Electrical characterisation of beta-Ga2O3 Schottky diode for deep UV sensor applications
Autor(a) principal: | |
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Data de Publicação: | 2020 |
Outros Autores: | , , , , , |
Tipo de documento: | Artigo de conferência |
Idioma: | eng |
Título da fonte: | Repositório Institucional da UNESP |
Texto Completo: | http://hdl.handle.net/11449/210291 |
Resumo: | beta-Ga2O3 is a promising semiconductor for electronic devices. In the present work we have demonstrated a novel method for manufacturing a beta-Ga2O3 Schottky diode, in which the same electrode material is used for both contacts. The device is tested it for its applicability in deep UV sensing. Devices were manufactured directly onto beta-Ga2O3 (010) wafer material. From the perspective of diode performance, a high rectification ratio of 1.5x10(7) and high forward current of 17.58 mA/cm(2) at -5 V bias was obtained. A responsivity of 12.5 mA/W was recorded when irradiated with light possessing a wavelength of 254 nm. Importantly, detailed analysis is conducted in order to evaluate the performance of the Schottky diode using Cheung's and Norde's methods allowing for accurate calculation of the Schottky barrier height in this device. |
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Repositório Institucional da UNESP |
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Electrical characterisation of beta-Ga2O3 Schottky diode for deep UV sensor applicationsSchottky diodebeta-Ga2O3deep UVplanar diodebeta-Ga2O3 is a promising semiconductor for electronic devices. In the present work we have demonstrated a novel method for manufacturing a beta-Ga2O3 Schottky diode, in which the same electrode material is used for both contacts. The device is tested it for its applicability in deep UV sensing. Devices were manufactured directly onto beta-Ga2O3 (010) wafer material. From the perspective of diode performance, a high rectification ratio of 1.5x10(7) and high forward current of 17.58 mA/cm(2) at -5 V bias was obtained. A responsivity of 12.5 mA/W was recorded when irradiated with light possessing a wavelength of 254 nm. Importantly, detailed analysis is conducted in order to evaluate the performance of the Schottky diode using Cheung's and Norde's methods allowing for accurate calculation of the Schottky barrier height in this device.Solar Photovoltaic Academic Research Consortium II (SPARC II) project - WEFOFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)Programa de Pos-Graduacao em Ciencia e Tecnologia de Materiais (POSMAT)Bangor Univ, Sch Elect Engn, Bangor, Gwynedd, WalesUNESP Sao Paulo State Univ, Dept Phys, Presidente Prudente, BrazilSwansea Univ, Coll Engn, Multidisciplinary Nanotechnol Ctr, Swansea, W Glam, WalesUNESP Sao Paulo State Univ, Dept Phys, Presidente Prudente, BrazilFAPESP: 2019/14366-3IeeeBangor UnivUniversidade Estadual Paulista (Unesp)Swansea UnivVieira, Douglas H.Badiei, NafisehEvans, Jonathan E.Alves, NeriKettle, JeffLi, LijieIEEE2021-06-25T15:03:50Z2021-06-25T15:03:50Z2020-01-01info:eu-repo/semantics/publishedVersioninfo:eu-repo/semantics/conferenceObject42020 Ieee Sensors. New York: Ieee, 4 p., 2020.1930-0395http://hdl.handle.net/11449/210291WOS:000646236300245Web of Sciencereponame:Repositório Institucional da UNESPinstname:Universidade Estadual Paulista (UNESP)instacron:UNESPeng2020 Ieee Sensorsinfo:eu-repo/semantics/openAccess2024-06-18T18:18:36Zoai:repositorio.unesp.br:11449/210291Repositório InstitucionalPUBhttp://repositorio.unesp.br/oai/requestopendoar:29462024-08-05T14:57:35.758339Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP)false |
dc.title.none.fl_str_mv |
Electrical characterisation of beta-Ga2O3 Schottky diode for deep UV sensor applications |
title |
Electrical characterisation of beta-Ga2O3 Schottky diode for deep UV sensor applications |
spellingShingle |
Electrical characterisation of beta-Ga2O3 Schottky diode for deep UV sensor applications Vieira, Douglas H. Schottky diode beta-Ga2O3 deep UV planar diode |
title_short |
Electrical characterisation of beta-Ga2O3 Schottky diode for deep UV sensor applications |
title_full |
Electrical characterisation of beta-Ga2O3 Schottky diode for deep UV sensor applications |
title_fullStr |
Electrical characterisation of beta-Ga2O3 Schottky diode for deep UV sensor applications |
title_full_unstemmed |
Electrical characterisation of beta-Ga2O3 Schottky diode for deep UV sensor applications |
title_sort |
Electrical characterisation of beta-Ga2O3 Schottky diode for deep UV sensor applications |
author |
Vieira, Douglas H. |
author_facet |
Vieira, Douglas H. Badiei, Nafiseh Evans, Jonathan E. Alves, Neri Kettle, Jeff Li, Lijie IEEE |
author_role |
author |
author2 |
Badiei, Nafiseh Evans, Jonathan E. Alves, Neri Kettle, Jeff Li, Lijie IEEE |
author2_role |
author author author author author author |
dc.contributor.none.fl_str_mv |
Bangor Univ Universidade Estadual Paulista (Unesp) Swansea Univ |
dc.contributor.author.fl_str_mv |
Vieira, Douglas H. Badiei, Nafiseh Evans, Jonathan E. Alves, Neri Kettle, Jeff Li, Lijie IEEE |
dc.subject.por.fl_str_mv |
Schottky diode beta-Ga2O3 deep UV planar diode |
topic |
Schottky diode beta-Ga2O3 deep UV planar diode |
description |
beta-Ga2O3 is a promising semiconductor for electronic devices. In the present work we have demonstrated a novel method for manufacturing a beta-Ga2O3 Schottky diode, in which the same electrode material is used for both contacts. The device is tested it for its applicability in deep UV sensing. Devices were manufactured directly onto beta-Ga2O3 (010) wafer material. From the perspective of diode performance, a high rectification ratio of 1.5x10(7) and high forward current of 17.58 mA/cm(2) at -5 V bias was obtained. A responsivity of 12.5 mA/W was recorded when irradiated with light possessing a wavelength of 254 nm. Importantly, detailed analysis is conducted in order to evaluate the performance of the Schottky diode using Cheung's and Norde's methods allowing for accurate calculation of the Schottky barrier height in this device. |
publishDate |
2020 |
dc.date.none.fl_str_mv |
2020-01-01 2021-06-25T15:03:50Z 2021-06-25T15:03:50Z |
dc.type.status.fl_str_mv |
info:eu-repo/semantics/publishedVersion |
dc.type.driver.fl_str_mv |
info:eu-repo/semantics/conferenceObject |
format |
conferenceObject |
status_str |
publishedVersion |
dc.identifier.uri.fl_str_mv |
2020 Ieee Sensors. New York: Ieee, 4 p., 2020. 1930-0395 http://hdl.handle.net/11449/210291 WOS:000646236300245 |
identifier_str_mv |
2020 Ieee Sensors. New York: Ieee, 4 p., 2020. 1930-0395 WOS:000646236300245 |
url |
http://hdl.handle.net/11449/210291 |
dc.language.iso.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
2020 Ieee Sensors |
dc.rights.driver.fl_str_mv |
info:eu-repo/semantics/openAccess |
eu_rights_str_mv |
openAccess |
dc.format.none.fl_str_mv |
4 |
dc.publisher.none.fl_str_mv |
Ieee |
publisher.none.fl_str_mv |
Ieee |
dc.source.none.fl_str_mv |
Web of Science reponame:Repositório Institucional da UNESP instname:Universidade Estadual Paulista (UNESP) instacron:UNESP |
instname_str |
Universidade Estadual Paulista (UNESP) |
instacron_str |
UNESP |
institution |
UNESP |
reponame_str |
Repositório Institucional da UNESP |
collection |
Repositório Institucional da UNESP |
repository.name.fl_str_mv |
Repositório Institucional da UNESP - Universidade Estadual Paulista (UNESP) |
repository.mail.fl_str_mv |
|
_version_ |
1808128441654968320 |