Caracterização de filmes finos polimerizados por plasma a partir dos monômeros hexametildisilazano e acetileno e posteriormente expostos à descarga por barreira dielétrica

• Autor(a) principal: Siqueira, Marcelo Barbosa [UNESP]
• Data de Publicação: 2014
• Tipo de documento: Dissertação
• Idioma: por
• Título da fonte: Repositório Institucional da UNESP
• Texto Completo: http://hdl.handle.net/11449/111066
• topic: Filmes finos; Polimerização em plasma; Plasma (Gases ionizados); Descargas elétricas através de gases; Aspereza de superfície; Thin films

Two thin film groups were made by plasma polymerization from HMDSN at 4 Pa and C2H2 at 10 Pa. Both groups were made in the same stainless steel reactor. The discharge was produced by radio-frequency (13.56 MHz) during 15 minutes for polymerization from C2H2 and 1 hour for HMDSN. Thereafter, the films were exposed to DBD produced by an AC power supply at a frequency of 60 Hz with 35 kV of peak voltage. The time for treatment of films made from acetylene is from 1 to 5 minutes and from 2 to 10 minutes for films made from HMDSN. The film characteristics were evaluated from some techniques. Thus, molecular structure was characterized by FTIR, topography by atomic force microscopy and wettability by contact angle. After DBD exposure, contact angle measurements obtained on the films made from the C2H2 initially presented values close to zero no matter what the time for treatment was used. Thereafter, these values increased to 30°, 45° and 54°, respectively, for 1, 3 and 5 minutes for treatment. All these values are smaller than the ones measured before treatment (60°). After DBD, the films from HMDSN showed 57°, 60° and 71°, respectively, for 5, 10 and 2 minutes for treatment. As time went by, these values also increased to 90°, which is lower than measurements made before treatment (97°). The FTIR spectrum from two film groups showed changes in molecular structure, however without introducing new functional groups. After deposition, the films made from acetylene presented an average surface roughness equal to 64 nm, which is lower than the substrate surface (70 nm). As time for treatment increase, this value became equal to 152 nm. On the other hand, the films from HMDSN after deposition presented an average roughness equal to 4 nm for 5 minutes for treatment. After treatment, these films showed an average roughness equal to 15 nm for 7,5 minutes for treatment