600008.pdf.jpgf19a7c45be72f1376fdbfdf67f69cedfMD511open access11600/86672023-06-05 19:28:57.528open accessoai:repositorio.unifesp.br:11600/8667Repositório InstitucionalPUBhttp://www.repositorio.unifesp.br/oai/requestopendoar:34652023-06-05T22:28:57Repositório Institucional da UNIFESP - Universidade Federal de São Paulo (UNIFESP)false |
dc.title.en.fl_str_mv |
Innovative low temperature plasma approach for deposition of alumina films |
title |
Innovative low temperature plasma approach for deposition of alumina films |
spellingShingle |
Innovative low temperature plasma approach for deposition of alumina films Battaglin, Felipe Augusto Darriba alumina aluminum acetylacetonate reactive plasma sputtering composition structure morphology |
title_short |
Innovative low temperature plasma approach for deposition of alumina films |
title_full |
Innovative low temperature plasma approach for deposition of alumina films |
title_fullStr |
Innovative low temperature plasma approach for deposition of alumina films |
title_full_unstemmed |
Innovative low temperature plasma approach for deposition of alumina films |
title_sort |
Innovative low temperature plasma approach for deposition of alumina films |
author |
Battaglin, Felipe Augusto Darriba |
author_facet |
Battaglin, Felipe Augusto Darriba Hosokawa, Ricardo Shindi Cruz, Nilson Cristino Da Caseli, Luciano [UNIFESP] Rangel, Elidiane Cipriano Silva, Tiago Fiorini Da Tabacniks, Manfredo Harri |
author_role |
author |
author2 |
Hosokawa, Ricardo Shindi Cruz, Nilson Cristino Da Caseli, Luciano [UNIFESP] Rangel, Elidiane Cipriano Silva, Tiago Fiorini Da Tabacniks, Manfredo Harri |
author2_role |
author author author author author author |
dc.contributor.institution.none.fl_str_mv |
Universidade Estadual Paulista (UNESP) Universidade Federal de São Paulo (UNIFESP) Universidade de São Paulo (USP) |
dc.contributor.author.fl_str_mv |
Battaglin, Felipe Augusto Darriba Hosokawa, Ricardo Shindi Cruz, Nilson Cristino Da Caseli, Luciano [UNIFESP] Rangel, Elidiane Cipriano Silva, Tiago Fiorini Da Tabacniks, Manfredo Harri |
dc.subject.eng.fl_str_mv |
alumina aluminum acetylacetonate reactive plasma sputtering composition structure morphology |
topic |
alumina aluminum acetylacetonate reactive plasma sputtering composition structure morphology |
description |
Alumina films were deposited from a new plasma method using aluminum acetylacetonate (AAA) powder as precursor. The AAA was sputtered in argon and oxygen plasma mixtures. It was investigated the effect of the oxygen proportion (O2%) on the properties of the coatings. Deposition rate was derived from the layer height measured by profilometry. The elemental composition and molecular structure of the films were determined by Rutherford backscattering and infrared spectroscopies, respectively. Grazing incidence X-ray diffraction was used to investigate the microstructure of the films while hardness was determined by nanoindentation technique. Inspections on the surface morphology and on the film composition were conducted associating scanning electron microscopy and energy dispersive spectroscopy. Incorporation of oxygen affects the plasma kinetics and consequently the properties of the coatings. As moderated concentrations of oxygen (< 25%) are added, the structure is predominantly organic containing stoichiometric amorphous alumina. On the other hand, as high O2% (> 25%) are incorporated, the structure become rich in metallic aluminum with carbon rising at low proportions. The deposited layer is not homogeneous in thickness once the chemical composition of the precursor is changed by the action of the reactive oxygen plasma. Oxygen ablation on the film surface also contributes to the lack of homogeneity of the structure, especially as high oxygen proportions are imposed. Hardness data (0.5-2.0 GPa) corroborated the idea of an amorphous structure. Based on the results presented here it was possible to identify the oxygen concentration in the plasma atmosphere which mostly removed organics while preserving the stoichiometric alumina precipitation, subject of great relevance as one considers the reduction in the energy necessary for the creation of fully oxide coatings. |
publishDate |
2014 |
dc.date.issued.fl_str_mv |
2014-12-01 |
dc.date.accessioned.fl_str_mv |
2015-06-14T13:47:22Z |
dc.date.available.fl_str_mv |
2015-06-14T13:47:22Z |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/article |
format |
article |
status_str |
publishedVersion |
dc.identifier.citation.fl_str_mv |
Materials Research. ABM, ABC, ABPol, v. 17, n. 6, p. 1410-1419, 2014. |
dc.identifier.uri.fl_str_mv |
http://repositorio.unifesp.br/handle/11600/8667 http://dx.doi.org/10.1590/1516-1439.283514 |
dc.identifier.issn.none.fl_str_mv |
1516-1439 |
dc.identifier.file.none.fl_str_mv |
S1516-14392014000600008.pdf |
dc.identifier.scielo.none.fl_str_mv |
S1516-14392014000600008 |
dc.identifier.doi.none.fl_str_mv |
10.1590/1516-1439.283514 |
identifier_str_mv |
Materials Research. ABM, ABC, ABPol, v. 17, n. 6, p. 1410-1419, 2014. 1516-1439 S1516-14392014000600008.pdf S1516-14392014000600008 10.1590/1516-1439.283514 |
url |
http://repositorio.unifesp.br/handle/11600/8667 http://dx.doi.org/10.1590/1516-1439.283514 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.ispartof.none.fl_str_mv |
Materials Research |
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openAccess |
dc.format.none.fl_str_mv |
1410-1419 |
dc.publisher.none.fl_str_mv |
ABM, ABC, ABPol |
publisher.none.fl_str_mv |
ABM, ABC, ABPol |
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Repositório Institucional da UNIFESP |
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